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Measurement of Chlorine Concentrations at CdTe Grain Boundaries

IEEE journal of photovoltaics, 2014-11, Vol.4 (6), p.1655-1658

2014

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Measurement of angular emission trajectories for magnetron-sputtered tantalum

Journal of electronic materials, 2005-12, Vol.34 (12), p.1474-1479

2005

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AgentCell: a digital single-cell assay for bacterial chemotaxis

Bioinformatics, 2005-06, Vol.21 (11), p.2714-2721

2005

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Arc generation from sputtering plasma-dielectric inclusion interactions

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-05, Vol.20 (3), p.833-838

2002

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Correlative impurity distribution analysis in cadmium telluride (CdTe) thin-film solar cells by ToF-SIMS 2D imaging

Solar energy materials and solar cells, 2016-12, Vol.157, p.65-73

2016

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Inertial interlock bonding: A new approach to sputtering target construction

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2007-01, Vol.25 (1), p.54-60

2007

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Crystallographic target effects in magnetron sputtering

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1987-07, Vol.5 (4), p.1755-1758

Wickersham, C. E.

1987

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Measurements of the critical inclusion size for arcing and macroparticle ejection from aluminum sputtering targets

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-11, Vol.19 (6), p.2767-2772

2001

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Integrated active transient thermography for rapid nondestructive analysis of sputtering target bond integrity

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2006-07, Vol.24 (4), p.1100-1106

Wickersham, C. E.

2006

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Explosive crystallization in zirconium/silicon multilayers

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1988-05, Vol.6 (3), p.1699-1702

1988

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Temperature and thickness effects on the explosive crystallization of amorphous germanium films

Applied physics letters, 1982-04, Vol.40 (8), p.672-675

1982

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Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-11, Vol.19 (6), p.2741-2750

2001

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Particle contamination during sputter deposition of W–Ti films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1992-07, Vol.10 (4), p.1713-1717

1992

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Effect of grain orientation on tantalum magnetron sputtering yield

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2006-07, Vol.24 (4), p.1107-1111

2006

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Structural and electrical characteristics of InSb thin films grown by rf sputtering

Journal of applied physics, 1976-08, Vol.47 (8), p.3630-3639

1976

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Influence of target microstructure on the propensity for whisker growth in sputter-deposited aluminum alloy films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1989-05, Vol.7 (3), p.814-816

1989

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Impulse stimulated “explosive” crystallization of sputter deposited amorphous (In,Ga)Sb films

Solid state communications, 1978-07, Vol.27 (1), p.17-20

1978

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Explosive crystallization in gallium-doped amorphous germanium

Materials letters, 1986-07, Vol.4 (5), p.268-270

1986

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Temperature dependent formation of surface undulations in explosively crystallized films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1985-03, Vol.3 (2), p.336-338

1985

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Ferroelectric Pb(Zr, Ti)O3 thin films by reactive sputtering from a metallic target

Vacuum, 1990, Vol.41 (4-6), p.1428-1430

1990

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Multitarget sputtering using decoupled plasmas

Journal of applied physics, 1976-11, Vol.47 (11), p.4734-4739

1976

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Measurement of angular emission trajectories for magnetron-sputtered tantalum : Microstructures and textures of films and coatings and refractory metals in electronic applications

Journal of electronic materials, 2005, Vol.34 (12), p.1474-1479

2005

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Pressure effects in planar magnetron sputter deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1986-05, Vol.4 (3), p.408-412

1986

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The effect of trapped argon on the minimum temperature for impulse stimulated “explosive” crystallization of DC sputter-deposited amorphous germanium films

Solid state communications, 1980-06, Vol.34 (12), p.907-910

Wickersham, C.E.

1980

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Drift in film thickness uniformity arising from sputtering target recrystallization

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1989-05, Vol.7 (3), p.2355-2358

1989

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Measurement of Chlorine Concentrations at CdTe Grain Boundaries

Measurement of angular emission trajectories for magnetron-sputtered tantalum

AgentCell: a digital single-cell assay for bacterial chemotaxis

Arc generation from sputtering plasma-dielectric inclusion interactions

Correlative impurity distribution analysis in cadmium telluride (CdTe) thin-film solar cells by ToF-SIMS 2D imaging

Inertial interlock bonding: A new approach to sputtering target construction

Crystallographic target effects in magnetron sputtering

Measurements of the critical inclusion size for arcing and macroparticle ejection from aluminum sputtering targets

Integrated active transient thermography for rapid nondestructive analysis of sputtering target bond integrity

Explosive crystallization in zirconium/silicon multilayers

Temperature and thickness effects on the explosive crystallization of amorphous germanium films

Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets

Particle contamination during sputter deposition of W–Ti films

Effect of grain orientation on tantalum magnetron sputtering yield

Structural and electrical characteristics of InSb thin films grown by rf sputtering

Influence of target microstructure on the propensity for whisker growth in sputter-deposited aluminum alloy films

Impulse stimulated “explosive” crystallization of sputter deposited amorphous (In,Ga)Sb films

Explosive crystallization in gallium-doped amorphous germanium

Temperature dependent formation of surface undulations in explosively crystallized films

Ferroelectric Pb(Zr, Ti)O3 thin films by reactive sputtering from a metallic target

Multitarget sputtering using decoupled plasmas

Measurement of angular emission trajectories for magnetron-sputtered tantalum : Microstructures and textures of films and coatings and refractory metals in electronic applications

Pressure effects in planar magnetron sputter deposition

The effect of trapped argon on the minimum temperature for impulse stimulated “explosive” crystallization of DC sputter-deposited amorphous germanium films

Drift in film thickness uniformity arising from sputtering target recrystallization

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