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Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions

Journal of applied physics, 2011-04, Vol.109 (7), p.073302-073302-10

2011

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A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges

Journal of applied physics, 2004-12, Vol.96 (12), p.6994-7001

2004

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AC powered reactive magnetron deposition of indium tin oxide (ITO) films from a metallic target

Surface & coatings technology, 2006-12, Vol.201 (7), p.3964-3969

2006

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Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions

Journal of applied physics, 2011-04, Vol.109 (7), p.073303-073303-10

2011

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Determination of radical densities by optical emission spectroscopy during the ECR plasma deposition of Si-C-N : H films using TMS as a precursor

Plasma sources science & technology, 2002-08, Vol.11 (3), p.351-359, Article 318

2002

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Optical properties of nitrogen-rich carbon films deposited by d.c. magnetron sputtering

Diamond and related materials, 1997, Vol.6 (1), p.33-40

1997

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Determination of energy modulations of negative oxygen ions during pulsed magnetron sputtering of magnesium oxide

Plasma sources science & technology, 2011-06, Vol.20 (3), p.035020

2011

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Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges

New journal of physics, 2008-12, Vol.10 (12), p.123008

2008

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Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation

Surface & coatings technology, 2006-12, Vol.201 (7), p.3959-3963

2006

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Corrigendum to “Facing-target magnetron operation for the deposition of CN thin films”

Surface & coatings technology, 2004-02, Vol.179 (1), p.118

2004

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Corrigendum to “Facing-target magnetron operation for the deposition of CN x thin films” : [Surf. Coat. Technol. 174–175 (2003) 658–664]

Surface & coatings technology, 2004, Vol.179 (1), p.118-118

2004

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Studies of the temporal behaviour of a pulsed magnetron deposition discharge

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.630-633

2005

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Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure

Surface & coatings technology, 2005-11, Vol.200 (5), p.1676-1682

2005

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Facing-target magnetron operation for the deposition of CN x thin films

Surface & coatings technology, 2003, Vol.174, p.658-664

2003

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Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes

Surface & coatings technology, 2004-11, Vol.188, p.384-391

2004

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Facing-target magnetron operation for the deposition of CNx thin films

Surface & coatings technology, 2003-09, Vol.174-175, p.658-664

2003

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Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering

Journal of applied physics, 2003-02, Vol.93 (4), p.2009-2014

2003

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Characterisation of a BN magnetron sputtering process with an additional aluminium sputter electrode

Surface & coatings technology, 2003-03, Vol.166 (1), p.51-59

2003

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Formation of c-BN thin films under reduced ion impact

Surface & coatings technology, 1997-06, Vol.92 (1), p.129-134

1997

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Facing-target magnetron operation for the deposition of CNxthin films

Surface & coatings technology, 2003, Vol.174-75, p.658-664

2003

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Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing

Journal of applied physics, 2001-08, Vol.90 (4), p.1703-1709

2001

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Process diagnostics during the deposition of cubic boron nitride

Surface & coatings technology, 1997-04, Vol.90 (3), p.275-284

1997

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Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes

Surface & coatings technology, 2004, Vol.188-89, p.384-391

2004

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Spectroscopic studies of a magnetron sputtering discharge for boron nitride deposition

Surface & coatings technology, 1998-02, Vol.99 (3), p.266-273

1998

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Influence of the Dehydration on Location of Both Sodium and Calcium Cations in 5A Zeolite – An In Situ X-Ray Diffraction Study

Materials science forum, 2004-01, Vol.443-444, p.315-318

2004

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Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions

A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges

AC powered reactive magnetron deposition of indium tin oxide (ITO) films from a metallic target

Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions

Determination of radical densities by optical emission spectroscopy during the ECR plasma deposition of Si-C-N : H films using TMS as a precursor

Optical properties of nitrogen-rich carbon films deposited by d.c. magnetron sputtering

Determination of energy modulations of negative oxygen ions during pulsed magnetron sputtering of magnesium oxide

Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges

Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation

Corrigendum to “Facing-target magnetron operation for the deposition of CN thin films”

Corrigendum to “Facing-target magnetron operation for the deposition of CN x thin films” : [Surf. Coat. Technol. 174–175 (2003) 658–664]

Studies of the temporal behaviour of a pulsed magnetron deposition discharge

Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure

Facing-target magnetron operation for the deposition of CN x thin films

Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes

Facing-target magnetron operation for the deposition of CNx thin films

Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering

Characterisation of a BN magnetron sputtering process with an additional aluminium sputter electrode

Formation of c-BN thin films under reduced ion impact

Facing-target magnetron operation for the deposition of CNxthin films

Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing

Process diagnostics during the deposition of cubic boron nitride

Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes

Spectroscopic studies of a magnetron sputtering discharge for boron nitride deposition

Influence of the Dehydration on Location of Both Sodium and Calcium Cations in 5A Zeolite – An In Situ X-Ray Diffraction Study

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