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Model-based image quality optimization for submicron direct laser writing

AIP advances, 2020-12, Vol.10 (12), p.125121-125121-7

2020

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Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Microsystems & nanoengineering, 2023-03, Vol.9 (1), p.40-40, Article 40

2023

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Fast source mask co-optimization method for high-NA EUV lithography

Opto-Electronic Advances, 2024-01, Vol.7 (4), p.230235-230235

2024

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Achieving high aspect ratio in plasmonic lithography for practical applications with sub-20 nm half pitch

Optics express, 2022-06, Vol.30 (12), p.20589-20604

2022

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Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

Guangxué xuébào, 2019-12, Vol.39 (12), p.1222002

2019

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Influence of Optical System Aberration on Critical Dimension of EUV Lithography Imaging

Guangxué xuébào, 2019-12, Vol.39 (12), p.1222001

2019

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Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

Guangxué xuébào, 2020-02, Vol.40 (4), p.422002

2020

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A straightforward and CMOS-compatible nanofabrication technique of periodic SiO2 nanohole arrays

Nanotechnology, 2015-10, Vol.26 (41), p.415303

2015

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Machine Learning based Optical Proximity Correction Techniques

Journal of microelectronic manufacturing, 2020-12, Vol.3 (4), p.1-8

2020

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Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Guangxué xuébào, 2020-11, Vol.40 (21), p.2122001

2020

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Study on Simulation and Profile Prediction of Atomic Layer Deposition

Journal of microelectronic manufacturing, 2020-10, Vol.3 (3), p.1-8

2020

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Recognition and Visualization of Lithography Defects based on Transfer Learning

Journal of microelectronic manufacturing, 2020-10, Vol.3 (3), p.1-8

2020

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Method for optical proximity correction based on a vector imaging model

Applied optics (2004), 2024-04, Vol.63 (10), p.2719

2024

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SCAPSM: attenuated phase-shift mask structure for EUV lithography

Applied optics (2004), 2024-03, Vol.63 (9), p.2263

2024

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Mask structure optimization for beyond EUV lithography

Optics letters, 2024-07, Vol.49 (13), p.3604

2024

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Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

Journal of microelectronic manufacturing, 2019-06, Vol.2 (2), p.1-6

2019

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Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

Applied optics (2004), 2024-06, Vol.63 (18), p.4809

2024

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Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithography

Applied optics (2004), 2022-07, Vol.61 (20), p.6023

2022

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Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuations

Optics express, 2024-02, Vol.32 (4), p.5323-5338

2024

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Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning

Nanoscale, 2024-02, Vol.16 (8), p.4212-4218

2024

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Decomposition-learning-based thick-mask model for partially coherent lithography system

Optics express, 2023-06, Vol.31 (12), p.20321-20337

2023

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Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography

Applied optics (2004), 2023-02, Vol.62 (4), p.927

2023

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Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography

The journal of physical chemistry letters, 2024-08, Vol.15 (34), p.8715-8720

2024

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Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5 nm technology node

Applied optics (2004), 2023-09, Vol.62 (27), p.7270

2023

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Fast diffraction model of an EUV mask based on asymmetric patch data fitting

Applied optics (2004), 2023-09, Vol.62 (25), p.6561

2023

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Model-based image quality optimization for submicron direct laser writing

Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Fast source mask co-optimization method for high-NA EUV lithography

Achieving high aspect ratio in plasmonic lithography for practical applications with sub-20 nm half pitch

Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

Influence of Optical System Aberration on Critical Dimension of EUV Lithography Imaging

Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

A straightforward and CMOS-compatible nanofabrication technique of periodic SiO2 nanohole arrays

Machine Learning based Optical Proximity Correction Techniques

Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Study on Simulation and Profile Prediction of Atomic Layer Deposition

Recognition and Visualization of Lithography Defects based on Transfer Learning

Method for optical proximity correction based on a vector imaging model

SCAPSM: attenuated phase-shift mask structure for EUV lithography

Mask structure optimization for beyond EUV lithography

Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography

Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithography

Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuations

Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning

Decomposition-learning-based thick-mask model for partially coherent lithography system

Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography

Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography

Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5 nm technology node

Fast diffraction model of an EUV mask based on asymmetric patch data fitting

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