UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Impact of cyclic plasma treatment on oxygen vacancy defects in TiN/HfZrO/SiON/Si gate stacks

Applied physics letters, 2015-05, Vol.106 (19)

2015

Volltextzugriff (PDF)

Multilevel Resistive Switching in Hf-Based RRAM

ECS transactions, 2019-04, Vol.89 (3), p.39-44

2019

Volltextzugriff (PDF)

Dielectrics and Metal Stack Engineering for Multilevel Resistive Random-Access Memory

ECS journal of solid state science and technology, 2020-01, Vol.9 (5), p.53004

2020

Volltextzugriff (PDF)

Bilayer Dielectrics for RRAM Devices

ECS transactions, 2018-01, Vol.86 (2), p.77-83

2018

Volltextzugriff (PDF)

Electrically Scaled Hafnium Oxide Based Ge Devices

ECS transactions, 2016, Vol.75 (5), p.135-140

2016

Volltextzugriff (PDF)

Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation

ECS transactions, 2016, Vol.72 (4), p.303-312

2016

Volltextzugriff (PDF)

Post Plasma Oxidation Processed ALD Al 2 O 3 /Hf 1-x Zr x O 2 Thin Films on Ge Substrates: Reliability

ECS journal of solid state science and technology, 2018, Vol.7 (2), p.N1-N6

2018

Volltextzugriff (PDF)

(Invited) Process and Integration of Dielectrics Required for 10nm and Beyond Scaling

ECS transactions, 2016, Vol.72 (2), p.319-327

2016

Volltextzugriff (PDF)

Electrical Characterization of Dry and Wet Processed Interface Layer in Ge/High-K Devices

ECS transactions, 2015, Vol.69 (5), p.313-322

2015

Volltextzugriff (PDF)

In Situ Ramp Anneal X-ray Diffraction Study of Atomic Layer Deposited Ultrathin TaN and Ta 1-x Al x N y Films for Cu Diffusion Barrier Applications

ECS journal of solid state science and technology, 2016, Vol.5 (9), p.P509-P513

2016

Volltextzugriff (PDF)

(Invited) Passivation Schemes for Ge High-K Metal Gate MOSFETs on Si for VLSI Production

ECS transactions, 2014, Vol.61 (2), p.89-96

2014

Volltextzugriff (PDF)

Electrical Enhancement and Higher-K Engineering in Ultra-Thin Atomic Layer Deposited Hf 1-x Al x O y Films

ECS journal of solid state science and technology, 2015, Vol.4 (2), p.N1-N5

2015

Volltextzugriff (PDF)

Cyclic Plasma Treatment during ALD Hf 1-x Zr x O 2 Deposition

ECS journal of solid state science and technology, 2014, Vol.3 (5), p.N83-N88

2014

Volltextzugriff (PDF)

Effective Schottky Barrier Height modulation using dielectric dipoles for source/drain specific contact resistivity improvement

2012 International Electron Devices Meeting, 2012, p.18.6.1-18.6.4

2012

Volltextzugriff (PDF)

High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes

ECS transactions, 2008, Vol.16 (4), p.291-305

2008

Volltextzugriff (PDF)

Engineering Band-Edge High-κ/Metal Gate n-MOSFETs with Cap Layers Containing Group IIA and IIIB Elements by Atomic Layer Deposition

ECS transactions, 2009, Vol.19 (1), p.253-261

2009

Volltextzugriff (PDF)

Optimizing Band-Edge High-κ/Metal Gate n-MOSFETs with ALD Lanthanum Oxide Cap Layers: Oxidant and Positioning Effects

ECS transactions, 2010, Vol.33 (3), p.75-81

2010

Volltextzugriff (PDF)

EOT Scaling and Flatband Voltage Shift with Al Addition into TiN

ECS transactions, 2011, Vol.41 (3), p.317-323

2011

Volltextzugriff (PDF)

Process Characteristics and Physical Properties of MO-ALD ZrO2 Thin Films Deposited in a 300 mm Deposition System

ECS transactions, 2008, Vol.13 (1), p.89-99

2008

Volltextzugriff (PDF)

Process and Electrical Characteristics of MO-ALD HfO2 Films for High-k Gate Applications Grown in a Production Worthy 300 mm Deposition System

ECS transactions, 2007, Vol.11 (3), p.55-69

2007

Volltextzugriff (PDF)

Hardware Algorithm Co-optimization on Resistive RAM Cross-bar Array for Scalable Analog Compute Technology for AI application

2021 Silicon Nanoelectronics Workshop (SNW), 2021, p.1-2

2021

Volltextzugriff (PDF)

Mechanistic understanding of mobility degradation on gate-last ZrO2 with medium thermal budget annealing

Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2014, p.1-2

2014

Volltextzugriff (PDF)

Impact of Slot Plane Antenna Annealing on Carrier Transport Mechanism and Reliability on ZrO2/Al2O3/Ge Gate Stack

IEEE transactions on device and materials reliability, 2017-06, Vol.17 (2), p.349-354

2017

Volltextzugriff (PDF)

Impact of Slot Plane Antenna Annealing on Carrier Transport Mechanism and Reliability on ZrO 2 /Al 2 O 3 /Ge Gate Stack

IEEE transactions on device and materials reliability, 2017-06, Vol.17 (2), p.349-354

2017

Volltextzugriff (PDF)

The Clustering of Other Chronic Inflammatory Diseases in Inflammatory Bowel Disease: A Population-Based Study

Gastroenterology (New York, N.Y. 1943), 2005-09, Vol.129 (3), p.827-836

2005

Volltextzugriff (PDF)

1 – 25 von 128

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(83)
Mit Volltextzugriff
(96)

Publikationsform

Sprache

Erscheinungsjahr

n.n

Thema

Science & Technology
(66)
Physical Sciences
(35)
Physics
(35)
Technology
(27)
Life Sciences & Biomedicine
(19)
Engineering
(18)
Engineering, Electrical & Electronic
(16)
Humans
(14)
Materials Science
(14)
Physics, Nuclear
(11)
Electrochemistry
(9)
Materials Science, Multidisciplinary
(9)
Physics, Applied
(8)
Biological And Medical Sciences
(7)
Male
(7)
Medical Sciences
(7)
Physics, Multidisciplinary
(7)
Adult
(6)
Anesthesiology
(6)
Female
(6)

15 weitere anzeigen...

Weniger anzeigen...

Neu hinzugefügt

... seit 90 Tagen
(1)

Menü

Weitere Dienste

Einstellungen

Impact of cyclic plasma treatment on oxygen vacancy defects in TiN/HfZrO/SiON/Si gate stacks

Multilevel Resistive Switching in Hf-Based RRAM

Dielectrics and Metal Stack Engineering for Multilevel Resistive Random-Access Memory

Bilayer Dielectrics for RRAM Devices

Electrically Scaled Hafnium Oxide Based Ge Devices

Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation

Post Plasma Oxidation Processed ALD Al 2 O 3 /Hf 1-x Zr x O 2 Thin Films on Ge Substrates: Reliability

(Invited) Process and Integration of Dielectrics Required for 10nm and Beyond Scaling

Electrical Characterization of Dry and Wet Processed Interface Layer in Ge/High-K Devices

In Situ Ramp Anneal X-ray Diffraction Study of Atomic Layer Deposited Ultrathin TaN and Ta 1-x Al x N y Films for Cu Diffusion Barrier Applications

(Invited) Passivation Schemes for Ge High-K Metal Gate MOSFETs on Si for VLSI Production

Electrical Enhancement and Higher-K Engineering in Ultra-Thin Atomic Layer Deposited Hf 1-x Al x O y Films

Cyclic Plasma Treatment during ALD Hf 1-x Zr x O 2 Deposition

Effective Schottky Barrier Height modulation using dielectric dipoles for source/drain specific contact resistivity improvement

High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes

Engineering Band-Edge High-κ/Metal Gate n-MOSFETs with Cap Layers Containing Group IIA and IIIB Elements by Atomic Layer Deposition

Optimizing Band-Edge High-κ/Metal Gate n-MOSFETs with ALD Lanthanum Oxide Cap Layers: Oxidant and Positioning Effects

EOT Scaling and Flatband Voltage Shift with Al Addition into TiN

Process Characteristics and Physical Properties of MO-ALD ZrO2 Thin Films Deposited in a 300 mm Deposition System

Process and Electrical Characteristics of MO-ALD HfO2 Films for High-k Gate Applications Grown in a Production Worthy 300 mm Deposition System

Hardware Algorithm Co-optimization on Resistive RAM Cross-bar Array for Scalable Analog Compute Technology for AI application

Mechanistic understanding of mobility degradation on gate-last ZrO2 with medium thermal budget annealing

Impact of Slot Plane Antenna Annealing on Carrier Transport Mechanism and Reliability on ZrO2/Al2O3/Ge Gate Stack

Impact of Slot Plane Antenna Annealing on Carrier Transport Mechanism and Reliability on ZrO 2 /Al 2 O 3 /Ge Gate Stack

The Clustering of Other Chronic Inflammatory Diseases in Inflammatory Bowel Disease: A Population-Based Study

Suchergebnisse filtern