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Research Update: Electron beam-based metrology after CMOS

APL materials, 2018-07, Vol.6 (7), p.070701-070701-14

2018

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Modeling the Point-Spread Function in Helium-Ion Lithography

Scanning, 2012-03, Vol.34 (2), p.121-128

2012

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Simulated SEM images for resolution measurement

Scanning, 2008-09, Vol.30 (5), p.381-391

2008

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Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library

Ultramicroscopy, 2015-07, Vol.154 (C), p.15-28

2015

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Scanning electron microscope measurement of width and shape of 10nm patterned lines using a JMONSEL-modeled library

Ultramicroscopy, 2015-07, Vol.154, p.15-28

2015

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Sample preparation protocols for realization of reproducible characterization of single-wall carbon nanotubes

Metrologia, 2009-12, Vol.46 (6), p.682-692

2009

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Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching

Journal of applied physics, 2002-06, Vol.91 (12), p.10044-10050

2002

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Scanning electron microscope dimensional metrology using a model-based library

Surface and interface analysis, 2005-11, Vol.37 (11), p.951-958

2005

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Widening the Window of Particle Beam Technology: Helium Ion Microscopy

Microscopy and microanalysis, 2012-07, Vol.18 (S2), p.802-803

2012

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Progression of Focused Helium Ion Beam Milling in Gold Substrates

Microscopy and microanalysis, 2015-08, Vol.21 (S3), p.1979-1980

2015

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Electron beam-based metrology after CMOS

APL materials, 2018, Vol.6

2018

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Focused Helium Ion Beam Nanomachining of Thin Membranes vs. Bulk Substrates

Microscopy and microanalysis, 2014-08, Vol.20 (S3), p.336-337

2014

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Helium Ion Nanomachining in Membranes and Bulk Substrates

Microscopy and microanalysis, 2013-08, Vol.19 (S2), p.910-911

2013

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A Study of Helium Ion Beam Substrate Interaction Volume on Nanomachining Profiles in Bulk Substrates and Thin Film Membranes

Microscopy and microanalysis, 2012-07, Vol.18 (S2), p.808-809

2012

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Understanding Surface Modification of Silicon-based Materials using Gas Field Ion Source FIB for Nano-Machining Applications

Microscopy and microanalysis, 2012-07, Vol.18 (S2), p.830-831

2012

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Image sharpness measurement in the scanning electron microscope-Part III

Scanning, 1999-07, Vol.21 (4), p.246-252

1999

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Application of the low-loss scanning electron microscope image to integrated circuit technology. Part 1- applications to accurate dimension measurements

Scanning, 2001-09, Vol.23 (5), p.298-304

2001

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Reference Material (RM) 8820: A New Scanning Electron Microscope Scale Calibration Artifact

Microscopy and microanalysis, 2009-07, Vol.15 (S2), p.668-669

2009

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Scanning Electron and Ion Microscope-based Size and Shape Metrology at the Nanometer Scale

Microscopy and microanalysis, 2008-08, Vol.14 (S2), p.118-119

2008

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Artificial SEM Images for Testing Resolution-Measurement Methods

Microscopy and microanalysis, 2008-08, Vol.14 (S2), p.910-911

2008

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X-Ray lithography mask metrology: use of transmitted electrons in an SEM for linewidth measurement

Journal of research of the National Institute of Standards and Technology, 1993-07, Vol.98 (4), p.415-445

1993

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Is Low Accelerating Voltage Always the Best for Semiconductor Inspection and Metrology?

Microscopy and microanalysis, 2003-08, Vol.9 (S02), p.978-979

2003

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Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2009-11, Vol.27 (6), p.2702-2706

2009

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Advanced electron microscopy needs for nanotechnology and nanomanufacturing

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-11, Vol.23 (6), p.3015-3022

2005

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New Scanning Electron Microscope Sharpness Standard: NIST Reference Material 8091 (Rm 8091)

Microscopy and microanalysis, 2001-08, Vol.7 (S2), p.494-495

2001

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Research Update: Electron beam-based metrology after CMOS

Modeling the Point-Spread Function in Helium-Ion Lithography

Simulated SEM images for resolution measurement

Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library

Scanning electron microscope measurement of width and shape of 10nm patterned lines using a JMONSEL-modeled library

Sample preparation protocols for realization of reproducible characterization of single-wall carbon nanotubes

Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching

Scanning electron microscope dimensional metrology using a model-based library

Widening the Window of Particle Beam Technology: Helium Ion Microscopy

Progression of Focused Helium Ion Beam Milling in Gold Substrates

Electron beam-based metrology after CMOS

Focused Helium Ion Beam Nanomachining of Thin Membranes vs. Bulk Substrates

Helium Ion Nanomachining in Membranes and Bulk Substrates

A Study of Helium Ion Beam Substrate Interaction Volume on Nanomachining Profiles in Bulk Substrates and Thin Film Membranes

Understanding Surface Modification of Silicon-based Materials using Gas Field Ion Source FIB for Nano-Machining Applications

Image sharpness measurement in the scanning electron microscope-Part III

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part 1- applications to accurate dimension measurements

Reference Material (RM) 8820: A New Scanning Electron Microscope Scale Calibration Artifact

Scanning Electron and Ion Microscope-based Size and Shape Metrology at the Nanometer Scale

Artificial SEM Images for Testing Resolution-Measurement Methods

X-Ray lithography mask metrology: use of transmitted electrons in an SEM for linewidth measurement

Is Low Accelerating Voltage Always the Best for Semiconductor Inspection and Metrology?

Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

Advanced electron microscopy needs for nanotechnology and nanomanufacturing

New Scanning Electron Microscope Sharpness Standard: NIST Reference Material 8091 (Rm 8091)

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