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Valleytronics: Opportunities, Challenges, and Paths Forward

Small (Weinheim an der Bergstrasse, Germany), 2018-09, Vol.14 (38), p.e1801483-n/a

2018

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Mechanisms of activation of the transcription factor Nrf2 by redox stressors, nutrient cues, and energy status and the pathways through which it attenuates degenerative disease

Free radical biology & medicine, 2015-11, Vol.88 (Pt B), p.108-146

2015

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Low-thermal-budget synthesis of monolayer molybdenum disulfide for silicon back-end-of-line integration on a 200 mm platform

Nature nanotechnology, 2023-05, Vol.18 (5), p.456-463

2023

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Progress Toward Diamond Power Field‐Effect Transistors

Physica status solidi. A, Applications and materials science, 2018-11, Vol.215 (22), p.n/a

2018

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Mapping the genetic architecture of human traits to cell types in the kidney identifies mechanisms of disease and potential treatments

Nature genetics, 2021-09, Vol.53 (9), p.1322-1333

2021

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Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides

ACS applied materials & interfaces, 2020-09, Vol.12 (38), p.43250-43256

2020

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Work-Function-Tuned TiN Metal Gate FDSOI Transistors for Subthreshold Operation

IEEE transactions on electron devices, 2011-02, Vol.58 (2), p.419-426

2011

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IEEE_Xplore

Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

Journal of applied physics, 2015-07, Vol.118 (4)

2015

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FDSOI Process Technology for Subthreshold-Operation Ultralow-Power Electronics

Proceedings of the IEEE, 2010-02, Vol.98 (2), p.333-342

2010

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IEEE_Xplore

Ultra-compact nonvolatile phase shifter based on electrically reprogrammable transparent phase change materials

PhotoniX, 2022-10, Vol.3 (1), p.1-13, Article 26

2022

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Time-Resolved Temperature Mapping Leveraging the Strong Thermo-Optic Effect in Phase-Change Materials

ACS photonics, 2023-10, Vol.10 (10), p.3576-3585

2023

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Transient Tap Couplers for Wafer-Level Photonic Testing Based on Optical Phase Change Materials

ACS photonics, 2021-07, Vol.8 (7), p.1903-1908

2021

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Comparing the thermal performance and endurance of resistive and PIN silicon microheaters for phase-change photonic applications

Optical materials express, 2023-06, Vol.13 (6), p.1677

2023

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Phase and Amplitude Trimming of Photonic Integrated Circuits Using Phase Change Materials

2022 IEEE Photonics Society Summer Topicals Meeting Series (SUM), 2022, p.1-2

2022

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IEEE_Xplore

Etching selectivity of indium tin oxide to photoresist in high density chlorine- and ethylene-containing plasmas

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2013-03, Vol.31 (2)

2013

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An Open‐Source Multifunctional Testing Platform for Optical Phase Change Materials

Small science, 2023-12, Vol.3 (12), p.n/a

2023

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Phase Transformation and Switching Behavior of Magnetron Plasma Sputtered Ge2Sb2Se4Te

Advanced photonics research, 2022-10, Vol.3 (10), p.n/a

2022

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The effects of low temperature and pressure on the fracture behaviors of organosilicate thin films

Journal of materials research, 2011-10, Vol.26 (19), p.2524-2532

2011

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Plasma–surface kinetics and simulation of feature profile evolution in Cl2+HBr etching of polysilicon

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-11, Vol.20 (6), p.2106-2114

2002

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Multi‐Level Electro‐Thermal Switching of Optical Phase‐Change Materials Using Graphene

Advanced photonics research, 2021-01, Vol.2 (1), p.n/a

2021

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Liquid Droplet Dispersions Formed by Homogeneous Liquid−Liquid Nucleation: “The Ouzo Effect”

Langmuir, 2003-05, Vol.19 (10), p.4105-4110

2003

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Silicon etching yields in F2, Cl2, Br2, and HBr high density plasmas

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-09, Vol.19 (5), p.2197-2206

2001

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Valleytronics in 2D Materials

Beyond-CMOS, 2023

Cresti, Alessandro

2023

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Toward Accurate Thermal Modeling of Phase Change Material Based Photonic Devices

Small (Weinheim an der Bergstrasse, Germany), 2023-12, Vol.19 (50), p.e2304145-n/a

2023

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Etching of organosilicate glass low-k dielectric films in halogen plasmas

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-05, Vol.20 (3), p.651-660

2002

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Valleytronics: Opportunities, Challenges, and Paths Forward

Mechanisms of activation of the transcription factor Nrf2 by redox stressors, nutrient cues, and energy status and the pathways through which it attenuates degenerative disease

Low-thermal-budget synthesis of monolayer molybdenum disulfide for silicon back-end-of-line integration on a 200 mm platform

Progress Toward Diamond Power Field‐Effect Transistors

Mapping the genetic architecture of human traits to cell types in the kidney identifies mechanisms of disease and potential treatments

Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides

Work-Function-Tuned TiN Metal Gate FDSOI Transistors for Subthreshold Operation

Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

FDSOI Process Technology for Subthreshold-Operation Ultralow-Power Electronics

Ultra-compact nonvolatile phase shifter based on electrically reprogrammable transparent phase change materials

Time-Resolved Temperature Mapping Leveraging the Strong Thermo-Optic Effect in Phase-Change Materials

Transient Tap Couplers for Wafer-Level Photonic Testing Based on Optical Phase Change Materials

Comparing the thermal performance and endurance of resistive and PIN silicon microheaters for phase-change photonic applications

Phase and Amplitude Trimming of Photonic Integrated Circuits Using Phase Change Materials

Etching selectivity of indium tin oxide to photoresist in high density chlorine- and ethylene-containing plasmas

An Open‐Source Multifunctional Testing Platform for Optical Phase Change Materials

Phase Transformation and Switching Behavior of Magnetron Plasma Sputtered Ge2Sb2Se4Te

The effects of low temperature and pressure on the fracture behaviors of organosilicate thin films

Plasma–surface kinetics and simulation of feature profile evolution in Cl2+HBr etching of polysilicon

Multi‐Level Electro‐Thermal Switching of Optical Phase‐Change Materials Using Graphene

Liquid Droplet Dispersions Formed by Homogeneous Liquid−Liquid Nucleation: “The Ouzo Effect”

Silicon etching yields in F2, Cl2, Br2, and HBr high density plasmas

Valleytronics in 2D Materials

Toward Accurate Thermal Modeling of Phase Change Material Based Photonic Devices

Etching of organosilicate glass low-k dielectric films in halogen plasmas

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