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Graphitic carbon nitride nano-emitters on silicon: a photoelectrochemical heterojunction composed of earth-abundant materials for enhanced evolution of hydrogen

Journal of materials chemistry. A, Materials for energy and sustainability, 2014-08, Vol.2 (32), p.12697-12702

2014

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Nature of Hydrophilic Aluminum Fluoride and Oxyaluminum Fluoride Surfaces Resulting from XeF2 Treatment of Al and Al2O3

Journal of physical chemistry. C, 2011-11, Vol.115 (43), p.21351-21357

2011

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Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption

Journal of physical chemistry. C, 2011-08, Vol.115 (33), p.16701-16710

2011

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Colored porous silicon as support for plasmonic nanoparticles

Journal of applied physics, 2012-04, Vol.111 (8), p.084302-084302-10

2012

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Modification of the Adhesive Properties of XeF2-Etched Aluminum Surfaces by Deposition of Organic Self-Assembled Monolayers

Journal of physical chemistry. C, 2010-12, Vol.114 (51), p.22566-22572

2010

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Comparative time-resolved study of the XeF2 etching of Mo and Si

Journal of applied physics, 2010-12, Vol.108 (11)

2010

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Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052805-052805

2017

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Initial nitride formation during plasma-nitridation of cobalt surfaces

Applied physics letters, 2016-08, Vol.109 (9)

2016

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Resonant tunneling in a quantum step : Inverse photoemission spectroscopy of Ag/Al(100)

Physical review. B, Condensed matter and materials physics, 2005-08, Vol.72 (7), p.073401.1-073401.4, Article 073401

2005

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Correction to Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption

Journal of physical chemistry. C, 2011-12, Vol.115 (47), p.23652-23652

2011

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Inverse photoemission spectroscopy of Al(100)

Physical review. B, Condensed matter and materials physics, 2005-04, Vol.71 (15), p.155416.1-155416.5, Article 155416

2005

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Nature of Hydrophilic Aluminum Fluoride and Oxyaluminum Fluoride Surfaces Resulting from XeF 2 Treatment of Al and Al 2 O 3

Journal of physical chemistry. C, 2011-11, Vol.115 (43), p.21351-21357

2011

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XeF 2 -induced removal of SiO 2 near Si surfaces at 300 K:An unexpected proximity effect

Journal of applied physics, 2010-12, Vol.108 (11), p.114914-114914-11

2010

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Comparative time-resolved study of the XeF 2 etching of Mo and Si

Journal of applied physics, 2010-12, Vol.108 (11), p.114913-114913-7

2010

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XeF 2 -induced removal of SiO2 near Si surfaces at 300 K: An unexpected proximity effect

Journal of applied physics, 2010-12, Vol.108 (11)

2010

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Modification of the Adhesive Properties of XeF 2 -Etched Aluminum Surfaces by Deposition of Organic Self-Assembled Monolayers

Journal of physical chemistry. C, 2010-12, Vol.114 (51), p.22566-22572

2010

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Atomically-precise three-dimensional top down fabrication

2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013, p.764-767

2013

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Graphitic carbon nitride nano-emitters on silicon: a photoelectrochemical heterojunction composed of earth-abundant materials for enhanced evolution of hydrogen

Nature of Hydrophilic Aluminum Fluoride and Oxyaluminum Fluoride Surfaces Resulting from XeF2 Treatment of Al and Al2O3

Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption

Colored porous silicon as support for plasmonic nanoparticles

Modification of the Adhesive Properties of XeF2-Etched Aluminum Surfaces by Deposition of Organic Self-Assembled Monolayers

Comparative time-resolved study of the XeF2 etching of Mo and Si

Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces

Initial nitride formation during plasma-nitridation of cobalt surfaces

Resonant tunneling in a quantum step : Inverse photoemission spectroscopy of Ag/Al(100)

Correction to Effect of Titanium Doping of Al(111) Surfaces on Alane Formation, Mobility, and Desorption

Inverse photoemission spectroscopy of Al(100)

Nature of Hydrophilic Aluminum Fluoride and Oxyaluminum Fluoride Surfaces Resulting from XeF 2 Treatment of Al and Al 2 O 3

XeF 2 -induced removal of SiO 2 near Si surfaces at 300 K:An unexpected proximity effect

Comparative time-resolved study of the XeF 2 etching of Mo and Si

XeF 2 -induced removal of SiO2 near Si surfaces at 300 K: An unexpected proximity effect

Modification of the Adhesive Properties of XeF 2 -Etched Aluminum Surfaces by Deposition of Organic Self-Assembled Monolayers

Atomically-precise three-dimensional top down fabrication

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