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On the etching of InP in alkaline K3Fe(CN)6 solutions

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1994-02, Vol.365 (1-2), p.59-69

1994

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Chemical and electrochemical interaction of acidic H2O2 solutions with (100) InP

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1996-06, Vol.410 (1), p.31-42

1996

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On the etching of InP in alkaline K 3Fe(CN) 6 solutions

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1994, Vol.365 (1), p.59-69

1994

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Some Fundamental Aspects of Profile Etching at InP Surfaces

Journal of the Electrochemical Society, 1995-09, Vol.142 (9), p.3226-3232

1995

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The anodic dissolution of InP studied by the optoelectrical impedance method—1. Competition between electron injection and hole capture at InP photoanodes

Electrochimica acta, 1993-12, Vol.38 (17), p.2559-2567

1993

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Chemical and electrochemical interaction of acidic H 2O 2 solutions with (100) InP

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1996, Vol.410 (1), p.31-42

1996

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Investigation on the electrochemistry and etching at the (100) GaAs ¦ HIO 3 interface

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1996, Vol.411 (1), p.67-72

1996

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Investigation on the electrochemistry and etching at the (100)GaAs |HIO3 interface

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1996-08, Vol.411 (1-2), p.67-72

1996

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The influence of the band edge position upon the reduction kinetics and the etching behaviour at the GaP-Fe(CN) 3−6 interface

Electrochimica acta, 1990, Vol.35 (9), p.1351-1358

1990

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(Photo-) electrochemical investigation of the photoetching of n- and p-type (100) InP in aqueous Fe 3+-containing solutions

Journal of electroanalytical chemistry and interfacial electrochemistry, 1991, Vol.313 (1), p.141-159

1991

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(Photo)-electrochemical investigation of the photoetching of n- and p-type (100) InP in aqueous Fe3+-containing solutions

Journal of electroanalytical chemistry and interfacial electrochemistry, 1991-09, Vol.313 (1-2), p.141-159

1991

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The anodic dissolution of InP studied by the optoelectrical impedance method—2. Interaction between anodic and chemical etching of InP in iodic acid solutions

Electrochimica acta, 1993-12, Vol.38 (17), p.2569-2575

1993

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On the etching of InP in alkaline K3Fe(CN)6 solutions

Chemical and electrochemical interaction of acidic H2O2 solutions with (100) InP

On the etching of InP in alkaline K 3Fe(CN) 6 solutions

Some Fundamental Aspects of Profile Etching at InP Surfaces

The anodic dissolution of InP studied by the optoelectrical impedance method—1. Competition between electron injection and hole capture at InP photoanodes

Chemical and electrochemical interaction of acidic H 2O 2 solutions with (100) InP

Investigation on the electrochemistry and etching at the (100) GaAs ¦ HIO 3 interface

Investigation on the electrochemistry and etching at the (100)GaAs |HIO3 interface

The influence of the band edge position upon the reduction kinetics and the etching behaviour at the GaP-Fe(CN) 3−6 interface

(Photo-) electrochemical investigation of the photoetching of n- and p-type (100) InP in aqueous Fe 3+-containing solutions

(Photo)-electrochemical investigation of the photoetching of n- and p-type (100) InP in aqueous Fe3+-containing solutions

The anodic dissolution of InP studied by the optoelectrical impedance method—2. Interaction between anodic and chemical etching of InP in iodic acid solutions

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