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Development of a ReaxFF Reactive Force Field for Fe/Cr/O/S and Application to Oxidation of Butane over a Pyrite-Covered Cr2O3 Catalyst

ACS catalysis, 2015-12, Vol.5 (12), p.7226-7236

2015

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Development and Validation of a ReaxFF Reactive Force Field for Fe/Al/Ni Alloys: Molecular Dynamics Study of Elastic Constants, Diffusion, and Segregation

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2012-12, Vol.116 (49), p.12163-12174

2012

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Atomistic modeling of parylene-metal interactions for surface micro-structuring

Journal of molecular modeling, 2011-12, Vol.17 (12), p.3219-3228

Vasenkov, Alex V.

2011

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Reactive molecular dynamics study of Mo-based alloys under high-pressure, high-temperature conditions

Journal of applied physics, 2012-07, Vol.112 (1)

2012

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Ab initio based multiscale modeling of alloy surface segregation

Journal of physics. Condensed matter, 2012-12, Vol.24 (48), p.485006-485006

2012

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Multi-physics Peridynamic Modeling of Damage Processes in Protective Coatings

Journal of peridynamics and nonlocal modeling (Online), 2021-06, Vol.3 (2), p.167-183

Vasenkov, Alex V.

2021

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Modeling of magnetically enhanced capacitively coupled plasma sources: Ar/C4F8/O2 discharges

Journal of applied physics, 2004-02, Vol.95 (3), p.834-845

2004

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Angular anisotropy of electron energy distributions in inductively coupled plasmas

Journal of applied physics, 2003-11, Vol.94 (9), p.5522-5529

2003

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Mining connecting concepts from synthetic big data

Journal of computer science and systems biology, 2015, Vol.8 (3)

Vasenkov, Alex V

2015

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Electron velocity distributions in an inductively coupled plasma

IEEE transactions on plasma science, 2005-04, Vol.33 (2), p.388-389

2005

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Development of a ReaxFF Reactive Force Field for Fe/Cr/O/S and Application to Oxidation of Butane over a Pyrite-Covered Cr 2 O 3 Catalyst

ACS catalysis, 2015-12, Vol.5 (12), p.7226-7236

2015

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Hybrid Hierarchical Model for Damage and Fracture Analysis in Heterogeneous Material

Proceedings of the 4th World Congress on Integrated Computational Materials Engineering (ICME 2017), 2017, p.307-316

2017

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Big data is the future of material science

Journal of Material Science & Engineering, 2013, Vol.s2 (1)

V. Vasenkov, Alex

2013

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Harmonic content and time variation of electron energy distributions in high-plasma-density, low-pressure inductively coupled discharges

Journal of applied physics, 2003-08, Vol.94 (4), p.2223-2233

2003

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Electron energy distributions and anomalous skin depth effects in high-plasma-density inductively coupled discharges

Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 2002-12, Vol.66 (6 Pt 2), p.066411-066411, Article 066411

2002

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Accelerated material design

Journal of Material Science & Engineering, 2012, Vol.1 (3)

Vasenkov, Alex V

2012

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Properties of c-C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C4F8/O2 discharges

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2004-05, Vol.22 (3), p.511-530

2004

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Properties of C4F8 inductively coupled plasmas. I. Studies of Ar/c-C4F8 magnetically confined plasmas for etching of SiO2

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2004-05, Vol.22 (3), p.500-510

2004

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Computational Framework for Modeling of Multi-Scale Processes

Journal of computational and theoretical nanoscience, 2006-06, Vol.3 (3), p.453-458

2006

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Properties of c- C 4 F 8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar /c- C 4 F 8 /O 2 discharges

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2004-05, Vol.22 (3), p.511-530

2004

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Properties of C 4 F 8 inductively coupled plasmas. I. Studies of Ar /c- C 4 F 8 magnetically confined plasmas for etching of SiO 2

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2004-05, Vol.22 (3), p.500-510

2004

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Coupling Atomistic and Continuum Models for Multi-scale Simulations of Gas Flows

Computational Science, 2007, Vol.4487, p.858-865

2007

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Development of a ReaxFF Reactive Force Field for Fe/Cr/O/S and Application to Oxidation of Butane over a Pyrite-Covered Cr2O3 Catalyst

Development and Validation of a ReaxFF Reactive Force Field for Fe/Al/Ni Alloys: Molecular Dynamics Study of Elastic Constants, Diffusion, and Segregation

Atomistic modeling of parylene-metal interactions for surface micro-structuring

Reactive molecular dynamics study of Mo-based alloys under high-pressure, high-temperature conditions

Ab initio based multiscale modeling of alloy surface segregation

Multi-physics Peridynamic Modeling of Damage Processes in Protective Coatings

Modeling of magnetically enhanced capacitively coupled plasma sources: Ar/C4F8/O2 discharges

Angular anisotropy of electron energy distributions in inductively coupled plasmas

Mining connecting concepts from synthetic big data

Electron velocity distributions in an inductively coupled plasma

Development of a ReaxFF Reactive Force Field for Fe/Cr/O/S and Application to Oxidation of Butane over a Pyrite-Covered Cr 2 O 3 Catalyst

Hybrid Hierarchical Model for Damage and Fracture Analysis in Heterogeneous Material

Big data is the future of material science

Harmonic content and time variation of electron energy distributions in high-plasma-density, low-pressure inductively coupled discharges

Electron energy distributions and anomalous skin depth effects in high-plasma-density inductively coupled discharges

Accelerated material design

Properties of c-C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C4F8/O2 discharges

Properties of C4F8 inductively coupled plasmas. I. Studies of Ar/c-C4F8 magnetically confined plasmas for etching of SiO2

Computational Framework for Modeling of Multi-Scale Processes

Properties of c- C 4 F 8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar /c- C 4 F 8 /O 2 discharges

Properties of C 4 F 8 inductively coupled plasmas. I. Studies of Ar /c- C 4 F 8 magnetically confined plasmas for etching of SiO 2

Coupling Atomistic and Continuum Models for Multi-scale Simulations of Gas Flows

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