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Ion fraction map of He + scattered from a Si( [formula omitted])-(2×1) surface

Surface science, 2002-01, Vol.496 (3), p.187-195

2002

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Temperature effects in the early stages of titanium oxidation

Applied surface science, 1996-03, Vol.93 (3), p.247-253

1996

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Doping dependence of electronic charge transfer on Si(1 0 0)

Surface science, 2001-08, Vol.489 (1), p.L561-L567

2001

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Titanium oxide reduction in ion depth profiling

Applied surface science, 1999-09, Vol.151 (1), p.129-138

1999

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Oxide stoichiometry in the early stages of titanium oxidation

Surface science, 1993-07, Vol.292 (1), p.L795-L800

1993

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Surface structure and electron density dependence of scattered Ne + ion fractions from the Si(1 0 0)-(2×1) surface

Surface science, 2001, Vol.470 (3), p.255-264

2001

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Auger electron spectroscopy analysis of the first stages of thermally stimulated oxidation of GaAs(100)

Applied surface science, 1998, Vol.133 (1), p.65-72

1998

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Chemical reactivity of alkali-semiconductor interfaces : the case of K/GaAs(110) and K/Si(100) interfaces

Surface science, 1996-06, Vol.355 (1-3), p.100-108

1996

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Oxide stoichiometry in the early stages of titanium oxidation at low pressure

Journal of physics. Condensed matter, 1993-08, Vol.5 (33A), p.A157-A158

1993

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Chemical reactions at surfaces: titanium oxidation

Surface & coatings technology, 1999-12, Vol.122 (1), p.67-71

1999

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The oxidation of GaAs(100) studied by Auger electron spectroscopy and principal component analysis

Journal of physics. Condensed matter, 1993-08, Vol.5 (33A), p.A155-A156

1993

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Auger electron spectroscopy and principal component analysis of the first stages of oxidation in GaAs(100)

Surface and interface analysis, 1993-08, Vol.20 (9), p.761-765

1993

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Oxide stoichiometry in the early stages of titanium oxidation

Surface science letters, 1993-07, Vol.292 (1-2), p.L795-L800

1993

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Chemical reactions at surfaces: titanium oxidation

Surface & coatings technology, 1998-09, Vol.122 (1), p.67-71

1998

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Theoretical analysis of the electronic structure of pure and hydrated forms of As2O5

Physical review. B, Condensed matter, 1994-07, Vol.50 (4), p.2090-2094

1994

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Chemical reactivity of alkali-semiconductor interfaces: the case of [formula omitted] and [formula omitted] interfaces

Surface science, 1996-06, Vol.355 (1), p.100-108

1996

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Chemical reactivity of alkali-semiconductor interfaces: the case of K/GaAs(110) and K/Si(100) interfaces

Surface science, 1996-06, Vol.355 (103), p.100-108

1996

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Oxidation process in titanium thin films

Physical review. B, Condensed matter, 1997-05, Vol.55 (20), p.13925-13931

1997

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Oxide stoichiometry in the early stages of titanum oxidation

Surface science, 1993, Vol.292 (1-2), p.L795-L800

1993

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Theoretical analysis of the electronic structure of pure and hydrated forms of As 2 O 5

Physical review. B, Condensed matter, 1994-07, Vol.50 (4), p.2090-2094

1994

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Ion fraction map of He + scattered from a Si( [formula omitted])-(2×1) surface

Temperature effects in the early stages of titanium oxidation

Doping dependence of electronic charge transfer on Si(1 0 0)

Titanium oxide reduction in ion depth profiling

Oxide stoichiometry in the early stages of titanium oxidation

Surface structure and electron density dependence of scattered Ne + ion fractions from the Si(1 0 0)-(2×1) surface

Auger electron spectroscopy analysis of the first stages of thermally stimulated oxidation of GaAs(100)

Chemical reactivity of alkali-semiconductor interfaces : the case of K/GaAs(110) and K/Si(100) interfaces

Oxide stoichiometry in the early stages of titanium oxidation at low pressure

Chemical reactions at surfaces: titanium oxidation

The oxidation of GaAs(100) studied by Auger electron spectroscopy and principal component analysis

Auger electron spectroscopy and principal component analysis of the first stages of oxidation in GaAs(100)

Oxide stoichiometry in the early stages of titanium oxidation

Chemical reactions at surfaces: titanium oxidation

Theoretical analysis of the electronic structure of pure and hydrated forms of As2O5

Chemical reactivity of alkali-semiconductor interfaces: the case of [formula omitted] and [formula omitted] interfaces

Chemical reactivity of alkali-semiconductor interfaces: the case of K/GaAs(110) and K/Si(100) interfaces

Oxidation process in titanium thin films

Oxide stoichiometry in the early stages of titanum oxidation

Theoretical analysis of the electronic structure of pure and hydrated forms of As 2 O 5

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