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Spectroscopic determination of the structure of amorphous nitrogenated carbon films

Journal of applied physics, 1998-04, Vol.83 (8), p.4491-4500

1998

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A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

Thin solid films, 2000-01, Vol.359 (2), p.188-196

2000

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Gender Identity and Ethnoracial Disparities in Conversion Effort Exposure

American journal of public health (1971), 2024-05, Vol.114 (5), p.455-457

2024

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Determination of the structure of amorphous nitrogenated carbon films by combined Raman and x-ray photoemission spectroscopy

Journal of applied physics, 1998-04, Vol.83 (7), p.3917-3919

1998

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XPS and NEXAFS characterisation of plasma deposited vertically aligned N-doped MWCNT

Diamond and related materials, 2005, Vol.14 (3), p.891-895

2005

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Effect of the ion bombardment energy on silicon dioxide films deposited from oxygen/tetraethoxysilane plasmas in a helicon reactor

Thin solid films, 2005-01, Vol.471 (1), p.123-127

2005

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Studies on structural properties of amorphous nitrogenated carbon films from electron energy loss, ellipsometry, Auger electron spectroscopy, and electron-spin resonance

Journal of applied physics, 1999-02, Vol.85 (4), p.2162-2169

1999

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Observation of nanocrystalline diamond in diamondlike carbon films deposited at room temperature in electron cyclotron resonance plasma

Applied physics letters, 1997-05, Vol.70 (19), p.2535-2537

1997

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Effect of nitrogen incorporation in CNx thin films deposited by RF magnetron sputtering

Surface & coatings technology, 2002-03, Vol.151-152, p.175-179

2002

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Bonding structure of carbon nitride films deposited by reactive plasma beam sputtering

Diamond and related materials, 2001-03, Vol.10 (3), p.1142-1146

2001

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Plasma deposition of hydrogenated amorphous carbon: growth rates, properties and structures

Thin solid films, 1994-03, Vol.240 (1), p.28-38

1994

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On the hydrogen incorporation, intrinsic stress and thermal stability of hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma

Journal of non-crystalline solids, 2001-05, Vol.283 (1), p.47-55

2001

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Effect of negative bias voltage on a-C:H films deposited in electron cyclotron resonance plasma

Diamond and related materials, 1997-04, Vol.6 (5), p.542-546

1997

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Carbon nanotubes and nanostructures grown from diamond-like carbon and polyethylene

Applied physics. A, Materials science & processing, 2001-12, Vol.73 (6), p.765-768

2001

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Hydrogen stability in diamond-like carbon films during wear tests

Applied physics letters, 1999-11, Vol.75 (22), p.3479-3481

1999

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Growth mechanisms of carbon nanotubes converted from diamond-like carbon films

Chemical physics letters, 2004-10, Vol.397 (4), p.516-519

2004

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Surface modification of Si-containing polymers during etching for bilayer lithography

Microelectronic engineering, 2002-07, Vol.61, p.901-906

2002

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Study of the early stage of SiO2 growth by a TEOS–O2 plasma mixture using a three-dimensional Monte Carlo model

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-05, Vol.19 (3), p.743-749

2001

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Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry

Plasma sources science & technology, 2000-08, Vol.9 (3), p.331-339

2000

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Growth, microstructure and electronic properties of amorphous carbon nitride films investigated by plasma diagnostics

Journal of applied physics, 1999-10, Vol.86 (8), p.4668-4676

1999

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Structure of nitrogenated carbon films prepared from acetylene and nitrogen mixture in electron cyclotron resonance plasma

Journal of applied physics, 2000-05, Vol.87 (10), p.7524-7532

2000

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Mass spectrometric investigation of the positive ions formed in low-pressure oxygen/tetraethoxysilane and argon/tetraethoxysilane plasmas

Journal of applied physics, 2001-05, Vol.89 (9), p.5227-5229

2001

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Carbon nitride thin films deposited by reactive plasma beam sputtering

Surface & coatings technology, 2000-03, Vol.125 (1-3), p.295-300

2000

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Mass spectrometric investigations on CH4 plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge

Plasma sources science & technology, 1998-11, Vol.7 (4), p.607-616

1998

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Analysis of low-k organosilicon and low-density silica films deposited in HMDSO plasmas

Plasmas and polymers, 2002-12, Vol.7 (4), p.341-352

2002

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Spectroscopic determination of the structure of amorphous nitrogenated carbon films

A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor

Gender Identity and Ethnoracial Disparities in Conversion Effort Exposure

Determination of the structure of amorphous nitrogenated carbon films by combined Raman and x-ray photoemission spectroscopy

XPS and NEXAFS characterisation of plasma deposited vertically aligned N-doped MWCNT

Effect of the ion bombardment energy on silicon dioxide films deposited from oxygen/tetraethoxysilane plasmas in a helicon reactor

Studies on structural properties of amorphous nitrogenated carbon films from electron energy loss, ellipsometry, Auger electron spectroscopy, and electron-spin resonance

Observation of nanocrystalline diamond in diamondlike carbon films deposited at room temperature in electron cyclotron resonance plasma

Effect of nitrogen incorporation in CNx thin films deposited by RF magnetron sputtering

Bonding structure of carbon nitride films deposited by reactive plasma beam sputtering

Plasma deposition of hydrogenated amorphous carbon: growth rates, properties and structures

On the hydrogen incorporation, intrinsic stress and thermal stability of hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma

Effect of negative bias voltage on a-C:H films deposited in electron cyclotron resonance plasma

Carbon nanotubes and nanostructures grown from diamond-like carbon and polyethylene

Hydrogen stability in diamond-like carbon films during wear tests

Growth mechanisms of carbon nanotubes converted from diamond-like carbon films

Surface modification of Si-containing polymers during etching for bilayer lithography

Study of the early stage of SiO2 growth by a TEOS–O2 plasma mixture using a three-dimensional Monte Carlo model

Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry

Growth, microstructure and electronic properties of amorphous carbon nitride films investigated by plasma diagnostics

Structure of nitrogenated carbon films prepared from acetylene and nitrogen mixture in electron cyclotron resonance plasma

Mass spectrometric investigation of the positive ions formed in low-pressure oxygen/tetraethoxysilane and argon/tetraethoxysilane plasmas

Carbon nitride thin films deposited by reactive plasma beam sputtering

Mass spectrometric investigations on CH4 plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge

Analysis of low-k organosilicon and low-density silica films deposited in HMDSO plasmas

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