UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

AIP advances, 2017-08, Vol.7 (8), p.085314-085314-9

2017

Volltextzugriff (PDF)

Investigation on helium ion beam lithography with proximity effect correction

Journal of Micro/Nanopatterning, Materials, and Metrology, 2021-07, Vol.20 (3)

2021

Volltextzugriff (PDF)

Refractive Index and Effective Thickness Measurement System for the RGB Color Filter Coatings With Absorption and Scattering Properties

Journal of display technology, 2014-01, Vol.10 (1), p.57-70

2014

Volltextzugriff (PDF)

Lithography-patterning-fidelity-aware electron-optical system design optimization

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2011-11, Vol.29 (6)

2011

Volltextzugriff (PDF)

Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects

Journal of Micro/Nanopatterning, Materials, and Metrology, 2021-07, Vol.20 (3)

2021

Volltextzugriff (PDF)

Solution-Refined Method for Electrostatic Potential Distribution of Large-Scale Electron Optics

Japanese Journal of Applied Physics, 2013-05, Vol.52 (5), p.055202-055202-8

2013

Volltextzugriff (PDF)

Fresnel Zone Plate Manufacturability Analysis for Direct-Write Lithography by Simulating Focusing and Patterning Performance versus Fabrication Errors

Japanese Journal of Applied Physics, 2010-06, Vol.49 (6), p.06GD08-06GD08-6

2010

Volltextzugriff (PDF)

Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics, 2011-06, Vol.50 (6), p.06GB07-06GB07-9

2011

Volltextzugriff (PDF)

Comparison of the vectorial diffraction theory and Fraunhofer approximation method on diffractive images of Fresnel zone plates

Optical and quantum electronics, 2015-07, Vol.47 (7), p.1557-1567

2015

Volltextzugriff (PDF)

Study of etching bias modeling and correction strategies for compensation of patterning process effects

Microelectronic engineering, 2013-10, Vol.110, p.147-151

2013

Volltextzugriff (PDF)

Design of feedforward filters for improving tracking performances of existing feedback control systems

IEEE transactions on control systems technology, 2004-09, Vol.12 (5), p.742-749

2004

Volltextzugriff (PDF)

Supplementary zones-surrounded Fresnel zone plate with enhanced optical resolution

Journal of Optics, 2015-08, Vol.17 (8), p.85608-8

2015

Volltextzugriff (PDF)

eVTOL, UAM, and AAM: Brief Development History and Implementation Outlook of the United States

2023 IEEE International Conference on e-Business Engineering (ICEBE), 2023, p.287-296

2023

Volltextzugriff (PDF)

Stochastic simulation of photon propagation in Si for extreme-ultraviolet mask-defect inspection

Applied physics letters, 2010-08, Vol.97 (6), p.061108-061108-3

2010

Volltextzugriff (PDF)

Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam-direct-write lithography

Japanese Journal of Applied Physics, 2015-06, Vol.54 (6S1), p.6

2015

Volltextzugriff (PDF)

Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system

Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2011-07, Vol.645 (1), p.84-89

2011

Volltextzugriff (PDF)

A realistic evaluation and comparison of indoor location technologies: experiences and lessons learned

Proceedings of the 14th International Conference on Information Processing in Sensor Networks, 2015, p.178-189

2015

Volltextzugriff (PDF)

Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises

Journal of Optics, 2014-06, Vol.16 (6), p.065706-1-065706-10

2014

Volltextzugriff (PDF)

A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography

Measurement science & technology, 2006-08, Vol.17 (8), p.2233-2240

2006

Volltextzugriff (PDF)

Simulation and Experiment of Speckle Reduction by the Beam Splitting Method on a Pico-Projection System

Advanced materials research, 2014-05, Vol.933, p.572-577

2014

Volltextzugriff (PDF)

In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2011-07, Vol.29 (4)

2011

Volltextzugriff (PDF)

Manufacturability Analysis of a Micro-Electro-Mechanical Systems--Based Electron-Optical System Design for Direct-Write Lithography

Japanese Journal of Applied Physics, 2010-06, Vol.49 (6), p.06GE05-06GE05-7

2010

Volltextzugriff (PDF)

Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics, 2011-06, Vol.50 (6S), p.6

2011

Volltextzugriff (PDF)

DQIT: μ-synthesis without D-scale fitting

IEEE transactions on automatic control, 2004-11, Vol.49 (11), p.2028-2032

2004

Volltextzugriff (PDF)

The effect of NBTI on 3D integrated circuits

2012 IEEE Electrical Design of Advanced Packaging and Systems Symposium (EDAPS), 2012, p.201-204

2012

Volltextzugriff (PDF)

1 – 25 von 63

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(36)
Mit Volltextzugriff
(48)

Publikationsform

Sprache

Erscheinungsjahr

n.n

Thema

Science & Technology
(35)
Physical Sciences
(26)
Technology
(26)
Engineering
(24)
Engineering, Electrical & Electronic
(21)
Optics
(14)
Physics
(14)
Nanoscience & Nanotechnology
(13)
Science & Technology - Other Topics
(13)
Materials Science
(11)
Physics, Applied
(11)
Materials Science, Multidisciplinary
(10)
Lithography
(6)
Applied Sciences
(5)
Exact Sciences And Technology
(5)
Automation & Control Systems
(4)
Computer Science; Control Theory; Systems
(4)
Computer Simulation
(4)
Control Theory. Systems
(4)
Frequency Domain Analysis
(4)

15 weitere anzeigen...

Weniger anzeigen...

Neu hinzugefügt

... seit 90 Tagen
(1)

Menü

Weitere Dienste

Einstellungen

Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

Investigation on helium ion beam lithography with proximity effect correction

Refractive Index and Effective Thickness Measurement System for the RGB Color Filter Coatings With Absorption and Scattering Properties

Lithography-patterning-fidelity-aware electron-optical system design optimization

Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects

Solution-Refined Method for Electrostatic Potential Distribution of Large-Scale Electron Optics

Fresnel Zone Plate Manufacturability Analysis for Direct-Write Lithography by Simulating Focusing and Patterning Performance versus Fabrication Errors

Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography

Comparison of the vectorial diffraction theory and Fraunhofer approximation method on diffractive images of Fresnel zone plates

Study of etching bias modeling and correction strategies for compensation of patterning process effects

Design of feedforward filters for improving tracking performances of existing feedback control systems

Supplementary zones-surrounded Fresnel zone plate with enhanced optical resolution

eVTOL, UAM, and AAM: Brief Development History and Implementation Outlook of the United States

Stochastic simulation of photon propagation in Si for extreme-ultraviolet mask-defect inspection

Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam-direct-write lithography

Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system

A realistic evaluation and comparison of indoor location technologies: experiences and lessons learned

Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises

A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography

Simulation and Experiment of Speckle Reduction by the Beam Splitting Method on a Pico-Projection System

In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography

Manufacturability Analysis of a Micro-Electro-Mechanical Systems--Based Electron-Optical System Design for Direct-Write Lithography

Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography

DQIT: μ-synthesis without D-scale fitting

The effect of NBTI on 3D integrated circuits

Suchergebnisse filtern