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Synergy Effect of Particle Radiation and Ultraviolet Radiation from Capacitively Coupled Radio Frequency Argon Plasmas on n-GaN Etching Damage

Japanese Journal of Applied Physics, 2008-08, Vol.47 (8S2), p.6863

2008

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Effects of Capacitively Coupled Radio Frequency Krypton and Argon Plasmas on Gallium Nitride Etching Damage

Japanese Journal of Applied Physics, 2009-08, Vol.48 (8), p.8

2009

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Damage Characteristics of TiO2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas

Jpn J Appl Phys, 2011-08, Vol.50 (8), p.08KD01-08KD01-4

2011

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Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy

Japanese Journal of Applied Physics, 2012-01, Vol.51 (1), p.01AB02-01AB02-4

2012

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The properties of transparent conductive In–Ga–Zn oxide films produced by pulsed laser deposition

Vacuum, 2008-10, Vol.83 (3), p.552-556

2008

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Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by Capacitively Coupled Radio Frequency Argon Plasmas

Japanese Journal of Applied Physics, 2013-05, Vol.52 (5), p.05EC05-05EC05-5

2013

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Deposition of IGZO or ITZO Thin Films by Co-Sputtering of IZO and GZO or ITO Targets

Advanced Materials Research, 2015-06, Vol.1110, p.197-202

2015

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Photoluminescence Study of Damage Introduced in GaN by Ar- and Kr-Plasmas Etching

MRS proceedings, 2012, Vol.1396 (1), p.12-17, Article mrsf11-1396-o07-36

2012

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Etch damage characteristics of TiO2 thin films by capacitively coupled RF Ar plasmas

Vacuum, 2010-06, Vol.84 (12), p.1393-1397

2010

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Transparent conducting amorphous Zn–Sn–O films deposited by simultaneous dc sputtering

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2004-07, Vol.22 (4), p.1705-1710

2004

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Effect of UV Irradiation on Ar-Plasma Etching Characteristics of GaN

ECS journal of solid state science and technology, 2013-01, Vol.2 (3), p.P110-P113

2013

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Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy

Japanese Journal of Applied Physics, 2012-01, Vol.51 (1S), p.1

2012

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Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO2 Thin Film Surfaces

Jpn J Appl Phys, 2011-01, Vol.50 (1), p.01BE02-01BE02-5

2011

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Etch-induced damage characteristics of n-GaN surfaces by capacitively coupled radio frequency He and Ar plasmas

Physica status solidi. C, 2011-02, Vol.8 (2), p.441-443

2011

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Influence of Ga2O3 addition on transparent conductive oxide films of In2O3–ZnO

Vacuum, 2008-10, Vol.83 (3), p.561-563

2008

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Structures and Physical Properties of Films Deposited by Simultaneous DC Sputtering of ZnO and In2O3 or ITO Targets

Journal of solid state chemistry, 2000-12, Vol.155 (2), p.312-319

2000

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Characterization of ZnO–In2O3 transparent conducting films by pulsed laser deposition

Materials research bulletin, 2005-06, Vol.40 (6), p.1052-1058

2005

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Properties of Amorphous Transparent Conductive In-Ga-Zn Oxide Films Deposited on Fused Quartz by the PLD Method

e-Journal of Surface Science and Nanotechnology, 2009/04/04, Vol.7, pp.273-276

2009

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Synergy Effect of Xenon Plasma Ions and Ultraviolet Lights on GaN Etch Surface Damage and Modification

Transactions of the Materials Research Society of Japan, 2011/03/01, Vol.36(1), pp.75-78

2011

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Deposition of Photocatalytic TiO2 Films by Planar Magnetron Sputtering System with Opposed Ti Targets

e-Journal of Surface Science and Nanotechnology, 2009/04/04, Vol.7, pp.290-293

2009

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Effect of insertion of thin ZnO layer in transparent conductive ZnO:Al film

Thin solid films, 2001-05, Vol.386 (2), p.267-270

2001

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Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O2 atmosphere

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-07, Vol.19 (4), p.1582-1585

2001

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Etching damage and its recovery by soft X-ray irradiation observed in soft X-ray absorption spectra of TiO2 thin film

Journal of applied physics, 2013-03, Vol.113 (12)

2013

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Surface damage of 6H–SiC originating from argon plasma irradiation

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2013-11, Vol.315, p.213-217

2013

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Effect of external magnetic field on c-axis orientation and residual stress in AlN films

Thin solid films, 1998-11, Vol.332 (1-2), p.247-251

1998

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Synergy Effect of Particle Radiation and Ultraviolet Radiation from Capacitively Coupled Radio Frequency Argon Plasmas on n-GaN Etching Damage

Effects of Capacitively Coupled Radio Frequency Krypton and Argon Plasmas on Gallium Nitride Etching Damage

Damage Characteristics of TiO2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas

Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy

The properties of transparent conductive In–Ga–Zn oxide films produced by pulsed laser deposition

Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by Capacitively Coupled Radio Frequency Argon Plasmas

Deposition of IGZO or ITZO Thin Films by Co-Sputtering of IZO and GZO or ITO Targets

Photoluminescence Study of Damage Introduced in GaN by Ar- and Kr-Plasmas Etching

Etch damage characteristics of TiO2 thin films by capacitively coupled RF Ar plasmas

Transparent conducting amorphous Zn–Sn–O films deposited by simultaneous dc sputtering

Effect of UV Irradiation on Ar-Plasma Etching Characteristics of GaN

Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy

Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO2 Thin Film Surfaces

Etch-induced damage characteristics of n-GaN surfaces by capacitively coupled radio frequency He and Ar plasmas

Influence of Ga2O3 addition on transparent conductive oxide films of In2O3–ZnO

Structures and Physical Properties of Films Deposited by Simultaneous DC Sputtering of ZnO and In2O3 or ITO Targets

Characterization of ZnO–In2O3 transparent conducting films by pulsed laser deposition

Properties of Amorphous Transparent Conductive In-Ga-Zn Oxide Films Deposited on Fused Quartz by the PLD Method

Synergy Effect of Xenon Plasma Ions and Ultraviolet Lights on GaN Etch Surface Damage and Modification

Deposition of Photocatalytic TiO2 Films by Planar Magnetron Sputtering System with Opposed Ti Targets

Effect of insertion of thin ZnO layer in transparent conductive ZnO:Al film

Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O2 atmosphere

Etching damage and its recovery by soft X-ray irradiation observed in soft X-ray absorption spectra of TiO2 thin film

Surface damage of 6H–SiC originating from argon plasma irradiation

Effect of external magnetic field on c-axis orientation and residual stress in AlN films

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