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Acoustic Performance of Stress Gradient-Induced Deflection of Triangular Unimorphic/Bimorphic Cantilevers for MEMS Applications

Materials, 2023-03, Vol.16 (5), p.2129

2023

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Impact of Pulse Parameters of a DC Power Generator on the Microstructural and Mechanical Properties of Sputtered AlN Film with In-Situ OES Data Analysis

Materials, 2023-04, Vol.16 (8), p.3015

2023

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A multi-step deposited AlN films in a DC pulsed sputtering and film characteristics classification with principal component analysis of OES data

International journal of advanced manufacturing technology, 2023-07, Vol.127 (5-6), p.2955-2967

2023

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A Comparison and Analysis of Three Methods of Aluminum Crown Forgings in Processing Optimization

Materials, 2022-11, Vol.15 (23), p.8400

2022

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Numerical and Experimental Studies on the Load Characteristics of Geometric Interference of Steel-Aluminum Knurled Interference Fit

Metals (Basel ), 2022-12, Vol.12 (12), p.2078

2022

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Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data

Materials, 2021-08, Vol.14 (16), p.4445

2021

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A hybrid sensor for motor tics recognition based on piezoelectric and triboelectric design and fabrication

Sensors and actuators. A. Physical., 2022-08, Vol.342, p.113622, Article 113622

2022

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Evolution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission spectroscopy

Materials chemistry and physics, 2020-01, Vol.240, p.122186, Article 122186

2020

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Self‐Powered Fire Alarm System with Layer‐by‐layer Graphene Oxide/Chitosan Nanocoating of Flame‐Retardant Nanofilms

Advanced materials technologies, 2023-11, Vol.8 (21)

2023

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Low Temperature (180°C) Growth of Smooth Surface Germanium Epilayers on Silicon Substrates Using Electron Cyclotron Resonance Chemical Vapor Deposition

International Journal of Photoenergy, 2014-01, Vol.2014, p.1-8

2014

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Residual stress classification of pulsed DC reactive sputtered aluminum nitride film via large-scale data analysis of optical emission spectroscopy

International journal of advanced manufacturing technology, 2022-04, Vol.119 (11-12), p.7449-7462

2022

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Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering

International journal of advanced manufacturing technology, 2021-06, Vol.114 (7-8), p.1975-1990

2021

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Large-scale data analysis of PECVD amorphous silicon interface passivation layer via the optical emission spectra for parameterized PCA

International journal of advanced manufacturing technology, 2019-03, Vol.101 (1-4), p.329-337

2019

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Wire-arc spray directed energy deposition: Correlation of chamber kits refurbishing and particle defects reduction in Ta/TaN thin-film physical deposition processes

Journal of materials research and technology, 2024-05, Vol.30, p.2754-2767

2024

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Manipulation of MoSe_2 Films on CuIn(Ga)Se_2 Solar Cells during Rapid Thermal Process

International Journal of Photoenergy, 2014-01, Vol.2014, p.1-5

2014

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In Situ Plasma Monitoring of PECVD nc-Si:H Films and the Influence of Dilution Ratio on Structural Evolution

Coatings (Basel), 2018-07, Vol.8 (7), p.238

2018

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Large-scale data principal component analysis of phase transition from a-Si:H to nc-Si:H using PECVD optical emission spectra

Micro & nano letters, 2020-04, Vol.15 (5), p.323-326

2020

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Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature

Journal of non-crystalline solids, 2015-03, Vol.412, p.5-10

2015

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Correlation of Impedance Matching and Optical Emission Spectroscopy during Plasma-Enhanced Chemical Vapor Deposition of Nanocrystalline Silicon Thin Films

Coatings (Basel), 2019-05, Vol.9 (5), p.305

2019

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Investigation of a Simplified Mechanism Model for Prediction of Gallium Nitride Thin Film Growth through Numerical Analysis

Coatings (Basel), 2017-03, Vol.7 (3), p.43

2017

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Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor

Coatings (Basel), 2017-08, Vol.7 (8), p.112

2017

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Advanced in situ pre-Ni silicide (Siconi) cleaning at 65nm to resolve defects in NiSix modules

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2010-01, Vol.28 (1), p.56-61

2010

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Manipulation of MoSe2 Films on CuIn(Ga)Se2 Solar Cells during Rapid Thermal Process

International journal of photoenergy, 2014-01, Vol.2014

2014

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Comparative and integrative study of Langmuir probe and optical emission spectroscopy in a variable magnetic field electron cyclotron resonance chemical vapor deposition process used for depositing hydrogenated amorphous silicon thin films

Thin solid films, 2014-11, Vol.570, p.574-579

2014

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Predicting residual stress of aluminum nitride thin-film by incorporating manifold learning and tree-based ensemble classifier

Materials chemistry and physics, 2023-02, Vol.295, p.127070, Article 127070

2023

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Acoustic Performance of Stress Gradient-Induced Deflection of Triangular Unimorphic/Bimorphic Cantilevers for MEMS Applications

Impact of Pulse Parameters of a DC Power Generator on the Microstructural and Mechanical Properties of Sputtered AlN Film with In-Situ OES Data Analysis

A multi-step deposited AlN films in a DC pulsed sputtering and film characteristics classification with principal component analysis of OES data

A Comparison and Analysis of Three Methods of Aluminum Crown Forgings in Processing Optimization

Numerical and Experimental Studies on the Load Characteristics of Geometric Interference of Steel-Aluminum Knurled Interference Fit

Machine Learning Assisted Classification of Aluminum Nitride Thin Film Stress via In-Situ Optical Emission Spectroscopy Data

A hybrid sensor for motor tics recognition based on piezoelectric and triboelectric design and fabrication

Evolution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission spectroscopy

Self‐Powered Fire Alarm System with Layer‐by‐layer Graphene Oxide/Chitosan Nanocoating of Flame‐Retardant Nanofilms

Low Temperature (180°C) Growth of Smooth Surface Germanium Epilayers on Silicon Substrates Using Electron Cyclotron Resonance Chemical Vapor Deposition

Residual stress classification of pulsed DC reactive sputtered aluminum nitride film via large-scale data analysis of optical emission spectroscopy

Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering

Large-scale data analysis of PECVD amorphous silicon interface passivation layer via the optical emission spectra for parameterized PCA

Wire-arc spray directed energy deposition: Correlation of chamber kits refurbishing and particle defects reduction in Ta/TaN thin-film physical deposition processes

Manipulation of MoSe_2 Films on CuIn(Ga)Se_2 Solar Cells during Rapid Thermal Process

In Situ Plasma Monitoring of PECVD nc-Si:H Films and the Influence of Dilution Ratio on Structural Evolution

Large-scale data principal component analysis of phase transition from a-Si:H to nc-Si:H using PECVD optical emission spectra

Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature

Correlation of Impedance Matching and Optical Emission Spectroscopy during Plasma-Enhanced Chemical Vapor Deposition of Nanocrystalline Silicon Thin Films

Investigation of a Simplified Mechanism Model for Prediction of Gallium Nitride Thin Film Growth through Numerical Analysis

Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor

Advanced in situ pre-Ni silicide (Siconi) cleaning at 65nm to resolve defects in NiSix modules

Manipulation of MoSe2 Films on CuIn(Ga)Se2 Solar Cells during Rapid Thermal Process

Comparative and integrative study of Langmuir probe and optical emission spectroscopy in a variable magnetic field electron cyclotron resonance chemical vapor deposition process used for depositing hydrogenated amorphous silicon thin films

Predicting residual stress of aluminum nitride thin-film by incorporating manifold learning and tree-based ensemble classifier

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