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Determination of the minimum domain II size of Escherichia coli DnaA protein essential for cell viability

Microbiology (Society for General Microbiology), 2008-11, Vol.154 (Pt 11), p.3379-3384

2008

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Replication Initiator DnaA of Escherichia coli Changes Its Assembly Form on the Replication Origin during the Cell Cycle

Journal of Bacteriology, 2009-08, Vol.191 (15), p.4807-4814

2009

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Negative control of replication initiation by a novel chromosomal locus exhibiting exceptional affinity for Escherichia coli DnaA protein

Genes & development, 1998-10, Vol.12 (19), p.3032-3043

1998

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The datA locus predominantly contributes to the initiator titration mechanism in the control of replication initiation in Escherichia coli

Molecular microbiology, 2002-06, Vol.44 (5), p.1367-1375

2002

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Effects of fluorine dimer excimer laser radiation on the optical transmission and defect formation of various types of synthetic SiO2 glasses

Applied physics letters, 1999-05, Vol.74 (19), p.2755-2757

1999

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A novel DnaA protein‐binding site at 94.7 min on the Escherichia coli chromosome

Molecular microbiology, 1996-03, Vol.19 (5), p.1137-1147

1996

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Suppressive effect of trehalose on acrylamide formation from asparagine and reducing saccharides

Bioscience, biotechnology, and biochemistry, 2005-08, Vol.69 (8), p.1520-1526

2005

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Are all mouthguards the same and safe to use? The influence of occlusal supporting mouthguards in decreasing bone distortion and fractures

Dental traumatology, 2004-06, Vol.20 (3), p.150-156

2004

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Initiator titration complex formed at datA with the aid of IHF regulates replication timing in Escherichia coli

Genes to cells : devoted to molecular & cellular mechanisms, 2009-03, Vol.14 (3), p.329-341

2009

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Katachi ? Symmetry

1, 1996

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THE STATE-OF-THE-ART OF ArF EXCIMER LASER LITHOGRAPHY

Journal of Photopolymer Science and Technology, 1996, Vol.9(3), pp.379-386

Ogawa, Tohru

1996

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Replication Initiator DnaA of Escherichia coli Changes Its Assembly From on the Replication Origin during the Cell Cycle

Journal of bacteriology, 2009-08, Vol.191 (15), p.4807

2009

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Multiple pathways regulating DnaA function in : Distinct roles for DnaA titration by the locus and the regulatory inactivation of DnaA

Biochimie, 2001-01, Vol.83 (1), p.13-17

2001

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A new algorithm for three-dimensional voronoi tessellation

Journal of computational physics, 1983-08, Vol.51 (2), p.191-207

1983

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Photochemical processes induced by 157-nm light in H_2-impregnated glassy SiO_2:OH

Optics letters, 1999-07, Vol.24 (13), p.863

1999

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Advantages of a SiOxNy:H anti-reflective layer for ArF excimer laser lithography

Japanese journal of applied physics, 1996, Vol.35 (12B), p.6360-6365

1996

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International Interdisciplinary Symposium "KATACHI ∪ SYMMETRY"

Butsuri, 1995/08/05, Vol.50(8), pp.658-659

Ogawa, Tohru

1995

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Stabilization of ZrSi x O y Films by Irradiation with an ArF Excimer Laser

Japanese Journal of Applied Physics, 2000-07, Vol.39 (7S), p.4561

2000

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On the Structure of a Quasicrystal –Three-Dimensional Penrose Transformation

Journal of the Physical Society of Japan, 1985, Vol.54 (9), p.3205-3208

Ogawa, Tohru

1985

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Katachi ? Symmetry

2012

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Participation of the histone-like protein HU and of IHF in minichromosomal maintenance in Escherichia coli

Gene, 1991-07, Vol.103 (1), p.25-30

1991

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Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography

Japanese Journal of Applied Physics, 1999-12, Vol.38 (12S), p.7004

1999

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Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

Japanese Journal of Applied Physics, 1997-12, Vol.36 (12S), p.7488

1997

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STABILIZATION OF ZrSixOy FILMS BY IRRADIATION WITH AN ArF EXCIMER LASER

Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 7B, pp. 4561-4566. 2000, 2000, Vol.39 (7B), p.4561-4566

2000

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Hydrogenated silicon-oxynitride film antireflective layer for optical lithography

Japanese Journal of Applied Physics, 1997, Vol.36 (6A), p.3775-3785

1997

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Determination of the minimum domain II size of Escherichia coli DnaA protein essential for cell viability

Replication Initiator DnaA of Escherichia coli Changes Its Assembly Form on the Replication Origin during the Cell Cycle

Negative control of replication initiation by a novel chromosomal locus exhibiting exceptional affinity for Escherichia coli DnaA protein

The datA locus predominantly contributes to the initiator titration mechanism in the control of replication initiation in Escherichia coli

Effects of fluorine dimer excimer laser radiation on the optical transmission and defect formation of various types of synthetic SiO2 glasses

A novel DnaA protein‐binding site at 94.7 min on the Escherichia coli chromosome

Suppressive effect of trehalose on acrylamide formation from asparagine and reducing saccharides

Are all mouthguards the same and safe to use? The influence of occlusal supporting mouthguards in decreasing bone distortion and fractures

Initiator titration complex formed at datA with the aid of IHF regulates replication timing in Escherichia coli

Katachi ? Symmetry

THE STATE-OF-THE-ART OF ArF EXCIMER LASER LITHOGRAPHY

Replication Initiator DnaA of Escherichia coli Changes Its Assembly From on the Replication Origin during the Cell Cycle

Multiple pathways regulating DnaA function in : Distinct roles for DnaA titration by the locus and the regulatory inactivation of DnaA

A new algorithm for three-dimensional voronoi tessellation

Photochemical processes induced by 157-nm light in H_2-impregnated glassy SiO_2:OH

Advantages of a SiOxNy:H anti-reflective layer for ArF excimer laser lithography

International Interdisciplinary Symposium "KATACHI ∪ SYMMETRY"

Stabilization of ZrSi x O y Films by Irradiation with an ArF Excimer Laser

On the Structure of a Quasicrystal –Three-Dimensional Penrose Transformation

Katachi ? Symmetry

Participation of the histone-like protein HU and of IHF in minichromosomal maintenance in Escherichia coli

Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography

Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

STABILIZATION OF ZrSixOy FILMS BY IRRADIATION WITH AN ArF EXCIMER LASER

Hydrogenated silicon-oxynitride film antireflective layer for optical lithography

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