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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Thin solid films, 2015-04, Vol.580, p.71-76

2015

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Thermal stability of AlCoCrCuFeNi high entropy alloy thin films studied by in-situ XRD analysis

Surface & coatings technology, 2010-03, Vol.204 (12), p.1989-1992

2010

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Properties of Ti-oxide thin films grown in reactive magnetron sputtering with self-heating target

Vacuum, 2022-03, Vol.197, p.110813, Article 110813

2022

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Complex structure/composition relationship in thin films of AlCoCrCuFeNi high entropy alloy

Materials chemistry and physics, 2009-09, Vol.117 (1), p.142-147

2009

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Femtosecond laser irradiation of titanium oxide thin films: accumulation effect under IR beam

Applied physics. A, Materials science & processing, 2020-05, Vol.126 (5), Article 390

2020

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Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium

Materials chemistry and physics, 2023-06, Vol.301, p.127674, Article 127674

2023

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Energy flux measurements during magnetron sputter deposition processes

Surface & coatings technology, 2019-11, Vol.377, p.124887, Article 124887

2019

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Effect of the target temperature during magnetron sputtering of Nickel

Vacuum, 2018-01, Vol.147, p.82-91

2018

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Low energy and low fluence helium implantations in tungsten: Molecular dynamics simulations and experiments

Journal of nuclear materials, 2016-03, Vol.470, p.44-54

2016

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IR emission from the target during plasma magnetron sputter deposition

Thin solid films, 2013-10, Vol.545, p.44-49

2013

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Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution

Surface & coatings technology, 2014-09, Vol.254 (2014), p.291-297

2014

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Yttria-stabilized zirconia thin films deposited by pulsed-laser deposition and magnetron sputtering

Surface & coatings technology, 2011-06, Vol.205 (19), p.4495-4499

2011

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Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

Fuel cells (Weinheim an der Bergstrasse, Germany), 2013-04, Vol.13 (2), p.279-288

2013

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Measuring the energy flux at the substrate position during magnetron sputter deposition processes

Journal of applied physics, 2013-01, Vol.113 (1)

2013

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High-Entropy Alloys Deposited by Magnetron Sputtering

IEEE transactions on plasma science, 2011-11, Vol.39 (11), p.2478-2479

2011

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Helium retention and early stages of helium-vacancy complexes formation in low energy helium-implanted tungsten

Journal of nuclear materials, 2013-02, Vol.433 (1-3), p.305-313

2013

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Trapping and release of helium in tungsten

Journal of nuclear materials, 2011-09, Vol.416 (1), p.13-17

2011

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Ni-YSZ films deposited by reactive magnetron sputtering for SOFC applications

Surface & coatings technology, 2010-04, Vol.204 (15), p.2376-2380

2010

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Plasma sputtering deposition of platinum into porous fuel cell electrodes

Journal of physics. D, Applied physics, 2004-12, Vol.37 (24), p.3419-3423

2004

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Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition

Journal of physics. D, Applied physics, 2023-02, Vol.56 (7)

2023

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Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

Journal of physics. D, Applied physics, 2010-02, Vol.43 (6), p.065202-065202

2010

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Stable C-atom displacements on HOPG surface under plasma low-energy argon-ion bombardment

Applied physics. A, Materials science & processing, 2003-08, Vol.77 (3-4), p.591-597

2003

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On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films

Journal of physics. D, Applied physics, 2021-10, Vol.54 (41)

2021

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PdPt catalyst synthesized using a gas aggregation source and magnetron sputtering for fuel cell electrodes

Journal of physics. D, Applied physics, 2015-12, Vol.48 (47), p.475302-475308

2015

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Diagnostic system for plasma/surface energy transfer characterization

Review of scientific instruments, 2006-03, Vol.77 (3), p.033501-033501-6

2006

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High entropy alloy thin films deposited by magnetron sputtering of powder targets

Thermal stability of AlCoCrCuFeNi high entropy alloy thin films studied by in-situ XRD analysis

Properties of Ti-oxide thin films grown in reactive magnetron sputtering with self-heating target

Complex structure/composition relationship in thin films of AlCoCrCuFeNi high entropy alloy

Femtosecond laser irradiation of titanium oxide thin films: accumulation effect under IR beam

Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium

Energy flux measurements during magnetron sputter deposition processes

Effect of the target temperature during magnetron sputtering of Nickel

Low energy and low fluence helium implantations in tungsten: Molecular dynamics simulations and experiments

IR emission from the target during plasma magnetron sputter deposition

Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution

Yttria-stabilized zirconia thin films deposited by pulsed-laser deposition and magnetron sputtering

Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

Measuring the energy flux at the substrate position during magnetron sputter deposition processes

High-Entropy Alloys Deposited by Magnetron Sputtering

Helium retention and early stages of helium-vacancy complexes formation in low energy helium-implanted tungsten

Trapping and release of helium in tungsten

Ni-YSZ films deposited by reactive magnetron sputtering for SOFC applications

Plasma sputtering deposition of platinum into porous fuel cell electrodes

Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition

Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

Stable C-atom displacements on HOPG surface under plasma low-energy argon-ion bombardment

On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films

PdPt catalyst synthesized using a gas aggregation source and magnetron sputtering for fuel cell electrodes

Diagnostic system for plasma/surface energy transfer characterization

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