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Applications of Fourier transform-infrared spectroscopy to edible oils

Analytica chimica acta, 2006-07, Vol.573, p.459-465

2006

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Low-temperature thermal reduction of graphene oxide films in ambient atmosphere: Infra-red spectroscopic studies and gas sensing applications

Microelectronic engineering, 2016-06, Vol.159, p.146-150

2016

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A flexible strain sensor made of graphene nanoplatelets/polydimethylsiloxane nanocomposite

Microelectronic engineering, 2015-07, Vol.142, p.7-11

2015

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Detection of BRCA1 gene on partially reduced graphene oxide biosensors

Microelectronic engineering, 2019-08, Vol.216, p.111093, Article 111093

2019

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In situ and conventional transesterification of rapeseeds for biodiesel production: The effect of direct sonication

Industrial crops and products, 2016-06, Vol.84, p.399-407

2016

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Biodiesel Production: Reaction and Process Parameters of Alkali-Catalyzed Transesterification of Waste Frying Oils

Energy & fuels, 2007-09, Vol.21 (5), p.3023-3027

2007

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In situ transesterification of Cynara cardunculus L. seed oil via direct ultrasonication for the production of biodiesel

Fuel processing technology, 2015-06, Vol.134, p.122-129

2015

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Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications

Journal of applied polymer science, 2010-08, Vol.117 (4), p.2189-2195

2010

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Polyhedral oligomeric silsesquioxane (POSS) acrylate copolymers for microfabrication: properties and formulation of resist materials

Microelectronic engineering, 2004-06, Vol.73-74, p.238-243

2004

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Polyhedral oligomeric silsesquioxane (POSS) acrylate copolymers for microfabrication: properties and formulation of resist materials

Microelectronic engineering, 2004-06, Vol.73, p.238-243

2004

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Capacitive-type chemical sensors using thin silicon/polymer bimorph membranes

Sensors and actuators. B, Chemical, 2004-09, Vol.103 (1-2), p.392-396

2004

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Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopy

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2004-09, Vol.22 (5), p.2526-2532

2004

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Fabrication of chemical sensors based on Si/polymer bimorphs

Microelectronic engineering, 2004-06, Vol.73, p.847-851

2004

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Fabrication of chemical sensors based on Si/polymer bimorphs

Microelectronic engineering, 2004-06, Vol.73-74, p.847-851

2004

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Resist process issues related to the glass transition changes in chemically amplified resist films

Microelectronic engineering, 2003-06, Vol.67, p.283-291

2003

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Phase-inversion applications beyond membrane formation. I. Lithography films

Journal of applied polymer science, 2000-12, Vol.78 (12), p.2145-2157

2000

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Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists: Material Design Challenges and Lithographic Evaluation at 157 nm

Chemistry of materials, 2004-06, Vol.16 (13), p.2567-2577

2004

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Surface and line-edge roughness in plasma-developed resists

Microelectronic engineering, 2001-09, Vol.57, p.547-554

2001

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Silylation of epoxy functionalised photoresists for optical, e-beam lithography and micromachining applications

Microelectronic engineering, 1998-03, Vol.41, p.335-338

1998

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Thermal analysis of photoresists in aid of lithographic process development

Microelectronic engineering, 1997-02, Vol.35 (1-4), p.141-144

1997

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Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214

Microelectronic engineering, 1996-01, Vol.30 (1-4), p.267-270

1996

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Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists

Microelectronic engineering, 1998-03, Vol.41, p.355-358

1998

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Recording of ENGs from the nerves innervating the pancreas of a dog during the intravenous glucose tolerance test

Physiological measurement, 2002-11, Vol.23 (4), p.695-705

2002

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Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002-11, Vol.20 (6), p.2902-2908

2002

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Nanostructured imaging of biological specimens in vivo with laser plasma X-ray contact microscopy

Materials Science & Engineering C, 2003-01, Vol.23 (1-2), p.105-108

2003

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Applications of Fourier transform-infrared spectroscopy to edible oils

Low-temperature thermal reduction of graphene oxide films in ambient atmosphere: Infra-red spectroscopic studies and gas sensing applications

A flexible strain sensor made of graphene nanoplatelets/polydimethylsiloxane nanocomposite

Detection of BRCA1 gene on partially reduced graphene oxide biosensors

In situ and conventional transesterification of rapeseeds for biodiesel production: The effect of direct sonication

Biodiesel Production: Reaction and Process Parameters of Alkali-Catalyzed Transesterification of Waste Frying Oils

In situ transesterification of Cynara cardunculus L. seed oil via direct ultrasonication for the production of biodiesel

Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications

Polyhedral oligomeric silsesquioxane (POSS) acrylate copolymers for microfabrication: properties and formulation of resist materials

Polyhedral oligomeric silsesquioxane (POSS) acrylate copolymers for microfabrication: properties and formulation of resist materials

Capacitive-type chemical sensors using thin silicon/polymer bimorph membranes

Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopy

Fabrication of chemical sensors based on Si/polymer bimorphs

Fabrication of chemical sensors based on Si/polymer bimorphs

Resist process issues related to the glass transition changes in chemically amplified resist films

Phase-inversion applications beyond membrane formation. I. Lithography films

Polyhedral Oligomeric Silsesquioxane (POSS) Based Resists: Material Design Challenges and Lithographic Evaluation at 157 nm

Surface and line-edge roughness in plasma-developed resists

Silylation of epoxy functionalised photoresists for optical, e-beam lithography and micromachining applications

Thermal analysis of photoresists in aid of lithographic process development

Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214

Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists

Recording of ENGs from the nerves innervating the pancreas of a dog during the intravenous glucose tolerance test

Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

Nanostructured imaging of biological specimens in vivo with laser plasma X-ray contact microscopy

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