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Microstructure and wear resistance of double-layer TiN/PSZ coatings from alkoxide solutions by H2O-containing thermal plasma CVD

Surface & coatings technology, 2010-04, Vol.204 (15), p.2368-2375

2010

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Deposition of TiN films on various substrates from alkoxide solution by plasma-enhanced CVD

Surface & coatings technology, 2005-09, Vol.199 (1), p.72-76

2005

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Technology for adding arbitrary patterns to the left valve of cultured Japanese rock oysters Magallana nippona

NIPPON SUISAN GAKKAISHI, 2024/07/15, Vol.90(4), pp.358-360

2024

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Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Materials science & engineering. B, Solid-state materials for advanced technology, 2010-08, Vol.172 (2), p.201-206

2010

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Preparation and oxidation of composite TiN–AlN films from alkoxide solutions by plasma-enhanced CVD

Journal of the European Ceramic Society, 2005, Vol.25 (10), p.1765-1770

2005

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Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD

Journal of the Ceramic Society of Japan, 2009, Vol.117 (1364), p.415-420

2009

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付着器表面加工による養殖イワガキ左殻への任意文様の付与技術の開発

日本水産学会誌, 2024/07/15, Vol.90(4), pp.358-360

2024

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Preparation of Al-doped ZnO thin films by RF thermal plasma evaporation

Thin solid films, 2002-03, Vol.407 (1), p.86-91

2002

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Thermal plasma CVD and wear resistance of double layered Ti–Si–B–C/Ti–B–C coatings on WC–Co cutting tools with various roughness

Surface & coatings technology, 2010-02, Vol.204 (11), p.1715-1721

2010

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Microstructure and wear resistance of double-layer TiN/PSZ coatings from alkoxide solutions by H 2O-containing thermal plasma CVD

Surface & coatings technology, 2010, Vol.204 (15), p.2368-2375

2010

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Growth process of YBa2Cu3O7−x films prepared by RF thermal plasma evaporation

Physica. C, Superconductivity, 1996-05, Vol.262 (3-4), p.236-242

1996

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Growth mechanisms of YBa2Cu3Ox films prepared by RF thermal plasma evaporation

Japanese journal of applied physics, 1996, Vol.35 (3), p.1706-1711

1996

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Growth process of YBa 2Cu 3O 7− x films prepared by RF thermal plasma evaporation

Physica. C, Superconductivity, 1996, Vol.262 (3), p.236-242

1996

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Growth process of YBa sub(2)Cu sub(3)O sub(7-x) films prepared by RF thermal plasma evaporation

Physica. C, Superconductivity, 1996-01, Vol.262 (3-4), p.236-242

1996

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Relationship between Crystal Structure and Electrical Properties of Nonuniform Al-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering

Journal of the Ceramic Society of Japan, 2003, Vol.111(1299), pp.831-836

2003

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Coating and Wear Resistance of Ceramic Films from Alkoxide Solutions by Atmosphere Controlled Thermal Plasma CVD

Journal of the Japan Society of Powder and Powder Metallurgy, 2010, Vol.57(7), pp.514-519

2010

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Structure and Composition of ZnO Films Prepared by Radio-Frequency Magnetron Sputtering

IEEJ Transactions on Fundamentals and Materials, 2002, Vol.122(1), pp.100-106

2002

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Growth Mechanisms of YBa 2 Cu 3 O \ssmbix Films Prepared by RF Thermal Plasma Evaporation

Japanese Journal of Applied Physics, 1996-03, Vol.35 (3R), p.1706

1996

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Coatings and Oxidation of (Ti 1-x , A1 x )N Films from Alkoxide Solutions by Thermal Plasma CVD

Meeting abstracts (Electrochemical Society), 2009-07, Vol.MA2009-02 (19), p.1861-1861

2009

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Optical spectroscopic study of the radio-frequency oxygen thermal plasma evaporated YBa 2 Cu 3 O 7− x

Journal of materials research, 1993-04, Vol.8 (4), p.709-712

1993

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Optical spectroscopic study of the radio-frequency oxygen thermal plasma evaporated YBa2Cu3O7−x

Journal of materials research, 1993-04, Vol.8 (4), p.709-712

1993

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雰囲気制御熱プラズマCVD法によるアルコキシド溶液からの新規セラミックスコーティングと耐摩耗性

粉体および粉末冶金, 2010, Vol.57(7), pp.514-519

2010

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マグネトロンスパッタ法により作製したZnO膜の構造と組成

電気学会論文誌Ａ（基礎・材料・共通部門誌）, 2002, Vol.122(1), pp.100-106

2002

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Relationship between crystal structure and electrical properties of nonuniform al-doped ZnO thin films prepared by RF magnetron sputtering

Nihon Seramikkusu Kyōkai gakujutsu ronbunshi, 2003, Vol.111 (11), p.831-836

2003

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RFスパッタ法で作製した不均一AlドープZnO薄膜の結晶状態と電気特性との関係

Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌), 2003, Vol.111(1299), pp.831-836

2003

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Microstructure and wear resistance of double-layer TiN/PSZ coatings from alkoxide solutions by H2O-containing thermal plasma CVD

Deposition of TiN films on various substrates from alkoxide solution by plasma-enhanced CVD

Technology for adding arbitrary patterns to the left valve of cultured Japanese rock oysters Magallana nippona

Water vapor-controlled thermal plasma chemical vapor deposition of double-layered TiN/PSZ coatings on Si and WC-Co substrates

Preparation and oxidation of composite TiN–AlN films from alkoxide solutions by plasma-enhanced CVD

Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD

付着器表面加工による養殖イワガキ左殻への任意文様の付与技術の開発

Preparation of Al-doped ZnO thin films by RF thermal plasma evaporation

Thermal plasma CVD and wear resistance of double layered Ti–Si–B–C/Ti–B–C coatings on WC–Co cutting tools with various roughness

Microstructure and wear resistance of double-layer TiN/PSZ coatings from alkoxide solutions by H 2O-containing thermal plasma CVD

Growth process of YBa2Cu3O7−x films prepared by RF thermal plasma evaporation

Growth mechanisms of YBa2Cu3Ox films prepared by RF thermal plasma evaporation

Growth process of YBa 2Cu 3O 7− x films prepared by RF thermal plasma evaporation

Growth process of YBa sub(2)Cu sub(3)O sub(7-x) films prepared by RF thermal plasma evaporation

Relationship between Crystal Structure and Electrical Properties of Nonuniform Al-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering

Coating and Wear Resistance of Ceramic Films from Alkoxide Solutions by Atmosphere Controlled Thermal Plasma CVD

Structure and Composition of ZnO Films Prepared by Radio-Frequency Magnetron Sputtering

Growth Mechanisms of YBa 2 Cu 3 O \ssmbix Films Prepared by RF Thermal Plasma Evaporation

Coatings and Oxidation of (Ti 1-x , A1 x )N Films from Alkoxide Solutions by Thermal Plasma CVD

Optical spectroscopic study of the radio-frequency oxygen thermal plasma evaporated YBa 2 Cu 3 O 7− x

Optical spectroscopic study of the radio-frequency oxygen thermal plasma evaporated YBa2Cu3O7−x

雰囲気制御熱プラズマCVD法によるアルコキシド溶液からの新規セラミックスコーティングと耐摩耗性

マグネトロンスパッタ法により作製したZnO膜の構造と組成

Relationship between crystal structure and electrical properties of nonuniform al-doped ZnO thin films prepared by RF magnetron sputtering

RFスパッタ法で作製した不均一AlドープZnO薄膜の結晶状態と電気特性との関係

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