UB Paderborn / Katalog / Suche / in CDI

Effect of oxygen plasma immersion ion implantation treatment on corrosion resistance and cell adhesion of titanium surface

Clinical oral implants research, 2011-12, Vol.22 (12), p.1426-1432

2011

Volltextzugriff (PDF)

Oxygen plasma immersion ion implantation treatment enhances the human bone marrow mesenchymal stem cells responses to titanium surface for dental implant application

Clinical oral implants research, 2015-02, Vol.26 (2), p.166-175

2015

Volltextzugriff (PDF)

High-Performance Multilevel Resistive Switching Gadolinium Oxide Memristors With Hydrogen Plasma Immersion Ion Implantation Treatment

IEEE electron device letters, 2014-04, Vol.35 (4), p.452-454

2014

Volltextzugriff (PDF)

The improvement of all-solid-state electrochromic devices fabricated with the reactive sputter and cathodic arc technology

AIP advances, 2016-11, Vol.6 (11), p.115009-115009-5

2016

Volltextzugriff (PDF)

Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave

Plasma processes and polymers, 2014-01, Vol.11 (1), p.7-11

2014

Volltextzugriff (PDF)

Plasma immersion ion implantation induced improvements of mechanical properties, wear resistance, and adhesion of diamond-like carbon films deposited on tool steel

Surface & coatings technology, 2009-10, Vol.204 (3), p.229-236

2009

Volltextzugriff (PDF)

Electrical Characteristics and Thermal Stability of [Formula Omitted] Metal Gate Electrode for Advanced MOS Devices

IEEE transactions on electron devices, 2008-11, Vol.55 (11), p.3259

2008

Volltextzugriff (PDF)

Hybrid anion and cation ion sensors with samarium oxide sensing membrane treated by nitrogen plasma immersion ion implantation

Sensors and actuators. B, Chemical, 2014-02, Vol.191, p.666-672

2014

Volltextzugriff (PDF)

Reliability and Thermal Stability of Clustered Vertical Furnace-Grown SiO2 With HfxTayN Metal Gate for Advanced MOS Device Application

IEEE transactions on electron devices, 2007-02, Vol.54 (2), p.233

2007

Volltextzugriff (PDF)

Performance improvement of gadolinium oxide resistive random access memory treated by hydrogen plasma immersion ion implantation

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-03, Vol.32 (2)

2014

Volltextzugriff (PDF)

Oxygen plasma immersion ion implantation treatment to enhance data retention of tungsten nanocrystal nonvolatile memory

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-03, Vol.32 (2)

2014

Volltextzugriff (PDF)

Electrical characteristics of SiGe pMOSFET devices with tantalum or titanium oxide higher-k dielectric stack

Solid-state electronics, 2012-12, Vol.78, p.17-21

2012

Volltextzugriff (PDF)

Characteristics of plasma immersion ion implantation treatment on tungsten nanocrystal nonvolatile memory

Solid-state electronics, 2012-11, Vol.77, p.31-34

2012

Volltextzugriff (PDF)

Effect of nitriding surface treatment on the corrosion resistance of dental nickel–titanium files in 5.25% sodium hypochlorite solution

Journal of alloys and compounds, 2009-05, Vol.475 (1), p.789-793

2009

Volltextzugriff (PDF)

Improved electrical characteristics and reliability of Ge MOSFET device with nitrided high-k gate dielectric by plasma immersion ion implantation

Microelectronic engineering, 2011-07, Vol.88 (7), p.1560-1563

2011

Volltextzugriff (PDF)

Charge retention improvement of charge-trapping type flash device by plasma immersion ion implantation

Microelectronic engineering, 2009-07, Vol.86 (7), p.1852-1855

2009

Volltextzugriff (PDF)

Electrical Characteristics and Thermal Stability of \hbox\hbox\hbox\hbox Metal Gate Electrode for Advanced MOS Devices

IEEE transactions on electron devices, 2008-11, Vol.55 (11), p.3259-3266

2008

Volltextzugriff (PDF)

All-solid-state electrochromic device integrated with near-IR blocking layer for image sensor and energy-saving glass application

2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2016, p.211-212

2016

Volltextzugriff (PDF)

All-solid-state electrochromic thin films for optical iris application

2015 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2015, p.159-160

2015

Volltextzugriff (PDF)

Reliability and Thermal Stability of Clustered Vertical Furnace-Grown \hbox With \hbox\hbox\hbox Metal Gate for Advanced MOS Device Application

IEEE transactions on electron devices, 2007-02, Vol.54 (2), p.233-240

2007

Volltextzugriff (PDF)

MCNP simulation of TRR-II cold neutron source design

Physica. B, Condensed matter, 2002, Vol.311 (1), p.158-163

2002

Volltextzugriff (PDF)

Electrical Characteristics and Thermal Stability of HfxTaySizN Metal Gate Electrode for Advanced MOS Devices

IEEE transactions on electron devices, 2008-11, Vol.55 (11), p.3259-3266

2008

Volltextzugriff (PDF)

Electrical Characteristics and Thermal Stability of hbox Hf x hbox Ta y hbox Si z hbox N Metal Gate Electrode for Advanced MOS Devices

IEEE transactions on electron devices, 2008-01, Vol.55 (11)

2008

Volltextzugriff (PDF)

Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave: An Innovative Technique to Generate Large-Area VHF Plasmas

Plasma processes and polymers, 2014-01, Vol.11 (1), p.7-11

2014

Volltextzugriff (PDF)

Electrical characteristics of SiGe MOSFETs integrated with Tantalum or Titanium oxynitride higher-k gate dielectrics

2011 International Semiconductor Device Research Symposium (ISDRS), 2011, p.1-2

2011

Volltextzugriff (PDF)

Menü

Weitere Dienste

Einstellungen

Effect of oxygen plasma immersion ion implantation treatment on corrosion resistance and cell adhesion of titanium surface

Oxygen plasma immersion ion implantation treatment enhances the human bone marrow mesenchymal stem cells responses to titanium surface for dental implant application

High-Performance Multilevel Resistive Switching Gadolinium Oxide Memristors With Hydrogen Plasma Immersion Ion Implantation Treatment

The improvement of all-solid-state electrochromic devices fabricated with the reactive sputter and cathodic arc technology

Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave

Plasma immersion ion implantation induced improvements of mechanical properties, wear resistance, and adhesion of diamond-like carbon films deposited on tool steel

Electrical Characteristics and Thermal Stability of [Formula Omitted] Metal Gate Electrode for Advanced MOS Devices

Hybrid anion and cation ion sensors with samarium oxide sensing membrane treated by nitrogen plasma immersion ion implantation

Reliability and Thermal Stability of Clustered Vertical Furnace-Grown SiO2 With HfxTayN Metal Gate for Advanced MOS Device Application

Performance improvement of gadolinium oxide resistive random access memory treated by hydrogen plasma immersion ion implantation

Oxygen plasma immersion ion implantation treatment to enhance data retention of tungsten nanocrystal nonvolatile memory

Electrical characteristics of SiGe pMOSFET devices with tantalum or titanium oxide higher-k dielectric stack

Characteristics of plasma immersion ion implantation treatment on tungsten nanocrystal nonvolatile memory

Effect of nitriding surface treatment on the corrosion resistance of dental nickel–titanium files in 5.25% sodium hypochlorite solution

Improved electrical characteristics and reliability of Ge MOSFET device with nitrided high-k gate dielectric by plasma immersion ion implantation

Charge retention improvement of charge-trapping type flash device by plasma immersion ion implantation

Electrical Characteristics and Thermal Stability of \hbox\hbox\hbox\hbox Metal Gate Electrode for Advanced MOS Devices

All-solid-state electrochromic device integrated with near-IR blocking layer for image sensor and energy-saving glass application

All-solid-state electrochromic thin films for optical iris application

Reliability and Thermal Stability of Clustered Vertical Furnace-Grown \hbox With \hbox\hbox\hbox Metal Gate for Advanced MOS Device Application

MCNP simulation of TRR-II cold neutron source design

Electrical Characteristics and Thermal Stability of HfxTaySizN Metal Gate Electrode for Advanced MOS Devices

Electrical Characteristics and Thermal Stability of hbox Hf x hbox Ta y hbox Si z hbox N Metal Gate Electrode for Advanced MOS Devices

Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave: An Innovative Technique to Generate Large-Area VHF Plasmas

Electrical characteristics of SiGe MOSFETs integrated with Tantalum or Titanium oxynitride higher-k gate dielectrics

Suchergebnisse filtern