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Radical surface interactions in industrial silicon plasma etch reactors

Plasma sources science & technology, 2010-06, Vol.19 (3), p.034017-034017

2010

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Vacuum UV broad-band absorption spectroscopy: a powerful diagnostic tool for reactive plasma monitoring

Journal of physics. D, Applied physics, 2011-03, Vol.44 (12), p.122001

2011

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Room temperature synthesis of carbon nanofibers containing nitrogen by plasma-enhanced chemical vapor deposition

Applied physics letters, 2004-08, Vol.85 (7), p.1244-1246

2004

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Experimental study of a pre-ionized high power pulsed magnetron discharge

Plasma sources science & technology, 2007-08, Vol.16 (3), p.501-510

2007

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Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target

Journal of physics. D, Applied physics, 2008-08, Vol.41 (15), p.152003-152003 (4)

2008

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Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule

Journal of physics. D, Applied physics, 2008-06, Vol.41 (11), p.115205-115205 (12)

2008

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O2(a1Δg) production at atmospheric pressure by microdischarge

Applied physics letters, 2008, Vol.90 (1)

2008

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Study of a fast high power pulsed magnetron discharge: role of plasma deconfinement on the charged particle transport

Plasma sources science & technology, 2008-08, Vol.17 (3), p.035007

2008

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Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge

Europhysics letters, 2005-11, Vol.72 (3), p.390-395

2005

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On the use of actinometry to measure the dissociation in O2 DC glow discharges: determination of the wall recombination probability

Journal of physics. D, Applied physics, 1995-09, Vol.28 (9), p.1856-1868

1995

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Surface kinetics of N and O atoms in N2-O2 discharges

Journal of physics. D, Applied physics, 1996-04, Vol.29 (4), p.1021-1031

1996

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Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil

Thin solid films, 2008-06, Vol.516 (15), p.4700-4708

2008

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Reactions of Metastable Argon Atoms with Molecular Hydrogen at 300 and 80 K: Origin of the Ultraviolet Chemiluminescence

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2002-09, Vol.106 (36), p.8399-8405

2002

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New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour

Surface & coatings technology, 2004-02, Vol.179 (2), p.176-181

2004

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Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2004-01, Vol.22 (1), p.192-200

2004

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Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.800-803

2005

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IPVD deposition of titanium based thin films

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.717-720

2005

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Two-photon laser induced fluorescence and amplified spontaneous emission atom concentration measurements in O2 and H2 discharges

Journal of applied physics, 1994-08, Vol.76 (3), p.1487-1493

1994

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Transient phenomena in closed electron drift plasma thrusters: insights obtained in a French cooperative program

Plasma sources science & technology, 2001-05, Vol.10 (2), p.364-377

2001

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Broadband and time-resolved absorption spectroscopy with light emitting diodes: Application to etching plasma monitoring

Applied physics letters, 2007-12, Vol.91 (23), p.231503-231503-3

2007

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Methane decomposition and active nitrogen in a N2-CH4 glow discharge at low pressures

Plasma sources science & technology, 1999-08, Vol.8 (3), p.463-478

1999

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Débattre: Pratiques scolaires et démarches éducatives

2007

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Fundamental aspects in non-reactive and reactive magnetron discharges

Plasma sources science & technology, 2003-11, Vol.12 (4), p.S33-S42

2003

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Electrical characterization of an rf planar magnetron in inert gases

Journal of physics. D, Applied physics, 2000-08, Vol.33 (15), p.1884-1893

2000

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Long-term Results of Deep Anterior Lamellar versus Penetrating Keratoplasty

Ophthalmology (Rochester, Minn.), 2012-02, Vol.119 (2), p.249-255

2012

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Radical surface interactions in industrial silicon plasma etch reactors

Vacuum UV broad-band absorption spectroscopy: a powerful diagnostic tool for reactive plasma monitoring

Room temperature synthesis of carbon nanofibers containing nitrogen by plasma-enhanced chemical vapor deposition

Experimental study of a pre-ionized high power pulsed magnetron discharge

Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target

Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule

O2(a1Δg) production at atmospheric pressure by microdischarge

Study of a fast high power pulsed magnetron discharge: role of plasma deconfinement on the charged particle transport

Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge

On the use of actinometry to measure the dissociation in O2 DC glow discharges: determination of the wall recombination probability

Surface kinetics of N and O atoms in N2-O2 discharges

Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil

Reactions of Metastable Argon Atoms with Molecular Hydrogen at 300 and 80 K: Origin of the Ultraviolet Chemiluminescence

New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour

Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems

Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge

IPVD deposition of titanium based thin films

Two-photon laser induced fluorescence and amplified spontaneous emission atom concentration measurements in O2 and H2 discharges

Transient phenomena in closed electron drift plasma thrusters: insights obtained in a French cooperative program

Broadband and time-resolved absorption spectroscopy with light emitting diodes: Application to etching plasma monitoring

Methane decomposition and active nitrogen in a N2-CH4 glow discharge at low pressures

Débattre: Pratiques scolaires et démarches éducatives

Fundamental aspects in non-reactive and reactive magnetron discharges

Electrical characterization of an rf planar magnetron in inert gases

Long-term Results of Deep Anterior Lamellar versus Penetrating Keratoplasty

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