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Thermodynamic Study of Iridium(I) Complexes as a Basis for Chemical Gas-Phase Deposition Technology

Russian journal of general chemistry, 2021-10, Vol.91 (10), p.1990-1998

2021

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Thermal properties of some organosilicon precursors for chemical vapor deposition

Journal of thermal analysis and calorimetry, 2016-11, Vol.126 (2), p.609-616

2016

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Thermodynamic Characterization of Volatile Alkylamine Boranes as Precursors for the Formation of BCxNy Films

Russian journal of inorganic chemistry, 2023-02, Vol.68 (2), p.202-207

2023

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Structure and Thermal Properties of Tris-(methylcyclopentadienyl)Scandium

Journal of structural chemistry, 2023-12, Vol.64 (12), p.2461-2471

2023

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Complex of Magnesium Octafluoropropionyl Acetonate with N,N,N',N'-Tetramethylethylenediamine, [Mg(tmeda)(ofhac)2]: A Potential Volatile Precursor of MgF2 Films

Russian Journal of Physical Chemistry A, 2024, Vol.98 (1), p.43-49

2024

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Thermodynamic characteristics of phase conversion of structural isomers for volatile complex of ruthenium (III) trifluoroacetylacetonate

Journal of thermal analysis and calorimetry, 2010-07, Vol.101 (1), p.41-44

2010

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Thermal Properties of Cobalt(II) β-Iminoketonates

Russian journal of general chemistry, 2021-10, Vol.91 (10), p.1977-1983

2021

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Scandium(III) Benzoyltrifluoroacetonate: Structure and Thermal Properties

Russian journal of inorganic chemistry, 2023-09, Vol.68 (9), p.1192-1199

2023

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Thermodynamic Study of a Volatile Complex of Magnesium Benzoyltrifluoroacetonate with N,N,N',N'-Tetramethylethylenediamine

Russian journal of inorganic chemistry, 2023-02, Vol.68 (2), p.133-139

2023

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Thermodynamic Characterization of Ruthenium β-Diketonate Complex Ru(thd)3 as a Precursor for the CVD Preparation of Coatings

Russian journal of inorganic chemistry, 2020-05, Vol.65 (5), p.747-751

2020

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4-(Trimethylsilyl)morpholine: synthesis, characterization, and prospects of use in film deposition processes

Russian chemical bulletin, 2017-12, Vol.66 (12), p.2283-2289

2017

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Thermodynamic simulation of silicon deposition from the gas phase of Si-Cl-H system

Inorganic materials, 2009-05, Vol.45 (5), p.463-467

2009

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Thermodynamic modeling of the deposition of Si—C—N films from the gas phase during the decomposition of organosilicon compounds

Russian chemical bulletin, 2018-06, Vol.67 (6), p.980-985

2018

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O,N-coordinated Ni(II) beta-diketonate derivatives: Synthesis, thermal properties, MOCVD applications

Surface & coatings technology, 2013-09, Vol.230, p.290-296

2013

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Thermodynamic modeling and preparation of hafnium carbide coatings in the hafnium–carbon–fluorine system

Inorganic materials, 2016-07, Vol.52 (7), p.661-668

2016

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Thermoanalytical and mass spectrometric study of Ni(iso-Bu₂PS₂)₂ and NiL(iso-Bu₂PS₂)₂ (L = 2,2′-Bipy, Phen). Saturation vapor pressure over the Ni(iso-Bu₂PS₂)₂ chelate

Russian journal of inorganic chemistry, 2010, Vol.55 (9), p.1438-1442

2010

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Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films

Russian journal of applied chemistry, 2018-07, Vol.91 (7), p.1068-1075

2018

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Calculation of phase equilibria between the gas and the solid phases in the Nb-I and He-Nb-I systems

Russian journal of inorganic chemistry, 2015, Vol.60 (1), p.80-83

2015

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MOCVD growth and study of magnetic Co films

Surface engineering, 2016-01, Vol.32 (1), p.8-14

2016

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Crystallochemical study of ruthenium(III) tris-dipivaloylmethanate

Journal of structural chemistry, 2016-07, Vol.57 (4), p.826-829

2016

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Thermal properties of hafnium(IV) and zirconium(IV) β-diketonates

Journal of thermal analysis and calorimetry, 2008-06, Vol.92 (3), p.729-734

2008

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Synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine

Glass physics and chemistry, 2014-03, Vol.40 (2), p.261-266

2014

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Et3GeN(SiMe3)2 and Et3SnN(SiMe3)2: New precursors for chemical vapor deposition processes

Inorganic materials, 2013-04, Vol.49 (4), p.363-367

2013

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Characterization of some trimethyl(organylamino)silanes—precursors for preparation of silicon carbonitride films

Glass physics and chemistry, 2010-06, Vol.36 (3), p.376-381

2010

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Films based on the phases in the Si-C-N System: Part 1. Synthesis and characterization of bis(trimethylsilyl)ethylamine as a precursor

Glass physics and chemistry, 2012-02, Vol.38 (1), p.8-14

2012

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1 – 25 von 1.079

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Thermodynamic Study of Iridium(I) Complexes as a Basis for Chemical Gas-Phase Deposition Technology

Thermal properties of some organosilicon precursors for chemical vapor deposition

Thermodynamic Characterization of Volatile Alkylamine Boranes as Precursors for the Formation of BCxNy Films

Structure and Thermal Properties of Tris-(methylcyclopentadienyl)Scandium

Complex of Magnesium Octafluoropropionyl Acetonate with N,N,N',N'-Tetramethylethylenediamine, [Mg(tmeda)(ofhac)2]: A Potential Volatile Precursor of MgF2 Films

Thermodynamic characteristics of phase conversion of structural isomers for volatile complex of ruthenium (III) trifluoroacetylacetonate

Thermal Properties of Cobalt(II) β-Iminoketonates

Scandium(III) Benzoyltrifluoroacetonate: Structure and Thermal Properties

Thermodynamic Study of a Volatile Complex of Magnesium Benzoyltrifluoroacetonate with N,N,N',N'-Tetramethylethylenediamine

Thermodynamic Characterization of Ruthenium β-Diketonate Complex Ru(thd)3 as a Precursor for the CVD Preparation of Coatings

4-(Trimethylsilyl)morpholine: synthesis, characterization, and prospects of use in film deposition processes

Thermodynamic simulation of silicon deposition from the gas phase of Si-Cl-H system

Thermodynamic modeling of the deposition of Si—C—N films from the gas phase during the decomposition of organosilicon compounds

O,N-coordinated Ni(II) beta-diketonate derivatives: Synthesis, thermal properties, MOCVD applications

Thermodynamic modeling and preparation of hafnium carbide coatings in the hafnium–carbon–fluorine system

Thermoanalytical and mass spectrometric study of Ni(iso-Bu₂PS₂)₂ and NiL(iso-Bu₂PS₂)₂ (L = 2,2′-Bipy, Phen). Saturation vapor pressure over the Ni(iso-Bu₂PS₂)₂ chelate

Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films

Calculation of phase equilibria between the gas and the solid phases in the Nb-I and He-Nb-I systems

MOCVD growth and study of magnetic Co films

Crystallochemical study of ruthenium(III) tris-dipivaloylmethanate

Thermal properties of hafnium(IV) and zirconium(IV) β-diketonates

Synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine

Et3GeN(SiMe3)2 and Et3SnN(SiMe3)2: New precursors for chemical vapor deposition processes

Characterization of some trimethyl(organylamino)silanes—precursors for preparation of silicon carbonitride films

Films based on the phases in the Si-C-N System: Part 1. Synthesis and characterization of bis(trimethylsilyl)ethylamine as a precursor

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