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Interfacial self cleaning during atomic layer deposition and annealing of HfO2 films on native (100)-GaAs substrates

Applied physics letters, 2010-03, Vol.96 (11)

2010

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Energy-band alignment of Al2O3 and HfAlO gate dielectrics deposited by atomic layer deposition on 4H–SiC

Applied physics letters, 2010-01, Vol.96 (4)

2010

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Modes of Failure in Explanted Mitroflow Pericardial Valves

The Annals of thoracic surgery, 2011-11, Vol.92 (5), p.1621-1627

2011

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Properties of atomic layer deposited dielectrics for AlGaN GaN device passivation

Semiconductor science and technology, 2013-07, Vol.28 (7), p.74004

2013

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Redox state and mitochondrial respiratory chain function in skeletal muscle of LGMD2A patients

PloS one, 2014-07, Vol.9 (7), p.e102549-e102549

2014

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An experimental study of Quartets MaxCut and other supertree methods

Algorithms for molecular biology, 2011-04, Vol.6 (1), p.7-7, Article 7

2011

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Atomic Layer Deposition of \hbox for AlGaN/GaN MOS-HFETs

IEEE electron device letters, 2012-09, Vol.33 (9), p.1240-1242

2012

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SuperFine: Fast and Accurate Supertree Estimation

Systematic biology, 2012-03, Vol.61 (2), p.214-227

2012

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Pattern of drug resistance among patients of pulmonary tuberculosis

Indian journal of tuberculosis, 2022-10, Vol.69 (4), p.669-674

2022

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Atomic Layer Deposition of SiO2 for AlGaN/GaN MOS-HFETs

IEEE electron device letters, 2012-09, Vol.33 (9), p.1240-1242

2012

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Impact of elemental arsenic on electrical characteristics of metal-oxide-semiconductor capacitors on GaAs using atomic-layer deposited HfO2 gate dielectric

Applied physics letters, 2008-06, Vol.92 (24)

2008

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Therapeutic potential of exosomes in Pompe disease: Treatment of tomorrow, today for lysosomal diseases

Molecular genetics and metabolism, 2015-02, Vol.114 (2), p.S100-S100

2015

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Exercise‐Induced Amelioration of Diet‐Induced Obesity and Diabetes is Not Regulated by Irisin

The FASEB journal, 2015-04, Vol.29 (S1)

2015

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Interfacial self cleaning during atomic layer deposition and annealingof HfO 2 films on native (100)-GaAs substrates

Applied physics letters, 2010-03, Vol.96 (11), p.112905-112905-3

2010

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Properties of atomic layer deposited dielectrics for AlGaN/GaN device passivation: Gallium nitride electronics

Semiconductor science and technology, 2013, Vol.28 (7)

2013

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Electrical characteristics of metal-oxide-semiconductor capacitors on p -GaAs using atomic layer deposition of ultrathin HfAlO gate dielectric

Applied physics letters, 2008-11, Vol.93 (19), p.193504-193504-3

2008

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Polymerase gamma mutator mice rely on increased glycolytic flux for energy production

Mitochondrion, 2015-03, Vol.21, p.19-26

2015

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Mitroflow pericardial bioprosthesis: structured failure at 4.5 years

Cardiovascular pathology, 2012-11, Vol.21 (6), p.506-510

2012

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Impact of elemental arsenic on electrical characteristicsof metal-oxide-semiconductor capacitors on GaAs using atomic-layer deposited Hf O 2 gate dielectric

Applied physics letters, 2008-06, Vol.92 (24), p.243506-243506-3

2008

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Energy-band alignment of Al 2 O 3 and HfAlO gate dielectrics depositedby atomic layer deposition on 4 H - SiC

Applied physics letters, 2010-01, Vol.96 (4), p.042903-042903-3

2010

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EXERsomes induce systemic mitochondrial rejuvenation and ameliorate diet-induced obesity: Thinking inside the box for a change

Mitochondrion, 2015-09, Vol.24, p.S28

2015

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(Invited) Interface Investigation of ALD Dielectrics on III-N Substrates for RF, Mixed Signal and Power Applications

ECS transactions, 2010, Vol.28 (1), p.227-230

2010

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Benchmark datasets and software for developing and testing methods for large-scale multiple sequence alignment and phylogenetic inference

PLoS currents, 2010-11, Vol.2, p.RRN1195-RRN1195

2010

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Investigation of MOS Interfaces with Atomic-Layer-Deposited High-k Gate Dielectrics on III-V Semiconductors

Suri, Rahul

2010

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Interface and Electrical Properties of Atomic-layer-deposited HfAlO Gate Dielectric for N-channel GaAs MOSFETs

MRS proceedings, 2009, Vol.1155 (1), Article 1155-C10-06

2009

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Interfacial self cleaning during atomic layer deposition and annealing of HfO2 films on native (100)-GaAs substrates

Energy-band alignment of Al2O3 and HfAlO gate dielectrics deposited by atomic layer deposition on 4H–SiC

Modes of Failure in Explanted Mitroflow Pericardial Valves

Properties of atomic layer deposited dielectrics for AlGaN GaN device passivation

Redox state and mitochondrial respiratory chain function in skeletal muscle of LGMD2A patients

An experimental study of Quartets MaxCut and other supertree methods

Atomic Layer Deposition of \hbox for AlGaN/GaN MOS-HFETs

SuperFine: Fast and Accurate Supertree Estimation

Pattern of drug resistance among patients of pulmonary tuberculosis

Atomic Layer Deposition of SiO2 for AlGaN/GaN MOS-HFETs

Impact of elemental arsenic on electrical characteristics of metal-oxide-semiconductor capacitors on GaAs using atomic-layer deposited HfO2 gate dielectric

Therapeutic potential of exosomes in Pompe disease: Treatment of tomorrow, today for lysosomal diseases

Exercise‐Induced Amelioration of Diet‐Induced Obesity and Diabetes is Not Regulated by Irisin

Interfacial self cleaning during atomic layer deposition and annealingof HfO 2 films on native (100)-GaAs substrates

Properties of atomic layer deposited dielectrics for AlGaN/GaN device passivation: Gallium nitride electronics

Electrical characteristics of metal-oxide-semiconductor capacitors on p -GaAs using atomic layer deposition of ultrathin HfAlO gate dielectric

Polymerase gamma mutator mice rely on increased glycolytic flux for energy production

Mitroflow pericardial bioprosthesis: structured failure at 4.5 years

Impact of elemental arsenic on electrical characteristicsof metal-oxide-semiconductor capacitors on GaAs using atomic-layer deposited Hf O 2 gate dielectric

Energy-band alignment of Al 2 O 3 and HfAlO gate dielectrics depositedby atomic layer deposition on 4 H - SiC

EXERsomes induce systemic mitochondrial rejuvenation and ameliorate diet-induced obesity: Thinking inside the box for a change

(Invited) Interface Investigation of ALD Dielectrics on III-N Substrates for RF, Mixed Signal and Power Applications

Benchmark datasets and software for developing and testing methods for large-scale multiple sequence alignment and phylogenetic inference

Investigation of MOS Interfaces with Atomic-Layer-Deposited High-k Gate Dielectrics on III-V Semiconductors

Interface and Electrical Properties of Atomic-layer-deposited HfAlO Gate Dielectric for N-channel GaAs MOSFETs

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