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Adsorption controlled preparation of heterogeneous catalysts

Studies in Surface Science and Catalysis, 1999, Vol.120, p.715-750

1999

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Atomic layer epitaxy

Thin solid films, 1992-08, Vol.216 (1), p.84-89

Suntola, Tuomo

1992

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Initial activity of reduced chromia/alumina catalyst in n-butane dehydrogenation monitored by on-line FT-IR gas analysis

Journal of catalysis, 1996-06, Vol.161 (1), p.393-400

1996

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CdTe Thin-Film Solar Cells

MRS bulletin, 1993-10, Vol.18 (10), p.45-47

Suntola, T.

1993

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Atomic layer growth of TiO2 on silica

Applied surface science, 1992, Vol.60-61, p.742-748

1992

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Surface chemistry of materials deposition at atomic layer level

Applied surface science, 1996-07, Vol.100, p.391-398

Suntola, Tuomo

1996

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Analytical and chemical techniques in the study of surface species in atomic layer epitaxy

Thin solid films, 1993-03, Vol.225 (1), p.280-283

1993

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A study of ZnTe films grown on glass substrates using an atomic layer evaporation method

Thin solid films, 1980-02, Vol.65 (3), p.301-307

1980

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Atomic layer epitaxy growth of doped zinc oxide thin films from organometals

Applied surface science, 1994-12, Vol.82 (1-4), p.34-40

1994

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Characterization of surface exchange reactions used to grow compound films

Applied physics letters, 1981-01, Vol.38 (3), p.131-132

1981

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Amorphous thin film active elements in switching devices

Thin solid films, 1976-05, Vol.34 (1), p.9-16

Suntola, T.

1976

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On the mechanism of switching effects in chalcogenide thin films

Solid-state electronics, 1971-01, Vol.14 (10), p.933-938

Suntola, T.

1971

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Cost-effective processing by atomic layer epitaxy

Thin solid films, 1993-03, Vol.225 (1), p.96-98

Suntola, Tuomo

1993

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Surface reactions in Al2O3 growth from trimethylaluminium and water by atomic layer epitaxy

Applied surface science, 1996-11, Vol.107 (1-4), p.107-115

1996

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Preparation of Ni/Al2O3 catalysts from vapor phase by atomic layer epitaxy

Catalysis letters, 1994-01, Vol.27 (3-4), p.323-336

1994

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Chemisorption of chromium acetylacetonate on porous high surface area silica

Applied surface science, 1994-01, Vol.75 (1), p.220-227

1994

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Processing of catalysts by atomic layer epitaxy: modification of supports

Applied surface science, 1997-11, Vol.121, p.286-291

1997

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Growth mechanisms of mixed oxides on alumina

Applied surface science, 1997-03, Vol.112, p.23-29

1997

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Surface chemistry of materials deposition at atomic layer level

Applied surface science, 1996, Vol.100-01, p.391-398

SUNTOLA, T

1996

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Direct-Current Measurement of the Hall Effect in Trigonal Selenium Single Crystal

Journal of applied physics, 1969-06, Vol.40 (7), p.2923-2927

1969

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Surface coverage of ALE precursors on oxides

Applied surface science, 1994-12, Vol.82 (1-4), p.548-552

1994

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Surface reactions in Al 2O 3 growth from trimethylaluminium and water by atomic layer epitaxy

Applied surface science, 1996, Vol.107, p.107-115

1996

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High field effects in chalcogenide thin films

Solid-state electronics, 1972-01, Vol.15 (6), p.611-616

1972

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Progress in inexpensive a-Si:H/a-Si:H tandem module technology

Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint Conference of PVSC, PVSEC and PSEC), 1994, Vol.1, p.626-629 vol.1

1994

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Frequency-dependent conductivity and capacitance in chalcogenide thin films

Thin solid films, 1972-01, Vol.12 (2), p.227-230

1972

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Adsorption controlled preparation of heterogeneous catalysts

Atomic layer epitaxy

Initial activity of reduced chromia/alumina catalyst in n-butane dehydrogenation monitored by on-line FT-IR gas analysis

CdTe Thin-Film Solar Cells

Atomic layer growth of TiO2 on silica

Surface chemistry of materials deposition at atomic layer level

Analytical and chemical techniques in the study of surface species in atomic layer epitaxy

A study of ZnTe films grown on glass substrates using an atomic layer evaporation method

Atomic layer epitaxy growth of doped zinc oxide thin films from organometals

Characterization of surface exchange reactions used to grow compound films

Amorphous thin film active elements in switching devices

On the mechanism of switching effects in chalcogenide thin films

Cost-effective processing by atomic layer epitaxy

Surface reactions in Al2O3 growth from trimethylaluminium and water by atomic layer epitaxy

Preparation of Ni/Al2O3 catalysts from vapor phase by atomic layer epitaxy

Chemisorption of chromium acetylacetonate on porous high surface area silica

Processing of catalysts by atomic layer epitaxy: modification of supports

Growth mechanisms of mixed oxides on alumina

Surface chemistry of materials deposition at atomic layer level

Direct-Current Measurement of the Hall Effect in Trigonal Selenium Single Crystal

Surface coverage of ALE precursors on oxides

Surface reactions in Al 2O 3 growth from trimethylaluminium and water by atomic layer epitaxy

High field effects in chalcogenide thin films

Progress in inexpensive a-Si:H/a-Si:H tandem module technology

Frequency-dependent conductivity and capacitance in chalcogenide thin films

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