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Stat5 is indispensable for the maintenance of bcr/abl‐positive leukaemia

EMBO molecular medicine, 2010-03, Vol.2 (3), p.98-110

2010

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Nanopatterning of Magnetic Disks by Single-Step Ar+ Ion Projection

Advanced materials (Weinheim), 2003-07, Vol.15 (14), p.1152-1155

2003

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Ion projection direct structuring for patterning of magnetic media

IEEE transactions on magnetics, 2002-09, Vol.38 (5), p.1952-1954

2002

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Regulation and function of transcription factor GATA-1 during red blood cell differentiation

Development (Cambridge), 1996-12, Vol.122 (12), p.3839-3850

1996

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Raf-1 antagonizes erythroid differentiation by restraining caspase activation

The Journal of experimental medicine, 2002-11, Vol.196 (10), p.1347-1353

2002

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Ion projection lithography below 70 nm: tool performance and resist process

Microelectronic engineering, 2002-07, Vol.61, p.301-307

2002

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Analysis of proteins that interact with the IL‐2 regulatory region in patients with rheumatic diseases

Clinical and experimental immunology, 1995-03, Vol.99 (3), p.325-330

1995

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Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.3202-3206

2000

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The thyroid hormone receptor functions as a ligand-operated developmental switch between proliferation and differentiation of erythroid progenitors

The EMBO journal, 1998-08, Vol.17 (15), p.4291-4303

1998

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Resolution improvement of ion projector with a low energy spread multicusp ion source

Microelectronic engineering, 1999, Vol.46 (1), p.477-480

1999

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Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography

Microelectronic engineering, 2000-06, Vol.53 (1), p.617-620

2000

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Analysis of stencil mask distortion in ion projection lithography

Microelectronic engineering, 1997-02, Vol.35 (1-4), p.443-446

1997

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Stencil mask distortion control using nonsymmetric perforation rings

Microelectronic engineering, 1998-03, Vol.41, p.225-228

1998

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Silicon stencil masks for masked ion beam lithography proximity printing

Microelectronic engineering, 1996-01, Vol.30 (1-4), p.257-260

1996

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Evaluation of critical design parameters of an ion projector for 1 Gbit DRAM production

Microelectronic engineering, 1995-02, Vol.27 (1), p.323-326

1995

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Masked ion beam lithography for proximity printing

Microelectronic engineering, 1996-01, Vol.30 (1-4), p.241-244

1996

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Progress in ion projection lithography

Microelectronic engineering, 1992-03, Vol.17 (1), p.229-240

1992

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Ion projection lithography: International development program

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999-11, Vol.17 (6), p.3091-3097

1999

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Ion projector distortion stability and wafer exposures under electronic alignment (“pattern lock”) conditions

Microelectronic engineering, 1993-04, Vol.21 (1), p.187-190

1993

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Lithography with high depth of focus by an ion projection system

Journal of microelectromechanical systems, 1992-09, Vol.1 (3), p.116-120

1992

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Distortion evaluation of nickel stencil masks with the help of ion proximity exposures and registration measurements on the Leitz LMS- 2000

Microelectronic engineering, 1993-04, Vol.21 (1), p.359-362

1993

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v-erbA overexpression is required to extinguish c-erbA function in erythroid cell differentiation and regulation of the erbA target gene CAII

Genes & development, 1991-11, Vol.5 (11), p.2033-2047

1991

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Ion projection lithography in (in)organic resist layers

Microelectronic engineering, 1986, Vol.5 (1), p.193-200

1986

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Fabrication of submicron deep ultraviolet masks by ion microprojection

Applied physics letters, 1985, Vol.47 (12), p.1358-1360

1985

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Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.3207-3209

2000

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Stat5 is indispensable for the maintenance of bcr/abl‐positive leukaemia

Nanopatterning of Magnetic Disks by Single-Step Ar+ Ion Projection

Ion projection direct structuring for patterning of magnetic media

Regulation and function of transcription factor GATA-1 during red blood cell differentiation

Raf-1 antagonizes erythroid differentiation by restraining caspase activation

Ion projection lithography below 70 nm: tool performance and resist process

Analysis of proteins that interact with the IL‐2 regulatory region in patients with rheumatic diseases

Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

The thyroid hormone receptor functions as a ligand-operated developmental switch between proliferation and differentiation of erythroid progenitors

Resolution improvement of ion projector with a low energy spread multicusp ion source

Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography

Analysis of stencil mask distortion in ion projection lithography

Stencil mask distortion control using nonsymmetric perforation rings

Silicon stencil masks for masked ion beam lithography proximity printing

Evaluation of critical design parameters of an ion projector for 1 Gbit DRAM production

Masked ion beam lithography for proximity printing

Progress in ion projection lithography

Ion projection lithography: International development program

Ion projector distortion stability and wafer exposures under electronic alignment (“pattern lock”) conditions

Lithography with high depth of focus by an ion projection system

Distortion evaluation of nickel stencil masks with the help of ion proximity exposures and registration measurements on the Leitz LMS- 2000

v-erbA overexpression is required to extinguish c-erbA function in erythroid cell differentiation and regulation of the erbA target gene CAII

Ion projection lithography in (in)organic resist layers

Fabrication of submicron deep ultraviolet masks by ion microprojection

Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks

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