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Discrete and modal focusing effects: principles and applications

Plasma physics and controlled fusion, 2012-12, Vol.54 (12), p.124048

Stamate, E

2012

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High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions

Journal of applied physics, 2012-04, Vol.111 (8), p.083303-083303-6

2012

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Chemical Composition and Structure of Adsorbed Material on Pore Surfaces in Middle East Reservoir Rocks

Energy & fuels, 2018-11, Vol.32 (11), p.11234-11242

2018

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IR and UV gas absorption measurements during NOx reduction on an industrial natural gas fired power plant

Fuel (Guildford), 2010-05, Vol.89 (5), p.978-985

2010

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Atmospheric pressure plasma produced inside a closed package by a dielectric barrier discharge in Ar/CO2 for bacterial inactivation of biological samples

Plasma sources science & technology, 2011-04, Vol.20 (2), p.025008

2011

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Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lens

Physical review letters, 2005-04, Vol.94 (12), p.125004.1-125004.4, Article 125004

2005

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Plasma parameters in the vicinity of the quartz window of a low pressure surface wave discharge produced in O2

Thin solid films, 2007-04, Vol.515 (12), p.4869-4873

2007

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Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar/SF6

Journal of applied physics, 2010-06, Vol.107 (12)

2010

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Controlling the ion flux on substrates of different geometry by sheath-lens focusing effect

Thin solid films, 2007-04, Vol.515 (12), p.4853-4859

2007

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Complex ion-focusing effect by the sheath above the wafer in plasma immersion ion implantation

Applied physics letters, 2005-06, Vol.86 (26), p.261501-261501-3

2005

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Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers

Thin solid films, 2007-04, Vol.515 (12), p.4887-4891

2007

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Improvement of the dose uniformity in plasma immersed ion implantation by introducing a vertical biased ring

Thin solid films, 2006-05, Vol.506 (Complete), p.571-574

2006

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Determination of negative-ion and electron parameters in an Ar/SF6 plasma

Journal of applied physics, 1998-09, Vol.84 (5), p.2450-2458

1998

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Principle and application of a thermal probe to reactive plasmas

Applied physics letters, 2002-04, Vol.80 (17), p.3066-3068

2002

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Development of high-efficiency laser Thomson scattering measurement system for the investigation of EEDF in surface wave plasma

Thin solid films, 2006-05, Vol.506 (Complete), p.679-682

2006

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On the surface condition of Langmuir probes in reactive plasmas

Applied physics letters, 2001-01, Vol.78 (2), p.153-155

2001

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Influence of surface condition in Langmuir probe measurements

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-05, Vol.20 (3), p.661-666

2002

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Sheath-lens probe for negative ion detection in reactive plasmas

Journal of applied physics, 2004-02, Vol.95 (3), p.830-833

2004

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Investigation of energetic electrons in a 915 MHz microwave discharge produced in Ar

Thin solid films, 2006-05, Vol.506 (Complete), p.701-704

2006

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Probe diagnostics of electronegative plasmas with bi-Maxwellian electrons

Journal of applied physics, 2001-02, Vol.89 (4), p.2058-2064

2001

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Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar / SF 6

Journal of applied physics, 2010-06, Vol.107 (12), p.123304-123304-9

2010

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Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar/SF{sub 6}

Journal of applied physics, 2010-06, Vol.107 (12)

2010

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Visualization of the sheath-lens focusing effect to disk and square electrodes

IEEE transactions on plasma science, 2005-04, Vol.33 (2), p.534-535

2005

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IEEE_Xplore

Response to “Comment on ‘On the surface condition of Langmuir probes in reactive plasmas’ ” [Appl. Phys. Lett. 79 , 2663 (2001)]

Applied physics letters, 2001-10, Vol.79 (16), p.2665-2665

2001

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Plasma diagnostics by detecting the ion flux profile to a biased-target

Surface & coatings technology, 2003-06, Vol.169, p.65-68

2003

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Discrete and modal focusing effects: principles and applications

High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions

Chemical Composition and Structure of Adsorbed Material on Pore Surfaces in Middle East Reservoir Rocks

IR and UV gas absorption measurements during NOx reduction on an industrial natural gas fired power plant

Atmospheric pressure plasma produced inside a closed package by a dielectric barrier discharge in Ar/CO2 for bacterial inactivation of biological samples

Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lens

Plasma parameters in the vicinity of the quartz window of a low pressure surface wave discharge produced in O2

Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar/SF6

Controlling the ion flux on substrates of different geometry by sheath-lens focusing effect

Complex ion-focusing effect by the sheath above the wafer in plasma immersion ion implantation

Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers

Improvement of the dose uniformity in plasma immersed ion implantation by introducing a vertical biased ring

Determination of negative-ion and electron parameters in an Ar/SF6 plasma

Principle and application of a thermal probe to reactive plasmas

Development of high-efficiency laser Thomson scattering measurement system for the investigation of EEDF in surface wave plasma

On the surface condition of Langmuir probes in reactive plasmas

Influence of surface condition in Langmuir probe measurements

Sheath-lens probe for negative ion detection in reactive plasmas

Investigation of energetic electrons in a 915 MHz microwave discharge produced in Ar

Probe diagnostics of electronegative plasmas with bi-Maxwellian electrons

Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar / SF 6

Properties and etching rates of negative ions in inductively coupled plasmas and dc discharges produced in Ar/SF{sub 6}

Visualization of the sheath-lens focusing effect to disk and square electrodes

Response to “Comment on ‘On the surface condition of Langmuir probes in reactive plasmas’ ” [Appl. Phys. Lett. 79 , 2663 (2001)]

Plasma diagnostics by detecting the ion flux profile to a biased-target

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