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The Partial Hydrogenation of Benzene to Cyclohexene by Nanoscale Ruthenium Catalysts in Imidazolium Ionic Liquids

Chemistry : a European journal, 2004-08, Vol.10 (15), p.3734-3740

2004

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N2/H2 plasma surface modifications of polystyrene inhibit the adhesion of multidrug resistant bacteria

Surface & coatings technology, 2014-04, Vol.245, p.84-91

2014

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The effects of silane coupling agents on the properties of PHBV/halloysite nanocomposites

Applied clay science, 2014-01, Vol.87, p.311-319

2014

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Stabilization of the GeO 2 /Ge Interface by Nitrogen Incorporation in a One-Step NO Thermal Oxynitridation

ACS applied materials & interfaces, 2016-10, Vol.8 (40), p.27339-27345

2016

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Stabilization of the GeO2/Ge Interface by Nitrogen Incorporation in a One-Step NO Thermal Oxynitridation

ACS applied materials & interfaces, 2016-10, Vol.8 (40), p.27339-27345

2016

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Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001)

Nanotechnology, 2021-04, Vol.32 (14), p.145707-145707

2021

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Reversibility of Graphene Photochlorination

Journal of physical chemistry. C, 2018-07, Vol.122 (28), p.16333-16338

2018

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Natural Green Coating Inhibits Adhesion of Clinically Important Bacteria

Scientific reports, 2015-02, Vol.5 (1), p.8287-8287, Article 8287

2015

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Tuning MoS2 reactivity toward halogenation

Journal of materials chemistry. C, Materials for optical and electronic devices, 2019, Vol.7 (46), p.14672-14677

2019

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Carbon nitride film deposition by active screen plasma nitriding

Materials letters, 2011-10, Vol.65 (19), p.2985-2988

2011

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Tuning MoS reactivity toward halogenation

Journal of materials chemistry. C, Materials for optical and electronic devices, 2019-11, Vol.7 (46), p.14672-14677

2019

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Tuning MoS 2 reactivity toward halogenation

Journal of materials chemistry. C, Materials for optical and electronic devices, 2019-11, Vol.7 (46), p.14672-14677

2019

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Molybdenum Disulfide and Tungsten Disulfide as Novel Two-Dimensional Nanomaterials in Separation Science

Two-Dimensional (2D) Nanomaterials in Separation Science, 2021, p.193-217

2021

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Polypropylene surface modification by active screen plasma nitriding

Materials Science & Engineering C, 2009-03, Vol.29 (2), p.363-366

2009

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SiO2/SiC Interfacial Region: Presence of Silicon Oxycarbides and Effects of Hydrogen Peroxide and Water Vapor Thermal Treatments

Materials science forum, 2012, Vol.717-720, p.747-752

2012

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Improvement in the SiO2/4H-SiC Interfacial Region by Thermal Treatments with Hydrogen Peroxide

Materials science forum, 2012, Vol.717-720, p.753-756

2012

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The Role Played in the Improvement of the SiO2/SiC Interface by a Thin SiO2 Film Thermally Grown Prior to Oxide Film Deposition

ECS solid state letters, 2013-01, Vol.2 (1), p.P8-P10

2013

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Desorption of Ge Species during Thermal Oxidation of Ge and Annealing of HfO 2 /GeO 2 Stacks

ECS transactions, 2012-04, Vol.45 (4), p.137-144

2012

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Hydrogen Incorporation Dependence on the Thermal Growth Route in Dielectric/SiC Structures

ECS journal of solid state science and technology, 2013-01, Vol.2 (8), p.N3041-N3044

2013

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Consequences of NO Thermal Treatments in the Properties of Dielectric Films / SiC Structures

Materials science forum, 2010-01, Vol.645-648, p.689-692

2010

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Presence and Resistance to Wet Etching of Silicon Oxycarbides at the SiO[sub 2]/SiC Interface

Electrochemical and solid-state letters, 2008, Vol.11 (9), p.H258

2008

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Evaluation of Harmonic Contribution Impacts in the Electric Grid Through Linear Regression, Artificial Neural Networks and Regression tree

2018 IEEE PES Transmission & Distribution Conference and Exhibition - Latin America (T&D-LA), 2018, p.1-5

2018

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Alternative routes to minimize electrical degradation in 4H-SiC MOS capacitors

28th Symposium on Microelectronics Technology and Devices (SBMicro 2013), 2013, p.1-3

2013

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Hydrogen Interaction with HfO 2 Films Deposited on Ge(100) and Si(100)

Meeting abstracts (Electrochemical Society), 2012-06, Vol.MA2012-02 (31), p.2585-2585

2012

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Desorption of Ge Species during Thermal Oxidation of Ge and Annealing of HfO 2 /GeO 2 Stacks

Meeting abstracts (Electrochemical Society), 2012-02, Vol.MA2012-01 (17), p.768-768

2012

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The Partial Hydrogenation of Benzene to Cyclohexene by Nanoscale Ruthenium Catalysts in Imidazolium Ionic Liquids

N2/H2 plasma surface modifications of polystyrene inhibit the adhesion of multidrug resistant bacteria

The effects of silane coupling agents on the properties of PHBV/halloysite nanocomposites

Stabilization of the GeO 2 /Ge Interface by Nitrogen Incorporation in a One-Step NO Thermal Oxynitridation

Stabilization of the GeO2/Ge Interface by Nitrogen Incorporation in a One-Step NO Thermal Oxynitridation

Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001)

Reversibility of Graphene Photochlorination

Natural Green Coating Inhibits Adhesion of Clinically Important Bacteria

Tuning MoS2 reactivity toward halogenation

Carbon nitride film deposition by active screen plasma nitriding

Tuning MoS reactivity toward halogenation

Tuning MoS 2 reactivity toward halogenation

Molybdenum Disulfide and Tungsten Disulfide as Novel Two-Dimensional Nanomaterials in Separation Science

Polypropylene surface modification by active screen plasma nitriding

SiO2/SiC Interfacial Region: Presence of Silicon Oxycarbides and Effects of Hydrogen Peroxide and Water Vapor Thermal Treatments

Improvement in the SiO2/4H-SiC Interfacial Region by Thermal Treatments with Hydrogen Peroxide

The Role Played in the Improvement of the SiO2/SiC Interface by a Thin SiO2 Film Thermally Grown Prior to Oxide Film Deposition

Desorption of Ge Species during Thermal Oxidation of Ge and Annealing of HfO 2 /GeO 2 Stacks

Hydrogen Incorporation Dependence on the Thermal Growth Route in Dielectric/SiC Structures

Consequences of NO Thermal Treatments in the Properties of Dielectric Films / SiC Structures

Presence and Resistance to Wet Etching of Silicon Oxycarbides at the SiO[sub 2]/SiC Interface

Evaluation of Harmonic Contribution Impacts in the Electric Grid Through Linear Regression, Artificial Neural Networks and Regression tree

Alternative routes to minimize electrical degradation in 4H-SiC MOS capacitors

Hydrogen Interaction with HfO 2 Films Deposited on Ge(100) and Si(100)

Desorption of Ge Species during Thermal Oxidation of Ge and Annealing of HfO 2 /GeO 2 Stacks

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