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Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

Optics letters, 1998-10, Vol.23 (20), p.1609

1998

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Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas

Journal of the Optical Society of America. B, Optical physics, 2000-07, Vol.17 (7), p.1279

2000

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Intense EUV incoherent plasma sources for EUV lithography and other applications

IEEE journal of quantum electronics, 1999-05, Vol.35 (5), p.700-708

Silfvast, W.T.

1999

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Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography

Optics letters, 1997-01, Vol.22 (1), p.34

1997

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High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 135 nm

Applied Optics, 2000-07, Vol.39 (21), p.3678

2000

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The amazing cadmium atom

IEEE journal of selected topics in quantum electronics, 2000-11, Vol.6 (6), p.1400-1407

Silfvast, W.T.

2000

Volltextzugriff (PDF)

Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

Applied Optics, 2001-09, Vol.40 (27), p.4849

2001

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Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography

Applied Optics, 1995-10, Vol.34 (28), p.6513

1995

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Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography

Applied Optics, 1993-12, Vol.32 (34), p.6901

1993

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Photoionization lasers pumped by broadband soft-x-ray flux from laser-produced plasmas

Journal of the Optical Society of America. B, Optical physics, 1987-04, Vol.4 (4), p.609

1987

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Production of spectrally narrow soft-x-ray radiation through the use of broadband laser-produced plasma sources and multilayer-coated reflecting optics

Applied Optics, 1995-08, Vol.34 (22), p.4844

1995

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Investigation of distortion and damage of molybdenum–silicon multilayer reflective coatings with high-intensity ultraviolet radiation

Applied Optics, 1993-12, Vol.32 (34), p.6999

1993

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Effect of laser pulse duration on short wavelength emission from femtosecond and picosecond laser-produced Ta plasmas

Applied physics letters, 1988-08, Vol.53 (8), p.654-656

1988

Volltextzugriff (PDF)

Tenth micron lithography with a 10 Hz 37.2 nm sodium laser

Microelectronic engineering, 1988, Vol.8 (1), p.3-11

1988

Volltextzugriff (PDF)

Introduction to special issue of Applied Optics on soft-x-ray projection lithography

Applied Optics, 1993-12, Vol.32 (34), p.6895

1993

Volltextzugriff (PDF)

Intense EUV incoherent plasma sources for EUV lithography and other applications : Extreme Ultraviolet Lithography

IEEE journal of quantum electronics, 1999, Vol.35 (5), p.700-708

SILFVAST, W. T

1999

Volltextzugriff (PDF)

Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

Optics letters, 1990-05, Vol.15 (10), p.529

1990

Volltextzugriff (PDF)

Soft-x-ray projection imaging with a 1:1 ring-field optic

Applied Optics, 1993-12, Vol.32 (34), p.7072

1993

Volltextzugriff (PDF)

High-gain soft-x-ray-pumped photoionization laser in zinc vapor

Applied physics letters, 1984-08, Vol.45 (4), p.335-337

1984

Volltextzugriff (PDF)

Simple efficient traveling-wave excitation of short-wavelength lasers using a conical pumping geometry

Optics letters, 1989-01, Vol.14 (1), p.18

1989

Volltextzugriff (PDF)

Use of trilevel resists for high-resolution soft-x-ray projection lithography

Applied physics letters, 1990-05, Vol.56 (22), p.2180-2182

1990

Volltextzugriff (PDF)

Recombination laser transitions in expanding plasmas of Mg, Ca, Cu, Zn, Ag, Cd, In, Sn, Pb, and Bi

Optics letters, 1982-01, Vol.7 (1), p.34

1982

Volltextzugriff (PDF)

Population inversions in C iv in a recombing theta-pinch plasma

Optics letters, 1987-09, Vol.12 (9), p.675

1987

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EFFICIENT CW LASER OSCILLATION AT 4416 Å IN Cd (II)

Applied physics letters, 1968-09, Vol.13 (5), p.169-171

Silfvast, W. T.

1968

Volltextzugriff (PDF)

High -gain inner-shell photoionization laser in Cd vapor pumped by soft-x-ray radiation from a laser-produced plasma source

Optics letters, 1983-11, Vol.8 (11), p.551

1983

Volltextzugriff (PDF)

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Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas

Intense EUV incoherent plasma sources for EUV lithography and other applications

Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography

High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 135 nm

The amazing cadmium atom

Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography

Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography

Photoionization lasers pumped by broadband soft-x-ray flux from laser-produced plasmas

Production of spectrally narrow soft-x-ray radiation through the use of broadband laser-produced plasma sources and multilayer-coated reflecting optics

Investigation of distortion and damage of molybdenum–silicon multilayer reflective coatings with high-intensity ultraviolet radiation

Effect of laser pulse duration on short wavelength emission from femtosecond and picosecond laser-produced Ta plasmas

Tenth micron lithography with a 10 Hz 37.2 nm sodium laser

Introduction to special issue of Applied Optics on soft-x-ray projection lithography

Intense EUV incoherent plasma sources for EUV lithography and other applications : Extreme Ultraviolet Lithography

Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

Soft-x-ray projection imaging with a 1:1 ring-field optic

High-gain soft-x-ray-pumped photoionization laser in zinc vapor

Simple efficient traveling-wave excitation of short-wavelength lasers using a conical pumping geometry

Use of trilevel resists for high-resolution soft-x-ray projection lithography

Recombination laser transitions in expanding plasmas of Mg, Ca, Cu, Zn, Ag, Cd, In, Sn, Pb, and Bi

Population inversions in C iv in a recombing theta-pinch plasma

EFFICIENT CW LASER OSCILLATION AT 4416 Å IN Cd (II)

High -gain inner-shell photoionization laser in Cd vapor pumped by soft-x-ray radiation from a laser-produced plasma source

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