UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Wavelet ridge techniques in optical fringe pattern analysis

Journal of the Optical Society of America. A, Optics, image science, and vision, 2010-06, Vol.27 (6), p.1245

2010

Volltextzugriff (PDF)

Universal calculation formula and calibration method in Fourier transform profilometry

Applied Optics, 2010-12, Vol.49 (34), p.6563

2010

Volltextzugriff (PDF)

Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network

Applied sciences, 2022-02, Vol.12 (4), p.2192

2022

Volltextzugriff (PDF)

A novel in situ compression method for CFD data based on generative adversarial network

Journal of visualization, 2019-02, Vol.22 (1), p.95-108

2019

Volltextzugriff (PDF)

Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

Guangxué xuébào, 2019-12, Vol.39 (12), p.1222002

2019

Volltextzugriff (PDF)

Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decomposition

Journal of the Optical Society of America. A, Optics, image science, and vision, 2009-05, Vol.26 (5), p.1195

2009

Volltextzugriff (PDF)

Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

Guangxué xuébào, 2020-05, Vol.40 (10), p.1005001

2020

Volltextzugriff (PDF)

Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

Guangxué xuébào, 2020-02, Vol.40 (4), p.422002

2020

Volltextzugriff (PDF)

A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition

Guangxué xuébào, 2018-01, Vol.38 (1), p.105001

2018

Volltextzugriff (PDF)

Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Guangxué xuébào, 2020-11, Vol.40 (21), p.2122001

2020

Volltextzugriff (PDF)

Source mask optimization using the covariance matrix adaptation evolution strategy

Optics express, 2020-10, Vol.28 (22), p.33371-33389

2020

Volltextzugriff (PDF)

Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Guangxué xuébào, 2017-10, Vol.37 (10), p.1022001

2017

Volltextzugriff (PDF)

Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools

Applied optics (2004), 2023-06, Vol.62 (18), p.4759

2023

Volltextzugriff (PDF)

Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images

Guangxué xuébào, 2019-07, Vol.39 (7), p.712006

2019

Volltextzugriff (PDF)

Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter

Guangxué xuébào, 2019-09, Vol.39 (9), p.911002

2019

Volltextzugriff (PDF)

Fast Simulation Method of Extreme-Ultraviolet Lithography 3D Mask Based on Variable Separation Degration Method

Guangxué xuébào, 2017-05, Vol.37 (5), p.505001

2017

Volltextzugriff (PDF)

Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling

Optics express, 2021-05, Vol.29 (11), p.17440-17463

2021

Volltextzugriff (PDF)

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm

Optics express, 2021-02, Vol.29 (4), p.5448-5465

2021

Volltextzugriff (PDF)

Social Network Analysis Layout Algorithm under Ontology Model

Journal of software, 2011-07, Vol.6 (7), p.1321-1321

2011

Volltextzugriff (PDF)

Random phase plate designed by the genetic algorithm for decoherence in energy homogenization units of a photolithography illumination system

Applied optics (2004), 2024-08, Vol.63 (23), p.6138

2024

Volltextzugriff (PDF)

Wavelet Ridge Extraction Method Employing a Cost Function in Two-Dimensional Wavelet Transform Profilometry

Guangxué xuébào, 2016-04, Vol.36 (4), p.412006

2016

Volltextzugriff (PDF)

Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm

Guangxué xuébào, 2016-08, Vol.36 (8), p.811001

2016

Volltextzugriff (PDF)

Source Mask Optimization Based on Dynamic Fitness Function

Guangxué xuébào, 2016-01, Vol.36 (1), p.111006

2016

Volltextzugriff (PDF)

Equivalence checking between SLM and TLM using coverage directed simulation

Frontiers of Computer Science, 2015-12, Vol.9 (6), p.934-943

2015

Volltextzugriff (PDF)

Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry

Applied optics (2004), 2017-10, Vol.56 (28), p.8014

2017

Volltextzugriff (PDF)

1 – 25 von 346

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(173)
Mit Volltextzugriff
(224)

Publikationsform

Sprache

Erscheinungsjahr

n.n

Neu hinzugefügt

... seit 30 Tagen
(1)
... seit 90 Tagen
(4)

Menü

Weitere Dienste

Einstellungen

Wavelet ridge techniques in optical fringe pattern analysis

Universal calculation formula and calibration method in Fourier transform profilometry

Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network

A novel in situ compression method for CFD data based on generative adversarial network

Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decomposition

Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition

Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization

Source mask optimization using the covariance matrix adaptation evolution strategy

Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools

Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images

Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter

Fast Simulation Method of Extreme-Ultraviolet Lithography 3D Mask Based on Variable Separation Degration Method

Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm

Social Network Analysis Layout Algorithm under Ontology Model

Random phase plate designed by the genetic algorithm for decoherence in energy homogenization units of a photolithography illumination system

Wavelet Ridge Extraction Method Employing a Cost Function in Two-Dimensional Wavelet Transform Profilometry

Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm

Source Mask Optimization Based on Dynamic Fitness Function

Equivalence checking between SLM and TLM using coverage directed simulation

Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry

Suchergebnisse filtern