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Measurement of bandgap energies in low-k organosilicates

Journal of applied physics, 2014-03, Vol.115 (9)

2014

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Defect-induced bandgap narrowing in low-k dielectrics

Applied physics letters, 2015-08, Vol.107 (8)

2015

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Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass

Journal of applied physics, 2014-07, Vol.116 (4)

2014

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Charging response of back-end-of-the-line barrier dielectrics to VUV radiation

Thin solid films, 2012-06, Vol.520 (16), p.5300-5303

2012

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Effect of the dielectric–substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics

Thin solid films, 2011-06, Vol.519 (16), p.5464-5466

2011

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Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics

Applied physics letters, 2014-11, Vol.105 (20)

2014

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Effects of vacuum-ultraviolet irradiation on copper penetration into low-k dielectrics under bias-temperature stress

Applied physics letters, 2015-01, Vol.106 (1)

2015

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Transmission of oxygen radicals through free-standing single-layer and multilayer silicon-nitride and silicon-dioxide films

Journal of applied physics, 2017-08, Vol.122 (8)

2017

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Plasma damage effects on low- k porous organosilicate glass

Journal of applied physics, 2010-11, Vol.108 (9), p.094110-094110-6

2010

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Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation

Applied physics letters, 2014-02, Vol.104 (6)

2014

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Time-dependent dielectric breakdown of plasma-exposed porous organosilicate glass

Applied physics letters, 2012-03, Vol.100 (11), p.112905-112905-4

2012

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Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films

Applied physics letters, 2016-05, Vol.108 (20)

2016

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Nonthermal combined ultraviolet and vacuum-ultraviolet curing process for organosilicate dielectrics

Applied physics letters, 2016-06, Vol.108 (24)

2016

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The effect of vacuum ultraviolet irradiation on the time-dependent dielectric breakdown of organosilicate dielectrics

Applied physics letters, 2016-09, Vol.109 (12)

2016

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Measurements of Schottky barrier at the low-k SiOC:H/Cu interface using vacuum ultraviolet photoemission spectroscopy

Applied physics letters, 2015-12, Vol.107 (23)

2015

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Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher

Applied physics letters, 1999-05, Vol.74 (18), p.2599-2601

1999

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Effects of neutron irradiation of ultra-thin HfO2 films

Applied physics letters, 2014-01, Vol.104 (3)

2014

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Influence of porosity on electrical properties of low-k dielectrics irradiated with vacuum-ultraviolet radiation

Applied physics letters, 2016-09, Vol.109 (12)

2016

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Reduced adhesion of human blood platelets to polyethylene tubing by microplasma surface modification

Journal of applied physics, 2004-10, Vol.96 (8), p.4539-4546

2004

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Publisher's Note: “Defect-induced bandgap narrowing in low-k dielectrics” [Appl. Phys. Lett. 107 , 082903 (2015)]

Applied physics letters, 2015-09, Vol.107 (13)

2015

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Monte Carlo simulation of the effects of vacuum-ultraviolet radiation on dielectric materials

Applied physics letters, 2005-03, Vol.86 (10)

2005

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Effects of ultraviolet (UV) irradiation in air and under vacuum on low-k dielectrics

AIP advances, 2016-07, Vol.6 (7)

2016

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In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation

Journal of applied physics, 2000-08, Vol.88 (4), p.1742-1746

2000

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Direct measurement of topography-dependent charging of patterned oxide/semiconductor structures

Applied physics letters, 2007-10, Vol.91 (18)

2007

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Synchrotron radiation-induced surface-conductivity of SiO2 for modification of plasma charging

Applied physics letters, 2000-04, Vol.76 (16), p.2191-2193

2000

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Measurement of bandgap energies in low-k organosilicates

Defect-induced bandgap narrowing in low-k dielectrics

Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass

Charging response of back-end-of-the-line barrier dielectrics to VUV radiation

Effect of the dielectric–substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics

Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics

Effects of vacuum-ultraviolet irradiation on copper penetration into low-k dielectrics under bias-temperature stress

Transmission of oxygen radicals through free-standing single-layer and multilayer silicon-nitride and silicon-dioxide films

Plasma damage effects on low- k porous organosilicate glass

Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation

Time-dependent dielectric breakdown of plasma-exposed porous organosilicate glass

Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films

Nonthermal combined ultraviolet and vacuum-ultraviolet curing process for organosilicate dielectrics

The effect of vacuum ultraviolet irradiation on the time-dependent dielectric breakdown of organosilicate dielectrics

Measurements of Schottky barrier at the low-k SiOC:H/Cu interface using vacuum ultraviolet photoemission spectroscopy

Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher

Effects of neutron irradiation of ultra-thin HfO2 films

Influence of porosity on electrical properties of low-k dielectrics irradiated with vacuum-ultraviolet radiation

Reduced adhesion of human blood platelets to polyethylene tubing by microplasma surface modification

Publisher's Note: “Defect-induced bandgap narrowing in low-k dielectrics” [Appl. Phys. Lett. 107 , 082903 (2015)]

Monte Carlo simulation of the effects of vacuum-ultraviolet radiation on dielectric materials

Effects of ultraviolet (UV) irradiation in air and under vacuum on low-k dielectrics

In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation

Direct measurement of topography-dependent charging of patterned oxide/semiconductor structures

Synchrotron radiation-induced surface-conductivity of SiO2 for modification of plasma charging

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