UB Paderborn / Katalog / Suche / in CDI

High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn–Ta metal-sintered target

Thin solid films, 2012-03, Vol.520 (10), p.3746-3750

2012

Link zum Volltext

Verfügbarkeit prüfen

Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices

Thin solid films, 2013-04, Vol.532, p.1-6

2013

Link zum Volltext

Verfügbarkeit prüfen

Electrical and optical properties of amorphous indium zinc oxide films

Thin solid films, 2006-02, Vol.496 (1), p.99-103

2006

Link zum Volltext

Verfügbarkeit prüfen

Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor

Thin solid films, 2012-03, Vol.520 (10), p.3839-3842

2012

Link zum Volltext

Verfügbarkeit prüfen

Effects of internal stress on photocatalytic properties of TiO2 films

Thin solid films, 2008-05, Vol.516 (14), p.4603-4608

2008

Link zum Volltext

Verfügbarkeit prüfen

Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

Thin solid films, 2003-12, Vol.445 (2), p.219-223

2003

Link zum Volltext

Verfügbarkeit prüfen

Work function tuning of tin-doped indium oxide electrodes with solution-processed lithium fluoride

Thin solid films, 2014-05, Vol.559, p.58-63

2014

Link zum Volltext

Verfügbarkeit prüfen

Study on In2O3-SnO2 transparent and conductive films prepared by d.c. sputtering using high density ceramic targets

Thin solid films, 2003-12, Vol.445 (2), p.229-234

2003

Link zum Volltext

Verfügbarkeit prüfen

Electrical and optical properties of gallium-doped zinc oxide films deposited by dc magnetron sputtering

Thin solid films, 2002-05, Vol.411 (1), p.82-86

2002

Link zum Volltext

Verfügbarkeit prüfen

Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias

Thin solid films, 2006-02, Vol.496 (1), p.121-125

2006

Link zum Volltext

Verfügbarkeit prüfen

Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems

Thin solid films, 2006-02, Vol.496 (1), p.126-130

2006

Link zum Volltext

Verfügbarkeit prüfen

Effect of electrical properties on thermal diffusivity of amorphous indium zinc oxide films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2007-07, Vol.25 (4), p.1178-1183

2007

Link zum Volltext

Verfügbarkeit prüfen

Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films

Thin solid films, 2003-12, Vol.445 (2), p.207-212

2003

Link zum Volltext

Verfügbarkeit prüfen

Early stages of ITO deposition on glass or polymer substrates

Vacuum, 2000-11, Vol.59 (2), p.614-621

2000

Link zum Volltext

Verfügbarkeit prüfen

Microstructures of ITO films deposited by d.c. magnetron sputtering with H2O introduction

Thin solid films, 2003-12, Vol.445 (2), p.235-240

2003

Link zum Volltext

Verfügbarkeit prüfen

Ti–Al–Si–N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2007-07, Vol.25 (4), p.1103-1107

2007

Link zum Volltext

Verfügbarkeit prüfen

Visible photoluminescence from nanocrystalline Ge formed by H2 reduction of Si0.6Ge0.4O2

Applied physics letters, 1993-05, Vol.62 (22), p.2842-2844

1993

Link zum Volltext

Verfügbarkeit prüfen

Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering

Thin solid films, 2003-10, Vol.442 (1-2), p.227-231

2003

Link zum Volltext

Verfügbarkeit prüfen

Electrical properties of heteroepitaxial grown tin-doped indium oxide films

Journal of applied physics, 1996-07, Vol.80 (2), p.978-984

1996

Link zum Volltext

Verfügbarkeit prüfen

Study of the effect of ion implantation on the electrical and microstructural properties of tin-doped indium oxide thin films

Journal of applied physics, 1993-04, Vol.73 (8), p.3805-3811

1993

Link zum Volltext

Verfügbarkeit prüfen

High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems

Science and technology of advanced materials, 2006-01, Vol.7 (1), p.56-61

2006

Link zum Volltext

Verfügbarkeit prüfen

The International Symposium on Transparent Oxides and Related Materials for Elextronics and Optics

Thin solid films, 2014, Vol.559, p.1

2014

Link zum Volltext

Verfügbarkeit prüfen

Analysis on thermal properties of tin doped indium oxide films by picosecond thermoreflectance measurement

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2005-07, Vol.23 (4), p.1180-1186

2005

Link zum Volltext

Verfügbarkeit prüfen

Crystallinity and stoichiometry of InNx films deposited by reactive dc magnetron sputtering

Vacuum, 2002-08, Vol.66 (3-4), p.373-378

2002

Link zum Volltext

Verfügbarkeit prüfen

The structural characteristics of VOx films prepared by He-introduced reactive RF unbalanced magnetron sputtering

Thin solid films, 1996-08, Vol.281-282, p.436-440

1996

Link zum Volltext

Verfügbarkeit prüfen

Menü

Weitere Dienste

Einstellungen

High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn–Ta metal-sintered target

Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices

Electrical and optical properties of amorphous indium zinc oxide films

Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor

Effects of internal stress on photocatalytic properties of TiO2 films

Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

Work function tuning of tin-doped indium oxide electrodes with solution-processed lithium fluoride

Study on In2O3-SnO2 transparent and conductive films prepared by d.c. sputtering using high density ceramic targets

Electrical and optical properties of gallium-doped zinc oxide films deposited by dc magnetron sputtering

Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias

Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems

Effect of electrical properties on thermal diffusivity of amorphous indium zinc oxide films

Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films

Early stages of ITO deposition on glass or polymer substrates

Microstructures of ITO films deposited by d.c. magnetron sputtering with H2O introduction

Ti–Al–Si–N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets

Visible photoluminescence from nanocrystalline Ge formed by H2 reduction of Si0.6Ge0.4O2

Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering

Electrical properties of heteroepitaxial grown tin-doped indium oxide films

Study of the effect of ion implantation on the electrical and microstructural properties of tin-doped indium oxide thin films

High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems

The International Symposium on Transparent Oxides and Related Materials for Elextronics and Optics

Analysis on thermal properties of tin doped indium oxide films by picosecond thermoreflectance measurement

Crystallinity and stoichiometry of InNx films deposited by reactive dc magnetron sputtering

The structural characteristics of VOx films prepared by He-introduced reactive RF unbalanced magnetron sputtering

Suchergebnisse filtern