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CVD preparation and characterization of tin dioxide films for electrochemical applications

Journal of materials chemistry, 1997, Vol.7 (8), p.1421-1427

1997

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Remote plasma-enhanced chemical vapour deposition of silicon nitride films : the effect of diluting nitrogen with helium

Journal of materials chemistry, 1995, Vol.5 (3), p.457-460

1995

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Reproducible MOCVD of barium fluoride: studies of the effect of the degree of precursor crystallinity and purity

Journal of materials chemistry, 1995, Vol.5 (1), p.47-52

1995

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Bonded hydrogen in silicon nitride films deposited by remote plasma-enhanced chemical vapour deposition

Journal of materials chemistry, 1994, Vol.4 (12), p.1843-1847

1994

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Metal–organic chemical vapour deposition of YBCO using a new, stable and volatile barium precursor

Journal of materials chemistry, 1994, Vol.4 (1), p.81-85

1994

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MOCVD of high quality YBa sub(2)Cu sub(3)O sub(7- delta ) thin films using a fluorinated barium precursor

Physica. C, Superconductivity, 1995-01, Vol.252 (3-4), p.229-236

1995

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Considerations of the production of C60 thin films by PECVD, combustion, or pyrolysis

Advanced materials (Weinheim), 1996, Vol.8 (3), p.57-68

1996

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A study by FTIR and mass spectroscopy of the decomposition of precursors for the MOCVD of high temperature superconductors

Journal of alloys and compounds, 1997-04, Vol.251 (1), p.297-302

1997

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The propagation rate constants of the cationic polymerization of alkenes. III, Indene, two vinyl ethers and general discussion

European polymer journal, 1990, Vol.26 (10), p.1113-1120

1990

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Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. I: Effect on growth rate

Journal of materials chemistry, 1994, Vol.4 (12), p.1821-1826

1994

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Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. II: Effect on crystallinity

Journal of materials chemistry, 1994, Vol.4 (12), p.1827-1834

1994

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Considerations of the production of C 60 thin films by PECVD, combustion, or pyrolysis

Chemical vapor deposition, 1996-03, Vol.2 (2), p.57-68

1996

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Metal-organic chemical vapour deposition of YCBO using a new, stable and volatile barium precursor

Journal of materials chemistry, 1994, Vol.4 (1), p.81-85

1994

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Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. III: Effect on composition

Journal of materials chemistry, 1994, Vol.4 (12), p.1835-1842

1994

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ChemInform Abstract: Metal-Organic Chemical Vapor Deposition of YBCO Using a New, Stable and Volatile Barium Precursor

ChemInform, 1994-05, Vol.25 (21), p.no-no

1994

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Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO2 Thin Films Prepared by CVD and Anodic Oxidation of Ti

Chemical vapor deposition, 2012-06, Vol.18 (4-6), p.112-120

2012

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Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO 2 Thin Films Prepared by CVD and Anodic Oxidation of Ti

Chemical vapor deposition, 2012-06, Vol.18 (4-6), p.112-120

2012

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Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO sub(2) Thin Films Prepared by CVD and Anodic Oxidation of Ti

Chemical vapor deposition, 2012-06, Vol.18 (4-6), p.112-120

2012

Volltextzugriff (PDF)

Considerations of the production of C60 thin films by PECVD, combustion, or pyrolysis

Chemical vapor deposition, 1996-03, Vol.2 (2), p.57-68

1996

Volltextzugriff (PDF)

The propagation rate constants of the cationic polymerization of alkenes—part III. Indene, two vinyl ethers and general discussion

European polymer journal, 1990, Vol.26 (10), p.1113-1120

1990

Volltextzugriff (PDF)

Studies of the effects of NF 3 on the growth of polysilicon films by low-pressure CVD. Part 2.—Effect on crystallinity

Journal of materials chemistry, 1994, Vol.4 (12), p.1827-1834

1994

Volltextzugriff (PDF)

Studies of the effects of NF 3 on the growth of polysilicon films by low-pressure CVD. Part 1.—Effect on growth rate

Journal of materials chemistry, 1994, Vol.4 (12), p.1821-1826

1994

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MOCVD of high quality YBa 2Cu 3O 7−δ thin films using a fluorinated barium precursor

Physica. C, Superconductivity, 1995, Vol.252 (3), p.229-236

1995

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Some Considerations of MOCVD for the Preparation of High Tc Thin Films

MRS proceedings, 1993, Vol.335

1993

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Some Considerations of MOCVD for the Preparation of High T c Thin Films

MRS proceedings, 1993, Vol.335, Article 249

1993

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CVD preparation and characterization of tin dioxide films for electrochemical applications

Remote plasma-enhanced chemical vapour deposition of silicon nitride films : the effect of diluting nitrogen with helium

Reproducible MOCVD of barium fluoride: studies of the effect of the degree of precursor crystallinity and purity

Bonded hydrogen in silicon nitride films deposited by remote plasma-enhanced chemical vapour deposition

Metal–organic chemical vapour deposition of YBCO using a new, stable and volatile barium precursor

MOCVD of high quality YBa sub(2)Cu sub(3)O sub(7- delta ) thin films using a fluorinated barium precursor

Considerations of the production of C60 thin films by PECVD, combustion, or pyrolysis

A study by FTIR and mass spectroscopy of the decomposition of precursors for the MOCVD of high temperature superconductors

The propagation rate constants of the cationic polymerization of alkenes. III, Indene, two vinyl ethers and general discussion

Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. I: Effect on growth rate

Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. II: Effect on crystallinity

Considerations of the production of C 60 thin films by PECVD, combustion, or pyrolysis

Metal-organic chemical vapour deposition of YCBO using a new, stable and volatile barium precursor

Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. III: Effect on composition

ChemInform Abstract: Metal-Organic Chemical Vapor Deposition of YBCO Using a New, Stable and Volatile Barium Precursor

Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO2 Thin Films Prepared by CVD and Anodic Oxidation of Ti

Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO 2 Thin Films Prepared by CVD and Anodic Oxidation of Ti

Photocatalytic and Photoelectrocatalytic Degradation of the Explosive RDX by TiO sub(2) Thin Films Prepared by CVD and Anodic Oxidation of Ti

Considerations of the production of C60 thin films by PECVD, combustion, or pyrolysis

The propagation rate constants of the cationic polymerization of alkenes—part III. Indene, two vinyl ethers and general discussion

Studies of the effects of NF 3 on the growth of polysilicon films by low-pressure CVD. Part 2.—Effect on crystallinity

Studies of the effects of NF 3 on the growth of polysilicon films by low-pressure CVD. Part 1.—Effect on growth rate

MOCVD of high quality YBa 2Cu 3O 7−δ thin films using a fluorinated barium precursor

Some Considerations of MOCVD for the Preparation of High Tc Thin Films

Some Considerations of MOCVD for the Preparation of High T c Thin Films

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