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High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition

Advanced functional materials, 2019-02, Vol.29 (7), p.n/a

2019

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Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al2O3/TiO2 Ultrathin (<10 nm) Film Heterostructures

ACS nano, 2018-10, Vol.12 (10), p.10403-10409

2018

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Atomic-layer-deposited ZnSnO buffer layers for kesterite solar cells: Impact of Zn/(Zn+Sn) ratio on device performance

Journal of alloys and compounds, 2022-02, Vol.895, p.162651, Article 162651

2022

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Interface Carriers and Enhanced Electron‐Phonon Coupling Effect in Al2O3/TiO2 Heterostructure Revealed by Resonant Inelastic Soft X‐Ray Scattering

Advanced functional materials, 2021-08, Vol.31 (35), p.n/a

2021

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Gas Sensors: High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition (Adv. Funct. Mater. 7/2019)

Advanced functional materials, 2019-02, Vol.29 (7), p.n/a

2019

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Chemical mechanism of formation of two-dimensional electron gas at the Al2O3/TiO2 interface by atomic layer deposition

Materials today advances, 2021-12, Vol.12, p.100195, Article 100195

2021

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High-quality SiNx thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

Journal of materials chemistry. C, Materials for optical and electronic devices, 2023-06, Vol.11 (27), p.9107-9113

2023

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High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrate

2016-01

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In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al2O3/TiO2 Thin-Film Heterostructure

Chemistry of materials, 2020-09, Vol.32 (18), p.7662-7669

2020

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Highly Uniform Resistive Switching Performances Using Two-Dimensional Electron Gas at a Thin-Film Heterostructure for Conductive Bridge Random Access Memory

ACS applied materials & interfaces, 2019-08, Vol.11 (33), p.30028-30036

2019

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Dependence of electrical properties on sulfur distribution in atomic-layer-deposited HfO2 thin film on an InP substrate

Applied surface science, 2019-10, Vol.491, p.83-87

2019

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Interface Carriers and Enhanced Electron‐Phonon Coupling Effect in Al 2 O 3 /TiO 2 Heterostructure Revealed by Resonant Inelastic Soft X‐Ray Scattering

Advanced functional materials, 2021-08, Vol.31 (35)

2021

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Interface Carriers and Enhanced Electron-Phonon Coupling Effect in Al2O3/TiO2 Heterostructure Revealed by Resonant Inelastic Soft X-Ray Scattering

Advanced functional materials, 2021-06, Vol.31 (35)

2021

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Black Si Photocathode with a Conformal and Amorphous MoSx Catalytic Layer Grown Using Atomic Layer Deposition for Photoelectrochemical Hydrogen Evolution

ACS applied materials & interfaces, 2022-03, Vol.14 (12), p.14137-14145

2022

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Black Si Photocathode with a Conformal and Amorphous MoS x Catalytic Layer Grown Using Atomic Layer Deposition for Photoelectrochemical Hydrogen Evolution

ACS applied materials & interfaces, 2022-03, Vol.14 (12), p.14137-14145

2022

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In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al 2 O 3 /TiO 2 Thin-Film Heterostructure

Chemistry of materials, 2020-09, Vol.32 (18), p.7662-7669

2020

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Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Applied surface science, 2016-03, Vol.365, p.376-379

2016

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Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al 2 O 3 /TiO 2 Ultrathin (<10 nm) Film Heterostructures

ACS nano, 2018-10, Vol.12 (10), p.10403-10409

2018

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High-quality SiN thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

Journal of materials chemistry. C, Materials for optical and electronic devices, 2023-07, Vol.11 (27), p.917-9113

2023

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High-quality SiN x thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

Journal of materials chemistry. C, Materials for optical and electronic devices, 2023-07, Vol.11 (27), p.9107-9113

2023

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Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing

Applied surface science, 2015-12, Vol.357, p.2306-2312

2015

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Nature of chemical states of sulfur embedded in atomic-layer-deposited HfO sub(2) film on Ge substrate for interface passivation

Physica status solidi. PSS-RRL. Rapid research letters, 2015-09, Vol.9 (9), p.511-515

2015

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Nature of chemical states of sulfur embedded in atomic-layer-deposited HfO 2 film on Ge substrate for interface passivation

Physica status solidi. PSS-RRL. Rapid research letters, 2015-09, Vol.9 (9), p.511-515

2015

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Nature of chemical states of sulfur embedded in atomic-layer-deposited HfO2 film on Ge substrate for interface passivation

Physica status solidi. PSS-RRL. Rapid research letters, 2015-09, Vol.9 (9), p.511-515

2015

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YouTube as a source of patient information on gallstone disease

World journal of gastroenterology : WJG, 2014-04, Vol.20 (14), p.4066-4070

2014

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High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition

Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al2O3/TiO2 Ultrathin (<10 nm) Film Heterostructures

Atomic-layer-deposited ZnSnO buffer layers for kesterite solar cells: Impact of Zn/(Zn+Sn) ratio on device performance

Interface Carriers and Enhanced Electron‐Phonon Coupling Effect in Al2O3/TiO2 Heterostructure Revealed by Resonant Inelastic Soft X‐Ray Scattering

Gas Sensors: High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition (Adv. Funct. Mater. 7/2019)

Chemical mechanism of formation of two-dimensional electron gas at the Al2O3/TiO2 interface by atomic layer deposition

High-quality SiNx thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrate

In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al2O3/TiO2 Thin-Film Heterostructure

Highly Uniform Resistive Switching Performances Using Two-Dimensional Electron Gas at a Thin-Film Heterostructure for Conductive Bridge Random Access Memory

Dependence of electrical properties on sulfur distribution in atomic-layer-deposited HfO2 thin film on an InP substrate

Interface Carriers and Enhanced Electron‐Phonon Coupling Effect in Al 2 O 3 /TiO 2 Heterostructure Revealed by Resonant Inelastic Soft X‐Ray Scattering

Interface Carriers and Enhanced Electron-Phonon Coupling Effect in Al2O3/TiO2 Heterostructure Revealed by Resonant Inelastic Soft X-Ray Scattering

Black Si Photocathode with a Conformal and Amorphous MoSx Catalytic Layer Grown Using Atomic Layer Deposition for Photoelectrochemical Hydrogen Evolution

Black Si Photocathode with a Conformal and Amorphous MoS x Catalytic Layer Grown Using Atomic Layer Deposition for Photoelectrochemical Hydrogen Evolution

In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al 2 O 3 /TiO 2 Thin-Film Heterostructure

Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation

Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al 2 O 3 /TiO 2 Ultrathin (<10 nm) Film Heterostructures

High-quality SiN thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

High-quality SiN x thin-film growth at 300 °C using atomic layer deposition with hollow-cathode plasma

Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing

Nature of chemical states of sulfur embedded in atomic-layer-deposited HfO sub(2) film on Ge substrate for interface passivation

Nature of chemical states of sulfur embedded in atomic-layer-deposited HfO 2 film on Ge substrate for interface passivation

Nature of chemical states of sulfur embedded in atomic-layer-deposited HfO2 film on Ge substrate for interface passivation

YouTube as a source of patient information on gallstone disease

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