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Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor

Applied surface science, 2019-08, Vol.485, p.381-390

2019

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Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020-05, Vol.38 (3)

2020

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HfO 2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

Chemistry of materials, 2024-05, Vol.36 (9), p.4303-4314

2024

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HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

Chemistry of materials, 2024-05, Vol.36 (9), p.4303-4314

2024

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Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-09, Vol.42 (5)

2024

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Molecular oxidation of surface –CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study

Applied surface science, 2018-11, Vol.457, p.376-380

2018

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Ionic Liquid-Mediated Route to Atomic Layer Deposition of Tin(II) Oxide via a C–C Bond Cleavage Ligand Modification Mechanism

Journal of the American Chemical Society, 2022-11, Vol.144 (47), p.21772-21782

2022

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Amorphous Ge-Se-S chalcogenide alloys via post plasma sulfurization of atomic layer deposition GeSe for ovonic threshold switch applications

Journal of alloys and compounds, 2023-06, Vol.947, p.169514, Article 169514

2023

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Effects of O2 plasma treatment on moisture barrier properties of SiO2 grown by plasma-enhanced atomic layer deposition

Ceramics international, 2019-10, Vol.45 (14), p.17662-17668

2019

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Optical Reflection from Unforbidden Diffraction of Block Copolymer Templated Gyroid Films

ACS macro letters, 2021-12, Vol.10 (12), p.1609-1615

2021

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Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

Applied surface science, 2023-07, Vol.624, p.157104, Article 157104

2023

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Bending stability of flexible amorphous IGZO thin film transistors with transparent IZO/Ag/IZO oxide–metal–oxide electrodes

Journal of alloys and compounds, 2016-12, Vol.688, p.1108-1114

2016

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Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

The Journal of chemical physics, 2024-01, Vol.160 (2)

2024

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Reducing contact resistance of MoS2-based field effect transistors through uniform interlayer insertion via atomic layer deposition

The Journal of chemical physics, 2024-03, Vol.160 (10)

2024

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Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-12, Vol.41 (6)

2023

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Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns

ACS applied materials & interfaces, 2017-11, Vol.9 (47), p.41607-41617

2017

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Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors

ACS applied materials & interfaces, 2021-05, Vol.13 (17), p.20349-20360

2021

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Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al 2 O 3 with a Series of Alcohol Oxidants

Journal of physical chemistry. C, 2021-08, Vol.125 (33), p.18151-18160

2021

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Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition

ACS nano, 2020-02, Vol.14 (2), p.1757-1769

2020

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Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors

Applied surface science, 2021-12, Vol.568, p.150939, Article 150939

2021

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Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation

ACS nano, 2020-01, Vol.14 (1), p.676-687

2020

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MoS2 doping by atomic layer deposition of high-k dielectrics using alcohol as process oxidants

Applied surface science, 2021-03, Vol.541, p.148504, Article 148504

2021

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Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants

Ceramics international, 2019-10, Vol.45 (15), p.19105-19112

2019

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Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al 2 O 3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors

ACS applied materials & interfaces, 2021-05, Vol.13 (17), p.20349-20360

2021

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Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films

Surface & coatings technology, 2018-06, Vol.344, p.12-20

2018

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Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor

Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides

HfO 2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2

Molecular oxidation of surface –CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study

Ionic Liquid-Mediated Route to Atomic Layer Deposition of Tin(II) Oxide via a C–C Bond Cleavage Ligand Modification Mechanism

Amorphous Ge-Se-S chalcogenide alloys via post plasma sulfurization of atomic layer deposition GeSe for ovonic threshold switch applications

Effects of O2 plasma treatment on moisture barrier properties of SiO2 grown by plasma-enhanced atomic layer deposition

Optical Reflection from Unforbidden Diffraction of Block Copolymer Templated Gyroid Films

Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

Bending stability of flexible amorphous IGZO thin film transistors with transparent IZO/Ag/IZO oxide–metal–oxide electrodes

Role of a cyclopentadienyl ligand in a heteroleptic alkoxide precursor in atomic layer deposition

Reducing contact resistance of MoS2-based field effect transistors through uniform interlayer insertion via atomic layer deposition

Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides

Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns

Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors

Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al 2 O 3 with a Series of Alcohol Oxidants

Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition

Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors

Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation

MoS2 doping by atomic layer deposition of high-k dielectrics using alcohol as process oxidants

Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants

Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al 2 O 3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors

Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films

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