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Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Microelectronic engineering, 2016-06, Vol.159, p.21-26

2016

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Precise Synthesis of Fluorine-containing Block Copolymers via RAFT

Journal of Photopolymer Science and Technology, 2016/06/21, Vol.29(5), pp.705-708

2016

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Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers

Journal of Photopolymer Science and Technology, 2016/06/21, Vol.29(5), pp.647-652

2016

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Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Journal of Photopolymer Science and Technology, 2015/06/10, Vol.28(5), pp.649-652

2015

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A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Microelectronic engineering, , Vol.134, p.27-32

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Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

MRS proceedings, 2015, Vol.1750 (1), p.24-35, Article mrsf14-1750-kk06-04

2015

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A simulation study for defects in sub-15 nm line-space using directed self-assembly

MRS proceedings, 2015, Vol.1750 (1), p.36-41, Article mrsf14-1750-kk05-18

2015

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A Simulation Study on Defectivity in Directed Self-assembly Lithography

Journal of Photopolymer Science and Technology, 2015/06/10, Vol.28(5), pp.683-688

2015

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The Photopolymer Science and Technology Award

Journal of Photopolymer Science and Technology, 2016/06/21, Vol.29(1), pp.11-15

2016

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Electrical Via Chain Yield for DSA Contact Hole Shrink Process

Journal of Photopolymer Science and Technology, 2013/06/25, Vol.26(1), pp.21-26

2013

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Sub-30nm via interconnects fabricated using directed self-assembly

Microelectronic engineering, 2013-10, Vol.110, p.152-155

2013

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Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process

Electronics and communications in Japan, 2015-04, Vol.98 (4), p.59-64

2015

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A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Journal of Photopolymer Science and Technology, 2015/05/25, Vol.28(5), pp.617-622

2015

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Resist Residue in Ion Implantation Level Lithography

Japanese Journal of Applied Physics, 2010-06, Vol.49 (6), p.06GD05-06GD05-5

2010

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Blockcopolymer Self-Assembly Directed by Photochemically Attached Polymer Surface Layer

Journal of Photopolymer Science and Technology, 2011/06/21, Vol.24(5), pp.581-585

2011

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The Photopolymer Science and Technology Award

Journal of Photopolymer Science and Technology, 2014/07/08, Vol.27(1), pp.7-10

2014

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Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High‑χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

ACS applied materials & interfaces, 2017-09, Vol.9 (37), p.31266-31278

2017

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Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

Journal of Photopolymer Science and Technology, 2012/06/26, Vol.25(1), pp.73-76

2012

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Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films

Advanced materials interfaces, 2019-06, Vol.6 (11), p.n/a

2019

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Self‐Assembly: Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films (Adv. Mater. Interfaces 11/2019)

Advanced materials interfaces, 2019-06, Vol.6 (11), p.n/a

2019

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Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene- block -poly(methyl methacrylate)

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-11, Vol.33 (6)

2015

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Sub-30 nm via interconnects fabricated using directed self-assembly

Microelectronic engineering, 2013-10, Vol.110, p.152-155

2013

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Methemoglobin Formation in Hemoglobin Vesicles and Reduction by Encapsulated Thiols

Bioconjugate chemistry, 1997-07, Vol.8 (4), p.539-544

1997

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Simulation study on defect annihilation dynamics in directed self-assembly lithography

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-11, Vol.33 (6)

2015

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Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process

IEEJ Transactions on Fundamentals and Materials, 2013/10/01, Vol.133(10), pp.532-536

2013

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Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Precise Synthesis of Fluorine-containing Block Copolymers via RAFT

Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

A simulation study for defects in sub-15 nm line-space using directed self-assembly

A Simulation Study on Defectivity in Directed Self-assembly Lithography

The Photopolymer Science and Technology Award

Electrical Via Chain Yield for DSA Contact Hole Shrink Process

Sub-30nm via interconnects fabricated using directed self-assembly

Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process

A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Resist Residue in Ion Implantation Level Lithography

Blockcopolymer Self-Assembly Directed by Photochemically Attached Polymer Surface Layer

The Photopolymer Science and Technology Award

Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High‑χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films

Self‐Assembly: Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films (Adv. Mater. Interfaces 11/2019)

Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene- block -poly(methyl methacrylate)

Sub-30 nm via interconnects fabricated using directed self-assembly

Methemoglobin Formation in Hemoglobin Vesicles and Reduction by Encapsulated Thiols

Simulation study on defect annihilation dynamics in directed self-assembly lithography

Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process

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