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Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study

Analytical chemistry (Washington), 2012-09, Vol.84 (18), p.7865-7873

2012

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Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources

Analytical chemistry (Washington), 2016-04, Vol.88 (7), p.3592-3597

2016

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Quantitative characterization of defect size in graphene using Raman spectroscopy

Applied physics letters, 2014-12, Vol.105 (25)

2014

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Universal Equation for Argon Cluster Size-Dependence of Secondary Ion Spectra in SIMS of Organic Materials

Journal of physical chemistry. C, 2014-06, Vol.118 (24), p.12862-12872

2014

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Argon cluster cleaning of Ga+ FIB‐milled sections of organic and hybrid materials

Surface and interface analysis, 2020-06, Vol.52 (6), p.327-334

2020

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The determination of atomic force microscope cantilever spring constants via dimensional methods for nanomechanical analysis

Nanotechnology, 2005-09, Vol.16 (9), p.1666-1680

2005

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Quantification issues in the identification of nanoscale regions of homopolymers using modulus measurement via AFM nanoindentation

Applied surface science, 2005-12, Vol.252 (5), p.1915-1933

2005

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VAMAS Interlaboratory Study for Desorption Electrospray Ionization Mass Spectrometry (DESI MS) Intensity Repeatability and Constancy

Analytical chemistry (Washington), 2014-10, Vol.86 (19), p.9603-9611

2014

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Electron Flood Gun Damage Effects in 3D Secondary Ion Mass Spectrometry Imaging of Organics

Journal of the American Society for Mass Spectrometry, 2014-09, Vol.25 (9), p.1565-1571

2014

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Improved methods and uncertainty analysis in the calibration of the spring constant of an atomic force microscope cantilever using static experimental methods

Measurement science & technology, 2009-12, Vol.20 (12), p.125501-125501 (11)

2009

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Simplified drift characterization in scanning probe microscopes using a simple two-point method

Measurement science & technology, 2009-09, Vol.20 (9), p.095103-095103 (8)

2009

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Identification and separation of protein, contaminant and substrate peaks using gentle-secondary ion mass spectrometry and the g-ogram

Rapid communications in mass spectrometry, 2012-12, Vol.26 (23), p.2815-2821

2012

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Summary of ISO/TC 201 Standard: ISO 18115-1:2013 - Surface chemical analysis - Vocabulary - General terms and terms used in spectroscopy

Surface and interface analysis, 2014-05, Vol.46 (5), p.357-360

Seah, Martin P.

2014

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Argon Cluster Sputtering Reveals Internal Chemical Distribution in Submicron Polymeric Particles

Journal of physical chemistry. C, 2020-10, Vol.124 (43), p.23752-23763

2020

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Imaging G-SIMS: a novel bismuth-manganese source emitter

Rapid communications in mass spectrometry, 2008-08, Vol.22 (16), p.2602-2608

2008

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Summary of ISO/TC 201 standard: ISO 18115-2:2013 - surface chemical analysis - vocabulary - terms used in scanning probe microscopy

Surface and interface analysis, 2014-05, Vol.46 (5), p.361-364

Seah, Martin P.

2014

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OrbiSIMS metrology Part I: Optimisation of the target potential and collision cell pressure

Surface and interface analysis, 2022-04, Vol.54 (4), p.331-340

2022

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Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

Surface and interface analysis, 2019-10, Vol.51 (10), p.1018-1020

2019

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Systematic Temperature Effects in the Argon Cluster Ion Sputter Depth Profiling of Organic Materials Using Secondary Ion Mass Spectrometry

Journal of the American Society for Mass Spectrometry, 2016-08, Vol.27 (8), p.1411-1418

2016

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Surface and interface analysis, 2022-04, Vol.54 (4), p.i-i

2022

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Chemical Imaging of Buried Interfaces in Organic–Inorganic Devices Using Focused Ion Beam-Time-of-Flight-Secondary-Ion Mass Spectrometry

ACS applied materials & interfaces, 2019-01, Vol.11 (4), p.4500-4506

2019

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Sputtering Yields for Gold Using Argon Gas Cluster Ion Beams

Journal of physical chemistry. C, 2012-11, Vol.116 (44), p.23735-23741

2012

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Semiempirical Rules To Determine Drug Sensitivity and Ionization Efficiency in Secondary Ion Mass Spectrometry Using a Model Tissue Sample

Analytical chemistry (Washington), 2016-11, Vol.88 (22), p.11028-11036

2016

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Modelling of surface nanoparticle inclusions for nanomechanical measurements by an AFM or nanoindenter: spatial issues

Nanotechnology, 2012-04, Vol.23 (16), p.165704-1-7

2012

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Depth Resolution, Angle Dependence, and the Sputtering Yield of Irganox 1010 by Coronene Primary Ions

The journal of physical chemistry. B, 2013-10, Vol.117 (39), p.11885-11892

2013

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Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study

Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources

Quantitative characterization of defect size in graphene using Raman spectroscopy

Universal Equation for Argon Cluster Size-Dependence of Secondary Ion Spectra in SIMS of Organic Materials

Argon cluster cleaning of Ga+ FIB‐milled sections of organic and hybrid materials

The determination of atomic force microscope cantilever spring constants via dimensional methods for nanomechanical analysis

Quantification issues in the identification of nanoscale regions of homopolymers using modulus measurement via AFM nanoindentation

VAMAS Interlaboratory Study for Desorption Electrospray Ionization Mass Spectrometry (DESI MS) Intensity Repeatability and Constancy

Electron Flood Gun Damage Effects in 3D Secondary Ion Mass Spectrometry Imaging of Organics

Improved methods and uncertainty analysis in the calibration of the spring constant of an atomic force microscope cantilever using static experimental methods

Simplified drift characterization in scanning probe microscopes using a simple two-point method

Identification and separation of protein, contaminant and substrate peaks using gentle-secondary ion mass spectrometry and the g-ogram

Summary of ISO/TC 201 Standard: ISO 18115-1:2013 - Surface chemical analysis - Vocabulary - General terms and terms used in spectroscopy

Argon Cluster Sputtering Reveals Internal Chemical Distribution in Submicron Polymeric Particles

Imaging G-SIMS: a novel bismuth-manganese source emitter

Summary of ISO/TC 201 standard: ISO 18115-2:2013 - surface chemical analysis - vocabulary - terms used in scanning probe microscopy

OrbiSIMS metrology Part I: Optimisation of the target potential and collision cell pressure

Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

Systematic Temperature Effects in the Argon Cluster Ion Sputter Depth Profiling of Organic Materials Using Secondary Ion Mass Spectrometry

Featured Cover

Chemical Imaging of Buried Interfaces in Organic–Inorganic Devices Using Focused Ion Beam-Time-of-Flight-Secondary-Ion Mass Spectrometry

Sputtering Yields for Gold Using Argon Gas Cluster Ion Beams

Semiempirical Rules To Determine Drug Sensitivity and Ionization Efficiency in Secondary Ion Mass Spectrometry Using a Model Tissue Sample

Modelling of surface nanoparticle inclusions for nanomechanical measurements by an AFM or nanoindenter: spatial issues

Depth Resolution, Angle Dependence, and the Sputtering Yield of Irganox 1010 by Coronene Primary Ions

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