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Universal Equation for Argon Gas Cluster Sputtering Yields

Journal of physical chemistry. C, 2013-06, Vol.117 (24), p.12622-12632

Seah, M. P

2013

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Simple universal curve for the energy-dependent electron attenuation length for all materials

Surface and interface analysis, 2012-10, Vol.44 (10), p.1353-1359

Seah, M. P.

2012

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An accurate and simple universal curve for the energy-dependent electron inelastic mean free path

Surface and interface analysis, 2012-04, Vol.44 (4), p.497-503

Seah, M. P.

2012

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Sputtering yields of compounds using argon ions

Journal of physics. D, Applied physics, 2010-06, Vol.43 (25), p.253001

2010

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Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

Analytical chemistry (Washington), 2010-01, Vol.82 (1), p.98-105

2010

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New Aspects in Quantitative Surface Analysis

Journal of surface analysis, 2022, Vol.28 (3), p.S4-S8

Seah, M. P.

2022

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THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY

Journal of surface analysis, 2022, Vol.28 (3), p.S15

Seah, M. P.

2022

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Work Functions and Electron Spectroscopy

Journal of surface analysis, 2022, Vol.28 (3), p.S56-S57

Seah, M. P.

2022

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Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials

The journal of physical chemistry. B, 2015-02, Vol.119 (7), p.3297-3303

2015

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SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles

Journal of physical chemistry. C, 2016-11, Vol.120 (46), p.26328-26335

2016

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Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001-surface chemical analysis-x-ray photoelectron spectrometers-calibration of energy scales

Surface and interface analysis, 2001-08, Vol.31 (8), p.721-723

Seah, M. P.

2001

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Sputtering Yields for Mixtures of Organic Materials Using Argon Gas Cluster Ions

The journal of physical chemistry. B, 2015-10, Vol.119 (42), p.13433-13439

2015

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Depth resolution at organic interfaces sputtered by argon gas cluster ions: the effect of energy, angle and cluster size

Analyst (London), 2015-10, Vol.14 (19), p.658-6516

2015

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Quantifying SIMS of Organic Mixtures and Depth Profiles—Characterizing Matrix Effects of Fragment Ions

Journal of the American Society for Mass Spectrometry, 2019-02, Vol.30 (2), p.309-320

2019

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Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness

Surface and interface analysis, 2002-08, Vol.33 (8), p.640-652

2002

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Attenuation lengths in organic materials

Surface and interface analysis, 2011-03, Vol.43 (3), p.744-751

2011

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Summary of ISO/TC 201 Standard: ISO 18115-1:2010 - surface chemical analysis - vocabulary - general terms and terms used in spectroscopy

Surface and interface analysis, 2012-05, Vol.44 (5), p.618-620

Seah, M P

2012

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VAMAS interlaboratory study on organic depth profiling

Surface and interface analysis, 2011-09, Vol.43 (9), p.1240-1250

2011

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Analysis of cluster ion sputtering yields: correlation with the thermal spike model and implications for static secondary ion mass spectrometry

Surface and interface analysis, 2007-07, Vol.39 (7), p.634-643

Seah, M. P.

2007

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Mass Spectrometry and Informatics: Distribution of Molecules in the PubChem Database and General Requirements for Mass Accuracy in Surface Analysis

Analytical chemistry (Washington), 2011-05, Vol.83 (9), p.3239-3243

2011

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Cluster Primary Ion Sputtering: Secondary Ion Intensities in Static SIMS of Organic Materials

Journal of physical chemistry. C, 2010-04, Vol.114 (12), p.5351-5359

2010

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Ultrathin SiO2 on Si IV. Intensity measurement in XPS and deduced thickness linearity

Surface and interface analysis, 2003-06, Vol.35 (6), p.515-524

2003

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Developing Repeatable Measurements for Reliable Analysis of Molecules at Surfaces Using Desorption Electrospray Ionization

Analytical chemistry (Washington), 2009-03, Vol.81 (6), p.2286-2293

2009

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TOF-SIMS: Accurate Mass Scale Calibration

Journal of the American Society for Mass Spectrometry, 2006-04, Vol.17 (4), p.514-523

2006

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Quantification and methodology issues in multivariate analysis of ToF-SIMS data for mixed organic systems

Surface and interface analysis, 2008-01, Vol.40 (1), p.1-14

2008

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Universal Equation for Argon Gas Cluster Sputtering Yields

Simple universal curve for the energy-dependent electron attenuation length for all materials

An accurate and simple universal curve for the energy-dependent electron inelastic mean free path

Sputtering yields of compounds using argon ions

Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

New Aspects in Quantitative Surface Analysis

THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY

Work Functions and Electron Spectroscopy

Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials

SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles

Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001-surface chemical analysis-x-ray photoelectron spectrometers-calibration of energy scales

Sputtering Yields for Mixtures of Organic Materials Using Argon Gas Cluster Ions

Depth resolution at organic interfaces sputtered by argon gas cluster ions: the effect of energy, angle and cluster size

Quantifying SIMS of Organic Mixtures and Depth Profiles—Characterizing Matrix Effects of Fragment Ions

Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness

Attenuation lengths in organic materials

Summary of ISO/TC 201 Standard: ISO 18115-1:2010 - surface chemical analysis - vocabulary - general terms and terms used in spectroscopy

VAMAS interlaboratory study on organic depth profiling

Analysis of cluster ion sputtering yields: correlation with the thermal spike model and implications for static secondary ion mass spectrometry

Mass Spectrometry and Informatics: Distribution of Molecules in the PubChem Database and General Requirements for Mass Accuracy in Surface Analysis

Cluster Primary Ion Sputtering: Secondary Ion Intensities in Static SIMS of Organic Materials

Ultrathin SiO2 on Si IV. Intensity measurement in XPS and deduced thickness linearity

Developing Repeatable Measurements for Reliable Analysis of Molecules at Surfaces Using Desorption Electrospray Ionization

TOF-SIMS: Accurate Mass Scale Calibration

Quantification and methodology issues in multivariate analysis of ToF-SIMS data for mixed organic systems

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