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Universal Equation for Argon Gas Cluster Sputtering Yields

Journal of physical chemistry. C, 2013-06, Vol.117 (24), p.12622-12632

Seah, M. P

2013

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Simple universal curve for the energy-dependent electron attenuation length for all materials

Surface and interface analysis, 2012-10, Vol.44 (10), p.1353-1359

Seah, M. P.

2012

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P‐BB‐33 | Effectiveness and Efficiency of Processing Low‐Volume Red Blood Cells (RBC) in Blood Services Group (BSG), Singapore

Transfusion (Philadelphia, Pa.), 2023-10, Vol.63 (S5), p.113A-114A

2023

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Sputtering yields of compounds using argon ions

Journal of physics. D, Applied physics, 2010-06, Vol.43 (25), p.253001

2010

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An accurate and simple universal curve for the energy-dependent electron inelastic mean free path

Surface and interface analysis, 2012-04, Vol.44 (4), p.497-503

Seah, M. P.

2012

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New Aspects in Quantitative Surface Analysis

Journal of surface analysis, 2022, Vol.28 (3), p.S4-S8

Seah, M. P.

2022

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Work Functions and Electron Spectroscopy

Journal of surface analysis, 2022, Vol.28 (3), p.S56-S57

Seah, M. P.

2022

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THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY

Journal of surface analysis, 2022, Vol.28 (3), p.S15

Seah, M. P.

2022

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Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

Analytical chemistry (Washington), 2010-01, Vol.82 (1), p.98-105

2010

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Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials

The journal of physical chemistry. B, 2015-02, Vol.119 (7), p.3297-3303

2015

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Accurate Thickness Measurements in Thin Films with Surface Analysis

Journal of surface analysis, 2022, Vol.28 (3), p.S22-S29

Seah, M. P.

2022

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Recent Advances to Establish XPS as an Accurate Metrology Tool

Journal of surface analysis, 2022, Vol.28 (3), p.S16-S21

Seah, M. P.

2022

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CALIBRATION OF ELECTRON SPECTROMETER ENERGY SCALES FOR AES AND XPS

Journal of surface analysis, 2022, Vol.28 (3), p.S30-S32

Seah, M. P.

2022

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AUGER ELECTRON SPECTROMETRY DATA BANK

Journal of surface analysis, 2022, Vol.28 (3), p.S47-S48

Seah, M. P.

2022

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ON DOCUMENTATION

Journal of surface analysis, 2022, Vol.28 (3), p.S3

Seah, M. P.

2022

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Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001-surface chemical analysis-x-ray photoelectron spectrometers-calibration of energy scales

Surface and interface analysis, 2001-08, Vol.31 (8), p.721-723

Seah, M. P.

2001

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SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles

Journal of physical chemistry. C, 2016-11, Vol.120 (46), p.26328-26335

2016

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Human Mesenchymal Stromal Cells Improve Osteochondral Repair In A Mouse Model

Osteoarthritis and cartilage, 2023-03, Vol.31, p.S224-S224

Seah, M.

2023

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Sputtering Yields for Mixtures of Organic Materials Using Argon Gas Cluster Ions

The journal of physical chemistry. B, 2015-10, Vol.119 (42), p.13433-13439

2015

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Bioactive Glass: Methods for Assessing Angiogenesis and Osteogenesis

Frontiers in cell and developmental biology, 2021-06, Vol.9, p.643781-643781

2021

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Argon cluster size-dependence of sputtering yields of polymers: molecular weights and the universal equation

Surface and interface analysis, 2015-01, Vol.47 (1), p.169-172

Seah, M. P.

2015

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Depth resolution at organic interfaces sputtered by argon gas cluster ions: the effect of energy, angle and cluster size

Analyst (London), 2015-10, Vol.14 (19), p.658-6516

2015

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Factors associated with prolonged length of stay for elective hepatobiliary and neurosurgery patients: a retrospective medical record review

BMC health services research, 2018-01, Vol.18 (1), p.5-5, Article 5

2018

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Measurement of the roughness of nano-scale surfaces, both unannealed and with limited anneal, by atomic force microscopy

Measurement science & technology, 2014-10, Vol.25 (10), p.105001-12

Seah, M P

2014

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Sampling Depths, Depth Shifts, and Depth Resolutions for Bi n + Ion Analysis in Argon Gas Cluster Depth Profiles

The journal of physical chemistry. B, 2016-03, Vol.120 (9), p.2604-2611

2016

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Universal Equation for Argon Gas Cluster Sputtering Yields

Simple universal curve for the energy-dependent electron attenuation length for all materials

P‐BB‐33 | Effectiveness and Efficiency of Processing Low‐Volume Red Blood Cells (RBC) in Blood Services Group (BSG), Singapore

Sputtering yields of compounds using argon ions

An accurate and simple universal curve for the energy-dependent electron inelastic mean free path

New Aspects in Quantitative Surface Analysis

Work Functions and Electron Spectroscopy

THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY

Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials

Accurate Thickness Measurements in Thin Films with Surface Analysis

Recent Advances to Establish XPS as an Accurate Metrology Tool

CALIBRATION OF ELECTRON SPECTROMETER ENERGY SCALES FOR AES AND XPS

AUGER ELECTRON SPECTROMETRY DATA BANK

ON DOCUMENTATION

Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001-surface chemical analysis-x-ray photoelectron spectrometers-calibration of energy scales

SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles

Human Mesenchymal Stromal Cells Improve Osteochondral Repair In A Mouse Model

Sputtering Yields for Mixtures of Organic Materials Using Argon Gas Cluster Ions

Bioactive Glass: Methods for Assessing Angiogenesis and Osteogenesis

Argon cluster size-dependence of sputtering yields of polymers: molecular weights and the universal equation

Depth resolution at organic interfaces sputtered by argon gas cluster ions: the effect of energy, angle and cluster size

Factors associated with prolonged length of stay for elective hepatobiliary and neurosurgery patients: a retrospective medical record review

Measurement of the roughness of nano-scale surfaces, both unannealed and with limited anneal, by atomic force microscopy

Sampling Depths, Depth Shifts, and Depth Resolutions for Bi n + Ion Analysis in Argon Gas Cluster Depth Profiles

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