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Handbook of Thin-Film Deposition Processes and Techniques - Principles, Methods, Equipment and Applications (2nd Edition)

Seshan, Krishna

2nd ed., 2002

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1 - Deposition Technologies and Applications: Introduction and Overview

Handbook of Thin Film Deposition, 2001, p.11-43

2001

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Oxide-isolated integrated injection logic

1974 IEEE International Solid-State Circuits Conference. Digest of Technical Papers, 1974, Vol.XVII, p.16-17

1974

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Semiconductor Logic Technology Innovation to Achieve Sub-10 nm Manufacturing

IEEE journal of the Electron Devices Society, 2013-03, Vol.1 (3), p.66-75

2013

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Hole injection SiO2 breakdown model for very low voltage lifetime extrapolation

IEEE transactions on electron devices, 1994-05, Vol.41 (5), p.761-767

1994

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Metal-oxide-semiconductor field-effect-transistor substrate current during Fowler–Nordheim tunneling stress and silicon dioxide reliability

Journal of applied physics, 1994-09, Vol.76 (6), p.3695-3700

1994

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Single-wafer process technology: enabling rapid SiGe BiCMOS development

IEEE transactions on semiconductor manufacturing, 2003-05, Vol.16 (2), p.121-127

Schuegraf, K.

2003

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Effects of temperature and defects on breakdown lifetime of thin SiO2 at very low voltages

IEEE transactions on electron devices, 1994-07, Vol.41 (7), p.1227-1232

1994

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Is strain engineering scalable in FinFET era?: Teaching the old dog some new tricks

2012 International Electron Devices Meeting, 2012, p.18.3.1-18.3.4

2012

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Design Approach to Radiation-Hardened I2L Gate Arrays

IEEE transactions on nuclear science, 1978-01, Vol.25 (6), p.1494-1501

1978

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Transistor wars

IEEE spectrum, 2011-11, Vol.48 (11), p.50-66

2011

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Handbook of Thin-Film Deposition Processes and Techniques - Principles, Methods, Equipment and Applications (2nd Edition)

1 - Deposition Technologies and Applications: Introduction and Overview

Oxide-isolated integrated injection logic

Semiconductor Logic Technology Innovation to Achieve Sub-10 nm Manufacturing

Hole injection SiO2 breakdown model for very low voltage lifetime extrapolation

Metal-oxide-semiconductor field-effect-transistor substrate current during Fowler–Nordheim tunneling stress and silicon dioxide reliability

Single-wafer process technology: enabling rapid SiGe BiCMOS development

Effects of temperature and defects on breakdown lifetime of thin SiO2 at very low voltages

Is strain engineering scalable in FinFET era?: Teaching the old dog some new tricks

Design Approach to Radiation-Hardened I2L Gate Arrays

Transistor wars

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