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High-precision finishing method for narrow-groove channel-cut crystal x-ray monochromator using plasma chemical vaporization machining with wire electrode

Review of scientific instruments, 2024-01, Vol.95 (1)

2024

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Breaking the 10 nm barrier in hard-X-ray focusing

Nature physics, 2010-02, Vol.6 (2), p.122-125

2010

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Simulation of concave–convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope

Applied Optics, 2017-02, Vol.56 (4), p.967

2017

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Role of Photoelectrochemical Oxidation in Enabling High-Efficiency Polishing of Gallium Nitride

ECS journal of solid state science and technology, 2023-06, Vol.12 (6), p.63005

2023

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Catalyzed chemical polishing of SiO2 glasses in pure water

Review of scientific instruments, 2019-04, Vol.90 (4)

2019

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High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser

Optics express, 2020-08, Vol.28 (18), p.25706-25715

2020

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Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors

Optics express, 2019-02, Vol.27 (3), p.3429-3438

2019

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High-throughput deterministic plasma etching using array-type plasma generator system

Review of scientific instruments, 2021-12, Vol.92 (12)

2021

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High-Efficiency Polishing of Polymer Surface Using Catalyst-Referred Etching

International journal of automation technology, 2024-03, Vol.18 (2), p.240-247

2024

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An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating

Review of scientific instruments, 2020-04, Vol.91 (4)

2020

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Catalyst enhancement approach for improving the removal rate and stability of silica glass polishing via catalyzed chemical etching in pure water

Precision engineering, 2023-11, Vol.84, p.21-27

2023

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Photoelectrochemical Oxidation Assisted Catalyst-Referred Etching for SiC (0001) Surface

International journal of automation technology, 2021-01, Vol.15 (1), p.74-79

2021

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X-ray adaptive zoom condenser utilizing an intermediate virtual focus

Optics express, 2021-05, Vol.29 (10), p.15604-15615

2021

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High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics

Applied physics express, 2024-01, Vol.17 (1), p.16001

2024

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Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

Journal of physics. Condensed matter, 2011-10, Vol.23 (39), p.394206-np

2011

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X‐ray optics for advanced ultrafast pump–probe X‐ray experiments at SACLA

Journal of synchrotron radiation, 2019-03, Vol.26 (2), p.333-338

2019

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Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

Review of scientific instruments, 2015-09, Vol.86 (9)

2015

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A Bragg beam splitter for hard x-ray free-electron lasers

Optics express, 2013-02, Vol.21 (3), p.2823

2013

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Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system

Review of scientific instruments, 2021-12, Vol.92 (12)

2021

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Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

Review of scientific instruments, 2016-06, Vol.87 (6)

2016

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Erratum: “Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system” [Rev. Sci. Instrum. 92, 123706 (2021)]

Review of scientific instruments, 2022-04, Vol.93 (4)

2022

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Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

Journal of applied physics, 2019-08, Vol.126 (6)

2019

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A micro channel‐cut crystal X‐ray monochromator for a self‐seeded hard X‐ray free‐electron laser

Journal of synchrotron radiation, 2019-09, Vol.26 (5), p.1496-1502

2019

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(Invited) High-Speed Plasma Etching of SiC Wafer Toward Backside Thinning

ECS transactions, 2021-10, Vol.104 (7), p.85-92

Sano, Yasuhisa

2021

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The Polishing Effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)

ECS journal of solid state science and technology, 2017-01, Vol.6 (4), p.P105-P112

2017

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High-precision finishing method for narrow-groove channel-cut crystal x-ray monochromator using plasma chemical vaporization machining with wire electrode

Breaking the 10 nm barrier in hard-X-ray focusing

Simulation of concave–convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope

Role of Photoelectrochemical Oxidation in Enabling High-Efficiency Polishing of Gallium Nitride

Catalyzed chemical polishing of SiO2 glasses in pure water

High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser

Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors

High-throughput deterministic plasma etching using array-type plasma generator system

High-Efficiency Polishing of Polymer Surface Using Catalyst-Referred Etching

An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating

Catalyst enhancement approach for improving the removal rate and stability of silica glass polishing via catalyzed chemical etching in pure water

Photoelectrochemical Oxidation Assisted Catalyst-Referred Etching for SiC (0001) Surface

X-ray adaptive zoom condenser utilizing an intermediate virtual focus

High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics

Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

X‐ray optics for advanced ultrafast pump–probe X‐ray experiments at SACLA

Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

A Bragg beam splitter for hard x-ray free-electron lasers

Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

Erratum: “Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system” [Rev. Sci. Instrum. 92, 123706 (2021)]

Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

A micro channel‐cut crystal X‐ray monochromator for a self‐seeded hard X‐ray free‐electron laser

(Invited) High-Speed Plasma Etching of SiC Wafer Toward Backside Thinning

The Polishing Effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)

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