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Soft x-ray optical constants of sputtered chromium thin films with improved accuracy in the L and M absorption edge regions

Journal of applied physics, 2018-07, Vol.124 (3)

2018

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Optical constants of magnetron sputtered Pt thin films with improved accuracy in the N- and O-electronic shell absorption regions

Journal of applied physics, 2019-02, Vol.125 (8)

2019

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Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

Applied Optics, 2008-09, Vol.47 (25), p.4633-4639

2008

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High transmission pellicles for extreme ultraviolet lithography reticle protection

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2010-11, Vol.28 (6), p.C6-C6E41

2010

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Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2010-11, Vol.28 (6), p.C6-C6E30

2010

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New method for the determination of photoabsorption from transmittance measurements in the extreme ultraviolet

Optics express, 2022-06, Vol.30 (13), p.23771-23782

2022

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Advanced low blaze angle x-ray gratings via nanoimprint replication and plasma etch

Optics express, 2023-07, Vol.31 (16)

2023

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Prospects for the expansion of standing wave ambient pressure photoemission spectroscopy to reactions at elevated temperatures

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2021-12, Vol.40 (1)

2021

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Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-11, Vol.22 (6), p.2962-2965

2004

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Prospects for the expansion of standing wave ambient pressure photoemission spectroscopy to reactions at elevated temperatures

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-01, Vol.40 (1)

2022

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Concentration and chemical-state profiles at heterogeneous interfaces with sub-nm accuracy from standing-wave ambient-pressure photoemission

Nature communications, 2014-11, Vol.5 (1), p.5441-5441, Article 5441

2014

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High numerical aperture reflection mode coherent diffraction microscopy using off-axis apertured illumination

Optics express, 2012-08, Vol.20 (17), p.19050-19059

2012

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Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers

Applied Optics, 2004-10, Vol.43 (28), p.5323-5329

2004

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Lensless diffractive imaging using tabletop coherent high-harmonic soft-X-ray beams

Physical review letters, 2007-08, Vol.99 (9), p.098103-098103, Article 098103

2007

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Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-11, Vol.33 (6)

2015

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A 10,000 groove/mm multilayer coated grating for EUV spectroscopy

Optics express, 2011-03, Vol.19 (7), p.6320-6325

2011

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Full field tabletop EUV coherent diffractive imaging in a transmission geometry

Optics express, 2013-09, Vol.21 (19), p.21970-21980

2013

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Control of surface mobility for conformal deposition of Mo–Si multilayers on saw-tooth substrates

Applied surface science, 2013-11, Vol.284, p.575-580

2013

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Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light

Optics express, 2009-11, Vol.17 (24), p.22102-22107

2009

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Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-08, Vol.33 (6)

2015

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Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-08, Vol.33 (6)

2015

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Molybdenum/silicon multilayer components for high harmonic generation sources

Applied Optics, 2015-05, Vol.54 (13), p.4280-4284

2015

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Performance optimization of a bendable parabolic cylinder collimating X-ray mirror for the ALS micro-XAS beamline 10.3.2

Journal of synchrotron radiation, 2015-05, Vol.22 (3), p.666-674

2015

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Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

Optics express, 2014-08, Vol.22 (17), p.20144-20154

2014

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Optical constants of magnetron-sputtered magnesium films in the 25-1300 eV energy range

Journal of applied physics, 2010-09, Vol.108 (6), p.063517-063517-4

2010

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Soft x-ray optical constants of sputtered chromium thin films with improved accuracy in the L and M absorption edge regions

Optical constants of magnetron sputtered Pt thin films with improved accuracy in the N- and O-electronic shell absorption regions

Optical constants of magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

High transmission pellicles for extreme ultraviolet lithography reticle protection

Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

New method for the determination of photoabsorption from transmittance measurements in the extreme ultraviolet

Advanced low blaze angle x-ray gratings via nanoimprint replication and plasma etch

Prospects for the expansion of standing wave ambient pressure photoemission spectroscopy to reactions at elevated temperatures

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Prospects for the expansion of standing wave ambient pressure photoemission spectroscopy to reactions at elevated temperatures

Concentration and chemical-state profiles at heterogeneous interfaces with sub-nm accuracy from standing-wave ambient-pressure photoemission

High numerical aperture reflection mode coherent diffraction microscopy using off-axis apertured illumination

Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers

Lensless diffractive imaging using tabletop coherent high-harmonic soft-X-ray beams

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

A 10,000 groove/mm multilayer coated grating for EUV spectroscopy

Full field tabletop EUV coherent diffractive imaging in a transmission geometry

Control of surface mobility for conformal deposition of Mo–Si multilayers on saw-tooth substrates

Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Molybdenum/silicon multilayer components for high harmonic generation sources

Performance optimization of a bendable parabolic cylinder collimating X-ray mirror for the ALS micro-XAS beamline 10.3.2

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

Optical constants of magnetron-sputtered magnesium films in the 25-1300 eV energy range

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