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Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

Plasma sources science & technology, 2019-11, Vol.28 (11), p.115020

2019

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Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems

Sensors and actuators. B, Chemical, 2021-09, Vol.343, p.130173, Article 130173

2021

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Pressure dependence of Ar${\hspace{0pt}}_2^+$ , ArTi + , and Ti${\hspace{0pt}}_2^+$ dimer formation in a magnetron sputtering discharge

Journal of physics. D, Applied physics, 2017-11, Vol.50 (44), p.445205

2017

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Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers

Journal of applied physics, 2017-05, Vol.121 (17)

2017

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Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode

Journal of applied physics, 2017-05, Vol.121 (17)

2017

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Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

Journal of physics. D, Applied physics, 2018-03, Vol.51 (9), p.95205

2018

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Shape selective photoinduced electrochemical behavior of thin ZnO layers prepared by surfatron

Thin solid films, 2015-12, Vol.597, p.131-139

2015

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Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge

Journal of physics communications, 2019-05, Vol.3 (5), p.55011

2019

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Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

The European physical journal. D, Atomic, molecular, and optical physics, 2011-10, Vol.64 (2-3), p.427-435

2011

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Photo-induced electrochemical functionality of the TiO2 nanoscale films

Electrochimica acta, 2009-04, Vol.54 (12), p.3352-3359

2009

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Evaluation of antimicrobial effects of novel implant materials by testing the prevention of biofilm formation using a simple small scale medium-throughput growth inhibition assay

Biofouling (Chur, Switzerland), 2012-03, Vol.28 (3), p.267-277

2012

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Growth of hard nanostructured ZrN surface induced by copper nanoparticles

Applied surface science, 2021-10, Vol.562, p.150230, Article 150230

2021

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Time-resolved probe diagnostics of pulsed DC magnetron discharge during deposition of TiOx layers

Surface & coatings technology, 2006-12, Vol.201 (6), p.2512-2519

2006

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Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge

Journal of applied physics, 2019-01, Vol.125 (1)

2019

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Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging

IEEE transactions on plasma science, 2011-11, Vol.39 (11), p.2454-2455

2011

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Theoretical and experimental analysis of defined 2D-graded two-metal nanoparticle-build surfaces

Applied surface science, 2020-05, Vol.511, p.145530, Article 145530

2020

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Antibacterial effect of Cu/C:F nanocomposites deposited on PEEK substrates

Materials letters, 2018-11, Vol.230, p.96-99

2018

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Pressure dependence of singly and doubly charged ion formation in a HiPIMSdischarge

Journal of applied physics, 2019-01, Vol.125 (1)

2019

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Deposition of thin titanium–copper films with antimicrobial effect by advanced magnetron sputtering methods

Materials Science & Engineering C, 2011-10, Vol.31 (7), p.1512-1519

2011

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Pressure dependence of Ar2+, ArTi+, and Ti2+ dimer formation in a magnetron sputtering discharge

Journal of physics. D, Applied physics, 2017-10, Vol.50 (44)

2017

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Study of Electronegative Ar/O 2 Discharge by Means of Langmuir Probe

Contributions to plasma physics (1988), 2008-07, Vol.48 (5-7), p.503-508

2008

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Highly ionized physical vapor deposition plasma source working at very low pressure

Applied physics letters, 2012-04, Vol.100 (14), p.141604-141604-3

2012

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Probe Diagnostics of Microwave Plasma at Frequency 2.45 GHz in CW and Pulse Regime

Contributions to plasma physics (1985), 2006-06, Vol.46 (5-6), p.439-444

2006

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Surfatron Plasma Source Working at Frequency 2.45 GHz for Technological Applications

AIP conference proceedings, 2006, Vol.812 (1), p.72-79

2006

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Surfatron plasma-based sterilisation

Czechoslovak journal of physics, 2006-10, Vol.56 (S2), p.B843-B847

2006

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Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems

Pressure dependence of Ar${\hspace{0pt}}_2^+$ , ArTi + , and Ti${\hspace{0pt}}_2^+$ dimer formation in a magnetron sputtering discharge

Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers

Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode

Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

Shape selective photoinduced electrochemical behavior of thin ZnO layers prepared by surfatron

Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge

Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

Photo-induced electrochemical functionality of the TiO2 nanoscale films

Evaluation of antimicrobial effects of novel implant materials by testing the prevention of biofilm formation using a simple small scale medium-throughput growth inhibition assay

Growth of hard nanostructured ZrN surface induced by copper nanoparticles

Time-resolved probe diagnostics of pulsed DC magnetron discharge during deposition of TiOx layers

Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge

Dynamic Study of Dual High-Power Impulse Magnetron Sputtering Discharge by Optical Emission Imaging

Theoretical and experimental analysis of defined 2D-graded two-metal nanoparticle-build surfaces

Antibacterial effect of Cu/C:F nanocomposites deposited on PEEK substrates

Pressure dependence of singly and doubly charged ion formation in a HiPIMSdischarge

Deposition of thin titanium–copper films with antimicrobial effect by advanced magnetron sputtering methods

Pressure dependence of Ar2+, ArTi+, and Ti2+ dimer formation in a magnetron sputtering discharge

Study of Electronegative Ar/O 2 Discharge by Means of Langmuir Probe

Highly ionized physical vapor deposition plasma source working at very low pressure

Probe Diagnostics of Microwave Plasma at Frequency 2.45 GHz in CW and Pulse Regime

Surfatron Plasma Source Working at Frequency 2.45 GHz for Technological Applications

Surfatron plasma-based sterilisation

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