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Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]

Journal of applied physics, 2022-10, Vol.132 (15)

2022

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Measuring the ion current in electrical discharges using radio-frequency current and voltage measurements

Applied physics letters, 1998-03, Vol.72 (10), p.1146-1148

Sobolewski, M. A.

1998

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Electrical characteristics of argon radio frequency glow discharges in an asymmetric cell

IEEE transactions on plasma science, 1995-12, Vol.23 (6), p.1006-1022

Sobolewski, M.A.

1995

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Properties of ultrathin thermal nitrides in silicon Schottky barrier structures

Applied physics letters, 1989-02, Vol.54 (7), p.638-640

1989

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Experimental test of models of radio-frequency plasma sheaths

Applied physics letters, 1997-02, Vol.70 (8), p.1049-1051

Sobolewski, M. A.

1997

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Absolute spatially- and temporally-resolved optical emission measurements of rf glow discharges in argon

Journal of research of the National Institute of Standards and Technology, 1993-03, Vol.98 (2), p.159-180

1993

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Optimizing utilization efficiencies in electronegative discharges: The importance of the impedance phase angle

Journal of applied physics, 1999-11, Vol.86 (9), p.4825-4835

1999

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Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence

IEEE transactions on plasma science, 1999-02, Vol.27 (1), p.74-75

1999

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Measuring the ion current in high-density plasmas using radio-frequency current and voltage measurements

Journal of applied physics, 2001-09, Vol.90 (6), p.2660-2671

Sobolewski, Mark A.

2001

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Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1998-01, Vol.16 (1), p.173-182

1998

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Noninvasive monitoring of ion energy drift in an inductively coupled plasma reactor

Journal of applied physics, 2005-02, Vol.97 (3), p.033301-033301-12

Sobolewski, Mark A.

2005

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Monitoring sheath voltages and ion energies in high-density plasmas using noninvasive radio-frequency current and voltage measurements

Journal of applied physics, 2004-05, Vol.95 (9), p.4593-4604

Sobolewski, Mark A.

2004

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2-D imaging of temperature in CF/sub 4/ plasmas

IEEE transactions on plasma science, 2005-04, Vol.33 (2), p.370-371

2005

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Measurements and modeling of ion energy distributions in high-density, radio-frequency biased CF4 discharges

Journal of applied physics, 2002-05, Vol.91 (10), p.6303-6314

2002

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Electrical characterization of radio-frequency discharges in the Gaseous Electronics Conference Reference Cell

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1992-11, Vol.10 (6), p.3550-3562

Sobolewski, Mark A.

1992

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Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor

Journal of applied physics, 1999-04, Vol.85 (8), p.3966-3975

1999

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Dynamic model of the radio-frequency plasma sheath in a highly asymmetric discharge cell

Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 1997-07, Vol.56 (1), p.1001-1011

Sobolewski, M. A.

1997

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Effect of electrostatic screening on energy positions of electron spectra near SiO2/Si interfaces

Physical review. B, Condensed matter, 1988-12, Vol.38 (18), p.13407-13410

1988

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A technique for temperature mapping in fluorocarbon plasmas using planar laser-induced fluorescence of CF

Journal of applied physics, 2004-07, Vol.96 (1), p.71-81

2004

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2-D imaging of temperature in CF sub(4) plasmas

IEEE transactions on plasma science, 2005-01, Vol.33 (2)

2005

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Noninvasive Monitoring of Ion Energy in an Inductively Coupled Plasma Reactor

AIP conference proceedings, 2005, Vol.788 (1)

Sobolewski, Mark A.

2005

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Analysis of thin thermal silicon nitride films on silicon

Applied surface science, 1987-10, Vol.30 (1), p.210-215

1987

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Electrical control of plasma spatial uniformity investigated by Planar laser-induced fluorescence : Special issue on images in plasma science

IEEE transactions on plasma science, 1999, Vol.27 (1), p.74-75

1999

Volltextzugriff (PDF)

2-D Imaging of Temperature in CF4 Plasmas

IEEE transactions on plasma science, 2005-04, Vol.33 (2), p.370

2005

Volltextzugriff (PDF)

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Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]

Measuring the ion current in electrical discharges using radio-frequency current and voltage measurements

Electrical characteristics of argon radio frequency glow discharges in an asymmetric cell

The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges

Properties of ultrathin thermal nitrides in silicon Schottky barrier structures

Experimental test of models of radio-frequency plasma sheaths

Absolute spatially- and temporally-resolved optical emission measurements of rf glow discharges in argon

Optimizing utilization efficiencies in electronegative discharges: The importance of the impedance phase angle

Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence

Measuring the ion current in high-density plasmas using radio-frequency current and voltage measurements

Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas

Noninvasive monitoring of ion energy drift in an inductively coupled plasma reactor

Monitoring sheath voltages and ion energies in high-density plasmas using noninvasive radio-frequency current and voltage measurements

2-D imaging of temperature in CF/sub 4/ plasmas

Measurements and modeling of ion energy distributions in high-density, radio-frequency biased CF4 discharges

Electrical characterization of radio-frequency discharges in the Gaseous Electronics Conference Reference Cell

Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor

Dynamic model of the radio-frequency plasma sheath in a highly asymmetric discharge cell

Effect of electrostatic screening on energy positions of electron spectra near SiO2/Si interfaces

A technique for temperature mapping in fluorocarbon plasmas using planar laser-induced fluorescence of CF

2-D imaging of temperature in CF sub(4) plasmas

Noninvasive Monitoring of Ion Energy in an Inductively Coupled Plasma Reactor

Analysis of thin thermal silicon nitride films on silicon

Electrical control of plasma spatial uniformity investigated by Planar laser-induced fluorescence : Special issue on images in plasma science

2-D Imaging of Temperature in CF4 Plasmas

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