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Breaking the 10 nm barrier in hard-X-ray focusing

Nature physics, 2010-02, Vol.6 (2), p.122-125

2010

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High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser

Optics express, 2020-08, Vol.28 (18), p.25706-25715

2020

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Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors

Optics express, 2019-02, Vol.27 (3), p.3429-3438

2019

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High-Efficiency Polishing of Polymer Surface Using Catalyst-Referred Etching

International journal of automation technology, 2024-03, Vol.18 (2), p.240-247

2024

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Catalyst enhancement approach for improving the removal rate and stability of silica glass polishing via catalyzed chemical etching in pure water

Precision engineering, 2023-11, Vol.84, p.21-27

2023

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Photoelectrochemical Oxidation Assisted Catalyst-Referred Etching for SiC (0001) Surface

International journal of automation technology, 2021-01, Vol.15 (1), p.74-79

2021

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X-ray adaptive zoom condenser utilizing an intermediate virtual focus

Optics express, 2021-05, Vol.29 (10), p.15604-15615

2021

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High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics

Applied physics express, 2024-01, Vol.17 (1), p.16001

2024

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Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

Journal of physics. Condensed matter, 2011-10, Vol.23 (39), p.394206-np

2011

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X‐ray optics for advanced ultrafast pump–probe X‐ray experiments at SACLA

Journal of synchrotron radiation, 2019-03, Vol.26 (2), p.333-338

2019

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A Bragg beam splitter for hard x-ray free-electron lasers

Optics express, 2013-02, Vol.21 (3), p.2823

2013

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Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

Journal of applied physics, 2019-08, Vol.126 (6)

2019

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A micro channel‐cut crystal X‐ray monochromator for a self‐seeded hard X‐ray free‐electron laser

Journal of synchrotron radiation, 2019-09, Vol.26 (5), p.1496-1502

2019

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Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiation

Optics express, 2015-11, Vol.23 (22), p.29032-29037

2015

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Characteristics and Mechanism of Catalyst-Referred Etching Method: Application to 4H-SiC

International journal of automation technology, 2018-03, Vol.12 (2), p.154-159

2018

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Characterization of temporal coherence of hard X-ray free-electron laser pulses with single-shot interferograms

IUCrJ, 2017-11, Vol.4 (Pt 6), p.728-733

2017

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Planarization of Lithium Niobate Surface Using a Thin Film Catalyst in Pure Water

EPJ Web of conferences, 2022, Vol.266, p.3006

2022

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Platinum-catalyzed hydrolysis etching of SiC in water: A density functional theory study

Japanese Journal of Applied Physics, 2018-05, Vol.57 (5), p.55703

2018

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High-Efficiency Planarization of SiC Wafers by Water-CARE (Catalyst-Referred Etching) Employing Photoelectrochemical Oxidation

Materials science forum, 2019-07, Vol.963, p.525-529

2019

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Surface Finishing Method Using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-Ray Crystal Monochromators

International journal of automation technology, 2019-03, Vol.13 (2), p.246-253

2019

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Local atomic configuration of graphene, buffer layer, and precursor layer on SiC(0001) by photoelectron diffraction

Surface science, 2015-02, Vol.632, p.98-102

2015

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Aggregation of carbon atoms at SiO2/SiC(0001) interface by plasma oxidation toward formation of pit-free graphene

Carbon (New York), 2014-12, Vol.80, p.440-445

2014

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Microstitching interferometry for x-ray reflective optics

Review of scientific instruments, 2003-05, Vol.74 (5), p.2894-2898

2003

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X-ray nanofocusing using a piezoelectric deformable mirror and at-wavelength metrology methods

Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2013-05, Vol.710, p.93-97

2013

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Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity

Japanese Journal of Applied Physics, 2015-01, Vol.54 (1S), p.1-1-01AE03-5

2015

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Breaking the 10 nm barrier in hard-X-ray focusing

High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser

Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors

High-Efficiency Polishing of Polymer Surface Using Catalyst-Referred Etching

Catalyst enhancement approach for improving the removal rate and stability of silica glass polishing via catalyzed chemical etching in pure water

Photoelectrochemical Oxidation Assisted Catalyst-Referred Etching for SiC (0001) Surface

X-ray adaptive zoom condenser utilizing an intermediate virtual focus

High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics

Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

X‐ray optics for advanced ultrafast pump–probe X‐ray experiments at SACLA

A Bragg beam splitter for hard x-ray free-electron lasers

Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

A micro channel‐cut crystal X‐ray monochromator for a self‐seeded hard X‐ray free‐electron laser

Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiation

Characteristics and Mechanism of Catalyst-Referred Etching Method: Application to 4H-SiC

Characterization of temporal coherence of hard X-ray free-electron laser pulses with single-shot interferograms

Planarization of Lithium Niobate Surface Using a Thin Film Catalyst in Pure Water

Platinum-catalyzed hydrolysis etching of SiC in water: A density functional theory study

High-Efficiency Planarization of SiC Wafers by Water-CARE (Catalyst-Referred Etching) Employing Photoelectrochemical Oxidation

Surface Finishing Method Using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-Ray Crystal Monochromators

Local atomic configuration of graphene, buffer layer, and precursor layer on SiC(0001) by photoelectron diffraction

Aggregation of carbon atoms at SiO2/SiC(0001) interface by plasma oxidation toward formation of pit-free graphene

Microstitching interferometry for x-ray reflective optics

X-ray nanofocusing using a piezoelectric deformable mirror and at-wavelength metrology methods

Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity

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