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Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors

Applied physics letters, 2002-04, Vol.80 (13), p.2362-2364

2002

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Liquid-delivery MOCVD: chemical and process perspectives on ferro-electric thin film growth

Advanced materials for optics and electronics, 2000-05, Vol.10 (3-5), p.145-154

2000

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Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O3 Using a Novel Niobium Precursor

Chemistry of materials, 1999-02, Vol.11 (2), p.209-212

1999

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Ferroelectric strontium bismuth tantalate thin films deposited by metalorganic chemical vapour deposition (MOCVD)

Journal of the European Ceramic Society, 1999-01, Vol.19 (6), p.1463-1466

1999

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Group IVA Oxide Surface Modification of LSCF Cathode Powders by Atomic Layer Deposition

ECS transactions, 2017, Vol.78 (1), p.935-942

2017

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Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O 3 Using a Novel Niobium Precursor

Chemistry of materials, 1999-02, Vol.11 (2), p.209-212

1999

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Metalorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition

Japanese Journal of Applied Physics, 1996, Vol.35 (4B), p.2520-2525

1996

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Chemical Routes to Improved Mechanical Properties of PECVD Low K Thin Films

MRS proceedings, 2004, Vol.812, Article F6.18

2004

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Manufacturing of perovskite thin films using liquid delivery MOCVD

Integrated ferroelectrics, 1995-10, Vol.10 (1-4), p.9-22

1995

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Comparison of Mocvd Precursors for Hf1-xSixO2 Gate Dielectric Deposition

MRS proceedings, 2002, Vol.716

2002

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Growth of (Ni,Zn)Fe2O4 Thin Films by Liquid Delivery Metal-Organic Chemical Vapor Deposition

MRS proceedings, 1999, Vol.574

1999

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Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr0.35Ti0.65)O3 thin films

Journal of materials research, 2003-01, Vol.18 (1), p.173-179

2003

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Liquid Delivery MOCVD of Ferroelectric PZT

MRS proceedings, 1995, Vol.415, Article 123

1995

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MOCVD of SrBi2Ta2O9 for Integrated Ferroelectric Capacitors

MRS proceedings, 1998, Vol.493

1998

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MOCVD of advanced dielectric and ferroelectric films by liquid delivery

Integrated ferroelectrics, 1997-09, Vol.18 (1-4), p.109-118

1997

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Origin and implications of the observed rhombohedral phase in nominally tetragonal Pb(Zr0.35Ti0.65)O3 thin films

Journal of applied physics, 2003-10, Vol.94 (8), p.5210-5219

2003

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Mocvd of Polycrystalline and Epitaxial Complex Oxides by Liquid Delivery

MRS proceedings, 1997, Vol.474, Article 21

1997

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Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr sub 0.35 Ti sub 0.65 )O sub 3 thin films

Journal of materials research, 2003-01, Vol.18 (1), p.173-179

2003

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Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr 0.35 Ti 0.65 )O 3 thin films

Journal of materials research, 2003-01, Vol.18 (1), p.173-179

2003

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High Purity Silicon Amido Precursors for Low Temperature Cvd of High к Gate Silicates

MRS proceedings, 2002, Vol.716, Article B2.11

2002

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MOCVD of Nb Substituted SrBi 2 Ta 2 O 9 for Integrated Ferroelectric Capacitors

MRS proceedings, 1999, Vol.596, Article 143

1999

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MOCVD of Nb Substituted SrBi2Ta2O9 for Integrated Ferroelectric Capacitors

MRS proceedings, 1999, Vol.596

1999

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Growth of (Ni,Zn)Fe 2 O 4 Thin Films by Liquid Delivery Metal-Organic Chemical Vapor Deposition

MRS proceedings, 1999, Vol.574, Article 169

1999

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FERROELECTRIC STRONTIUM BISMUTH TANTALATE THIN FILMS DEPOSITED BY METALLORGANIC CHEMICAL VAPOUR DEPOSITION (MOCVD)

Journal of the European Ceramic Society, 1999-01, Vol.19 (6/7), p.1463-1466

1999

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Properties of Zr-Substituted (Ba,Sr)TiO 3 Thin Films for Integrated Capacitors

MRS proceedings, 1999, Vol.603, Article 131

1999

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Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors

Liquid-delivery MOCVD: chemical and process perspectives on ferro-electric thin film growth

Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O3 Using a Novel Niobium Precursor

Ferroelectric strontium bismuth tantalate thin films deposited by metalorganic chemical vapour deposition (MOCVD)

Group IVA Oxide Surface Modification of LSCF Cathode Powders by Atomic Layer Deposition

Liquid Delivery MOCVD of Niobium-Doped Pb(Zr,Ti)O 3 Using a Novel Niobium Precursor

Metalorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition

Chemical Routes to Improved Mechanical Properties of PECVD Low K Thin Films

Manufacturing of perovskite thin films using liquid delivery MOCVD

Comparison of Mocvd Precursors for Hf1-xSixO2 Gate Dielectric Deposition

Growth of (Ni,Zn)Fe2O4 Thin Films by Liquid Delivery Metal-Organic Chemical Vapor Deposition

Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr0.35Ti0.65)O3 thin films

Liquid Delivery MOCVD of Ferroelectric PZT

MOCVD of SrBi2Ta2O9 for Integrated Ferroelectric Capacitors

MOCVD of advanced dielectric and ferroelectric films by liquid delivery

Origin and implications of the observed rhombohedral phase in nominally tetragonal Pb(Zr0.35Ti0.65)O3 thin films

Mocvd of Polycrystalline and Epitaxial Complex Oxides by Liquid Delivery

Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr sub 0.35 Ti sub 0.65 )O sub 3 thin films

Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr 0.35 Ti 0.65 )O 3 thin films

High Purity Silicon Amido Precursors for Low Temperature Cvd of High к Gate Silicates

MOCVD of Nb Substituted SrBi 2 Ta 2 O 9 for Integrated Ferroelectric Capacitors

MOCVD of Nb Substituted SrBi2Ta2O9 for Integrated Ferroelectric Capacitors

Growth of (Ni,Zn)Fe 2 O 4 Thin Films by Liquid Delivery Metal-Organic Chemical Vapor Deposition

FERROELECTRIC STRONTIUM BISMUTH TANTALATE THIN FILMS DEPOSITED BY METALLORGANIC CHEMICAL VAPOUR DEPOSITION (MOCVD)

Properties of Zr-Substituted (Ba,Sr)TiO 3 Thin Films for Integrated Capacitors

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