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Research in Macromolecular Science: Challenges and Opportunities for the Next Decade

Macromolecules, 2009-01, Vol.42 (2), p.465-471

2009

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Ring oscillator fabricated completely by means of mass-printing technologies

Organic electronics, 2007-10, Vol.8 (5), p.480-486

2007

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Molecular Templating of Nanoporous Ultralow Dielectric Constant (≈1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers

Chemistry of materials, 2001-09, Vol.13 (9), p.2762-2764

2001

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Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

Macromolecules, 1997-10, Vol.30 (21), p.6517-6524

1997

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Chemical amplification mechanisms for microlithography

Chemistry of materials, 1991-05, Vol.3 (3), p.394-407

1991

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Statement on Education—Planning Together Today to Meet Tomorrow's Challenges

Journal of chemical education, 2001-09, Vol.78 (9), p.1161

Reichmanis, Elsa

2001

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Polymer materials for microlithography

Chemical reviews, 1989-09, Vol.89 (6), p.1273-1289

1989

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Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators

Journal of fluorine chemistry, 2003-07, Vol.122 (1), p.47-55

2003

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Nitrobenzyl ester chemistry for polymer processes involving chemical amplification

Macromolecules, 1988-07, Vol.21 (7), p.2001-2006

1988

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Nanoporous Ultralow Dielectric Constant Organosilicates Templated by Triblock Copolymers

Chemistry of materials, 2002-01, Vol.14 (1), p.369-374

2002

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Fundamental Studies of Molecular Interactions and Dissolution Inhibition in Poly(norbornene-alt-maleic anhydride)-Based Resins

Chemistry of materials, 2000-11, Vol.12 (11), p.3516-3524

2000

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Plastic electronic devices: From materials design to device applications

Bell Labs technical journal, 2005, Vol.10 (3), p.87-105

2005

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Organic Materials Challenges for 193 nm Imaging

Accounts of chemical research, 1999-08, Vol.32 (8), p.659-667

1999

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Definitions of terms relating to reactions of polymers and to functional polymeric materials (IUPAC Recommendations 2003)

Pure and applied chemistry, 2004-01, Vol.76 (4), p.889-906

2004

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Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid

Chemistry of materials, 1991-05, Vol.3 (3), p.462-471

1991

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Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins

Radiation physics and chemistry (Oxford, England : 1993), 2001-07, Vol.62 (1), p.69-76

2001

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Influence of Polymer Structure on the Miscibility of Photoacid Generators

Chemistry of materials, 1994-03, Vol.6 (3), p.295-301

1994

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Study of Base Additives for Use in a Single Layer 193nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate)

Journal of Photopolymer Science and Technology, 2001, Vol.14(3), pp.373-384

2001

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Synthesis and evaluation of copolymers of (tert-butoxycarbonyloxy)styrene and (2-nitrobenzyl)styrene sulfonates: single-component chemically amplified deep-UV imaging materials

Chemistry of materials, 1992-07, Vol.4 (4), p.837-842

1992

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Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

Chemistry of materials, 1994-03, Vol.6 (3), p.287-294

1994

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Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices: studies pertaining to chemical amplification and imaging

Macromolecules, 1990, Vol.23 (1), p.145-150

1990

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A Commercially Viable 193 nm Single Layer Resist Platform

Journal of photopolymer science and technology, 1997, Vol.10 (3), p.511-520

1997

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Fundamental Studies of Dissolution Inhibitors in Poly(norbornene-alt-maleic anhydride) Based Resins

Journal of Photopolymer Science and Technology, 2000, Vol.13(4), pp.569-578

2000

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Testing the Limits for Resists

Science (American Association for the Advancement of Science), 2002-07, Vol.297 (5580), p.349-350

2002

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Applied physics. Testing the limits for resists

Science (American Association for the Advancement of Science), 2002-07, Vol.297 (5580), p.349-350

2002

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Research in Macromolecular Science: Challenges and Opportunities for the Next Decade

Ring oscillator fabricated completely by means of mass-printing technologies

Molecular Templating of Nanoporous Ultralow Dielectric Constant (≈1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers

Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

Chemical amplification mechanisms for microlithography

Statement on Education—Planning Together Today to Meet Tomorrow's Challenges

Polymer materials for microlithography

Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators

Nitrobenzyl ester chemistry for polymer processes involving chemical amplification

Nanoporous Ultralow Dielectric Constant Organosilicates Templated by Triblock Copolymers

Fundamental Studies of Molecular Interactions and Dissolution Inhibition in Poly(norbornene-alt-maleic anhydride)-Based Resins

Plastic electronic devices: From materials design to device applications

Organic Materials Challenges for 193 nm Imaging

Definitions of terms relating to reactions of polymers and to functional polymeric materials (IUPAC Recommendations 2003)

Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid

Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins

Influence of Polymer Structure on the Miscibility of Photoacid Generators

Study of Base Additives for Use in a Single Layer 193nm Resist Based Upon Poly(norbornene/maleic anhydride/acrylic acid/tert-butyl Acrylate)

Synthesis and evaluation of copolymers of (tert-butoxycarbonyloxy)styrene and (2-nitrobenzyl)styrene sulfonates: single-component chemically amplified deep-UV imaging materials

Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices: studies pertaining to chemical amplification and imaging

A Commercially Viable 193 nm Single Layer Resist Platform

Fundamental Studies of Dissolution Inhibitors in Poly(norbornene-alt-maleic anhydride) Based Resins

Testing the Limits for Resists

Applied physics. Testing the limits for resists

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