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Synthesis of Hydrogenated Silicon Oxycarbonitride from a Gas Mixture of Methyltris(Diethylamino)Silane, Nitrogen, and Oxygen

Glass physics and chemistry, 2018-11, Vol.44 (6), p.607-615

2018

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Synthesis and Properties of Thin Films Formed by Vapor Deposition from Tetramethylsilane in a Radio-Frequency Inductively Coupled Plasma Discharge

Glass physics and chemistry, 2018-05, Vol.44 (3), p.174-182

2018

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4-(Trimethylsilyl)morpholine: synthesis, characterization, and prospects of use in film deposition processes

Russian chemical bulletin, 2017-12, Vol.66 (12), p.2283-2289

2017

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The influence of the conditions of synthesis on the composition and mechanical properties of silicon oxycarbonitride nanocomposite films

Protection of metals and physical chemistry of surfaces, 2017-03, Vol.53 (2), p.253-260

2017

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Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films

Journal of structural chemistry, 2017, Vol.58 (1), p.119-125

2017

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Hexanuclear Na(I) complex with 3,5-dimethyl-1H-pyrazole and its anion

Journal of structural chemistry, 2017-07, Vol.58 (4), p.824-827

2017

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PECVD Synthesis of Silicon Carbonitride Layers Using Methyltris(diethylamino)silane as the New Single-Source Precursor

ECS journal of solid state science and technology, 2015-01, Vol.4 (1), p.N3153-N3163

2015

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The phase composition and physicochemical properties of transparent nanocomposite films of silicon oxycarbonitride

Journal of structural chemistry, 2016-11, Vol.57 (6), p.1209-1215

2016

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Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films

Russian journal of applied chemistry, 2018-07, Vol.91 (7), p.1068-1075

2018

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Films of hydrogenated silicon oxycarbonitride. Part I. Chemical and phase composition

Glass physics and chemistry, 2014-09, Vol.40 (5), p.570-577

2014

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Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

Surface & coatings technology, 2008-05, Vol.202 (17), p.4076-4085

2008

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Thermodynamic analysis of the growth of germanium-containing films from Ge(C2H5)4 + hydrogen mixtures

Inorganic materials, 2014-02, Vol.50 (2), p.107-112

2014

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Analysis features of elemental composition of boron carbonitride films by EDS

Protection of metals and physical chemistry of surfaces, 2014-03, Vol.50 (2), p.273-277

2014

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Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane

Glass physics and chemistry, 2013, Vol.39 (1), p.77-88

2013

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Use of hexamethylcyclotrisilazane for preparation of transparent films of complex compositions

Glass physics and chemistry, 2009-06, Vol.35 (3), p.274-283

2009

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Hydrogenated silicon oxycarbonitride films. Part II. Physicochemical and functional properties

Glass physics and chemistry, 2014-11, Vol.40 (6), p.643-649

2014

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Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine : Modelling, synthesis and characterization

Surface & coatings technology, 2007-09, Vol.201 (22-23), p.9009-9014

2007

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Tris(diethylamino)silane—A new precursor compound for obtaining layers of silicon carbonitride

Glass physics and chemistry, 2012-02, Vol.38 (1), p.15-26

2012

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PECVD synthesis and optical properties of BCXNY films obtained from N-triethylborazine as a single-source precursor

Surface & coatings technology, 2013-09, Vol.230, p.145-151

2013

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Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane

Glass physics and chemistry, 2011-06, Vol.37 (3), p.316-321

2011

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Synthesis of Zirconium Diboride Films and ZrB2/BCxNy Heterostructures

Inorganic materials, 2018, Vol.54 (2), p.133-139

2018

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Plasma-chemical synthesis of transparent dielectric Si–C–O–H films from trimethylphenoxysilane

High energy chemistry, 2016-05, Vol.50 (3), p.224-227

2016

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Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane

Applied surface science, 2013-01, Vol.265, p.385-388

2013

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Chemical composition of an inductively coupled hexamethyldisilazane–argon plasma and properties of films grown in this plasma

Inorganic materials, 2016-06, Vol.52 (6), p.630-636

2016

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Characterization of Thin Boron and Silicon Carbonitride Films by Wavelength Dispersive Spectroscopy

Protection of metals and physical chemistry of surfaces, 2017-11, Vol.53 (6), p.1187-1191

2017

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Synthesis of Hydrogenated Silicon Oxycarbonitride from a Gas Mixture of Methyltris(Diethylamino)Silane, Nitrogen, and Oxygen

Synthesis and Properties of Thin Films Formed by Vapor Deposition from Tetramethylsilane in a Radio-Frequency Inductively Coupled Plasma Discharge

4-(Trimethylsilyl)morpholine: synthesis, characterization, and prospects of use in film deposition processes

The influence of the conditions of synthesis on the composition and mechanical properties of silicon oxycarbonitride nanocomposite films

Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films

Hexanuclear Na(I) complex with 3,5-dimethyl-1H-pyrazole and its anion

PECVD Synthesis of Silicon Carbonitride Layers Using Methyltris(diethylamino)silane as the New Single-Source Precursor

The phase composition and physicochemical properties of transparent nanocomposite films of silicon oxycarbonitride

Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films

Films of hydrogenated silicon oxycarbonitride. Part I. Chemical and phase composition

Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

Thermodynamic analysis of the growth of germanium-containing films from Ge(C2H5)4 + hydrogen mixtures

Analysis features of elemental composition of boron carbonitride films by EDS

Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane

Use of hexamethylcyclotrisilazane for preparation of transparent films of complex compositions

Hydrogenated silicon oxycarbonitride films. Part II. Physicochemical and functional properties

Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine : Modelling, synthesis and characterization

Tris(diethylamino)silane—A new precursor compound for obtaining layers of silicon carbonitride

PECVD synthesis and optical properties of BCXNY films obtained from N-triethylborazine as a single-source precursor

Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane

Synthesis of Zirconium Diboride Films and ZrB2/BCxNy Heterostructures

Plasma-chemical synthesis of transparent dielectric Si–C–O–H films from trimethylphenoxysilane

Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane

Chemical composition of an inductively coupled hexamethyldisilazane–argon plasma and properties of films grown in this plasma

Characterization of Thin Boron and Silicon Carbonitride Films by Wavelength Dispersive Spectroscopy

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