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Stability of TiB2 as a Diffusion Barrier on Silicon

Journal of the Electrochemical Society, 1991-10, Vol.138 (10), p.3062-3067

1991

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Formation of ultrashallow p+-n junctions by low-energy boron implantation using a modified ion implanter

Applied physics letters, 1988-10, Vol.53 (18), p.1741-1743

1988

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The effect of annealing on resistivity of low pressure chemical vapor deposited titanium diboride

Journal of applied physics, 1991-06, Vol.69 (11), p.7853-7861

1991

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An Investigation of Fixed Charge Buildup in Nitrided Oxides

Journal of the Electrochemical Society, 1986-04, Vol.133 (4), p.787-793

1986

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Optimization and Characterization of LPCVD TiB2 for ULSI Applications

Journal of the Electrochemical Society, 1991-10, Vol.138 (10), p.3053-3061

1991

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Material and electrical properties of ultra-shallow p+-n junctions formed by low-energy ion implantation and rapid thermal annealing

IEEE transactions on electron devices, 1991-03, Vol.38 (3), p.476-486

1991

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Characterization of ultra-shallow p+-n junction diodes fabricated by 500 eV boron-ion implantation

IEEE transactions on electron devices, 1991, Vol.38 (1), p.28-31

1991

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Effects of processing conditions on negative bias temperature instability in metal-oxide-semiconductor structures

Applied physics letters, 1988-04, Vol.52 (16), p.1344-1346

1988

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Sample geometry effects in rapid thermal annealing

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1990-03, Vol.8 (2), p.122-127

1990

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Electrical characteristics of TiB2 for ULSI applications

IEEE transactions on electron devices, 1992-10, Vol.39 (10), p.2341-2345

1992

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Device performance of shallow junction PMOSFETs fabricated using low-energy ion implantation of B and BF2 into crystalline and Ge preamorphised silicon

Electronics letters, 1989-08, Vol.25 (16), p.1100-1101

1989

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The Action of Potassium Cyanide When Introduced into Tissues of a Plant

Science (American Association for the Advancement of Science), 1915-07, Vol.42 (1070), p.33-36

1915

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The Structure of the Silk Glands of Apanteles glomeratus L

The American naturalist, 1907-09, Vol.41 (489), p.567-585

1907

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Notes on a Chestnut-Tree Insect

Science (American Association for the Advancement of Science), 1913-12, Vol.38 (989), p.852-852

Ruggles, A. G.

1913

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Preparation and Characterization of LPCVD TiB2 Thin Films

MRS proceedings, 1990, Vol.181

1990

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Strawberry Plant Certification Work in Minnesota

Journal of economic entomology, 1936-10, Vol.29 (5), p.953-956

Ruggles, A. G.

1936

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Some Peculiarities of State Regulations Concerning the Movement of Nursery Stock

Journal of economic entomology, 1934-06, Vol.27 (3), p.581-584

Ruggles, A. G.

1934

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Pioneering in Economic Entomology

Journal of economic entomology, 1924-02, Vol.17 (1), p.34-41

Ruggles, A. G.

1924

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Life History of Oberea Tripunctata Swed

Journal of economic entomology, 1915-02, Vol.8 (1), p.79-85

Ruggles, A. G.

1915

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Electrical characteristics of TiB(2) for ULSI applications

IEEE transactions on electron devices, 1992-10, Vol.39 (10), p.2341-2345

1992

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Recent Quarantine Adjustments Giving Increased Consideration to Biological Findings

Journal of economic entomology, 1942-10, Vol.35 (5), p.765-770

1942

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Results of three years' Experience in the Control of Mosaic in Red Raspberries in Nurseries

Journal of economic entomology, 1927-06, Vol.20 (3), p.478-496

1927

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The Control of Mosaic of Red Raspberries from the Nursery Inspector's Standpoint

Journal of economic entomology, 1926-04, Vol.19 (2), p.365-370

1926

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Material and electrical properties of ultra-shallow p(+)-njunctions formed by low-energy ion implantation and rapid thermalannealing

IEEE transactions on electron devices, 1991-03, Vol.38 (3), p.476-486

1991

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Material and electrical properties of ultra-shallow p super(+)-n junctions formed by low-energy ion implantation and rapid thermal annealing

IEEE transactions on electron devices, 1991-01, Vol.38 (3), p.476-486

1991

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Stability of TiB2 as a Diffusion Barrier on Silicon

Formation of ultrashallow p+-n junctions by low-energy boron implantation using a modified ion implanter

The effect of annealing on resistivity of low pressure chemical vapor deposited titanium diboride

An Investigation of Fixed Charge Buildup in Nitrided Oxides

Optimization and Characterization of LPCVD TiB2 for ULSI Applications

Material and electrical properties of ultra-shallow p+-n junctions formed by low-energy ion implantation and rapid thermal annealing

Characterization of ultra-shallow p+-n junction diodes fabricated by 500 eV boron-ion implantation

Effects of processing conditions on negative bias temperature instability in metal-oxide-semiconductor structures

Sample geometry effects in rapid thermal annealing

Electrical characteristics of TiB2 for ULSI applications

Device performance of shallow junction PMOSFETs fabricated using low-energy ion implantation of B and BF2 into crystalline and Ge preamorphised silicon

The Action of Potassium Cyanide When Introduced into Tissues of a Plant

The Structure of the Silk Glands of Apanteles glomeratus L

Notes on a Chestnut-Tree Insect

Preparation and Characterization of LPCVD TiB2 Thin Films

Strawberry Plant Certification Work in Minnesota

Some Peculiarities of State Regulations Concerning the Movement of Nursery Stock

Pioneering in Economic Entomology

Life History of Oberea Tripunctata Swed

Electrical characteristics of TiB(2) for ULSI applications

Recent Quarantine Adjustments Giving Increased Consideration to Biological Findings

Results of three years' Experience in the Control of Mosaic in Red Raspberries in Nurseries

The Control of Mosaic of Red Raspberries from the Nursery Inspector's Standpoint

Material and electrical properties of ultra-shallow p(+)-njunctions formed by low-energy ion implantation and rapid thermalannealing

Material and electrical properties of ultra-shallow p super(+)-n junctions formed by low-energy ion implantation and rapid thermal annealing

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