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Simplified Readout of UVPROM Dosimeters for Spacecraft Applications

IEEE transactions on nuclear science, 2006-08, Vol.53 (4), p.1859-1862

2006

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Improvements in resolution and dynamic range for FGMOS dosimetry

IEEE transactions on nuclear science, 2005-12, Vol.52 (6), p.2597-2601

2005

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The impact of single-wafer processing on semiconductor manufacturing

IEEE transactions on semiconductor manufacturing, 2003-05, Vol.16 (2), p.96-101

2003

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Fundamental Issues in Manufacturing Photovoltaic Modules Beyond the Current Generation of Materials

Advances in OptoElectronics (Hindawi), 2012-01, Vol.2012 (2012), p.1-10

2012

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Rapid photothermal processing as a semiconductor manufacturing technology for the 21st century

Applied surface science, 2000-12, Vol.168 (1-4), p.198-203

2000

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High- gate dielectrics with ultra-low leakage current for sub-45 nm CMOS

Electronics letters, 2007, Vol.43 (21), p.1130

2007

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A new process and tool for metal/high-к gate dielectric stack for sub-45 nm CMOS manufacturing

2007 International Symposium on Semiconductor Manufacturing, 2007, p.1-4

2007

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Silicon nanoelectronics: 100 nm barriers and potential solutions

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168), 1998, p.427-433

1998

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Effect of UV/VUV enhanced RTP on process variation and device performance of metal gate/high-[kappa] gate stacks for the sub-90-nm CMOS regime

IEEE transactions on semiconductor manufacturing, 2005-02, Vol.18 (1), p.55

2005

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Effect of UV/VUV enhanced RTP on process variation and device performance of metal gate/high-/spl kappa/ gate stacks for the sub-90-nm CMOS regime

IEEE transactions on semiconductor manufacturing, 2005-02, Vol.18 (1), p.55-62

2005

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Effect of UV/VUV Enhanced RTP on Process Variation and Device Performance of Metal Gate/High- $kappa$ Gate Stacks for the Sub-90-nm CMOS Regime

IEEE transactions on semiconductor manufacturing, 2005-02, Vol.18 (1), p.55-62

2005

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'The waiting game' : a study of the psychological impact associated with diagnosing breast disease

Poole, K.F

1998

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Role of rapid photothermal processing in process integration

IEEE transactions on electron devices, 1998-03, Vol.45 (3), p.643-654

1998

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A study of the effect of ultraviolet (UV) and vacuum ultraviolet (VUV) photons on the minority carrier lifetime of single crystal silicon processed by rapid thermal and rapid photothermal processing

Journal of electronic materials, 1999-12, Vol.28 (12), p.1394-1398

1999

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Importance of rapid photothermal processing in defect reduction and process integration

IEEE transactions on semiconductor manufacturing, 1999-02, Vol.12 (1), p.36-43

1999

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Modeling early failure in integrated circuit interconnect

Microelectronics and reliability, 2000-06, Vol.40 (6), p.991-996

2000

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Global green energy conversion revolution in 21st century through solid state devices

2008 26th International Conference on Microelectronics, 2008, p.45-54

2008

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Characterization of Al-1 wt% Y thin films for VLSI interconnects

Thin solid films, 1997-10, Vol.308, p.460-464

1997

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Changing from rapid thermal processing to rapid photothermal processing: what does it buy for a particular technology?

Materials science in semiconductor processing, 1998, Vol.1 (3), p.219-230

1998

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Simulating IC reliability with emphasis on process-flaw related early failures

IEEE transactions on reliability, 1995-12, Vol.44 (4), p.556-561

1995

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Early-life reliability prediction methodology for integrated circuits

Microelectronics and reliability, 1995-08, Vol.35 (8), p.1147-1155

1995

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New Tool and New Process for Ultra High Performance for Metal/High-K Gate Dielectric Stack for Sub-45 nm CMOS Manufacturing

2007 15th International Conference on Advanced Thermal Processing of Semiconductors, 2007, p.65-69

2007

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RELIANT: a reliability analysis tool for VLSI interconnect

IEEE journal of solid-state circuits, 1989-04, Vol.24 (2), p.458-462

1989

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Semiconductor Manufacturing in the Nanotechnology World of the 21st Century

2006 25th International Conference on Microelectronics, 2006, p.2-8

2006

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Critical technology challenges in low power electronics

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop, 1995, p.142-147

1995

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Simplified Readout of UVPROM Dosimeters for Spacecraft Applications

Improvements in resolution and dynamic range for FGMOS dosimetry

The impact of single-wafer processing on semiconductor manufacturing

Fundamental Issues in Manufacturing Photovoltaic Modules Beyond the Current Generation of Materials

Rapid photothermal processing as a semiconductor manufacturing technology for the 21st century

High- gate dielectrics with ultra-low leakage current for sub-45 nm CMOS

A new process and tool for metal/high-к gate dielectric stack for sub-45 nm CMOS manufacturing

Silicon nanoelectronics: 100 nm barriers and potential solutions

Effect of UV/VUV enhanced RTP on process variation and device performance of metal gate/high-[kappa] gate stacks for the sub-90-nm CMOS regime

Effect of UV/VUV enhanced RTP on process variation and device performance of metal gate/high-/spl kappa/ gate stacks for the sub-90-nm CMOS regime

Effect of UV/VUV Enhanced RTP on Process Variation and Device Performance of Metal Gate/High- $kappa$ Gate Stacks for the Sub-90-nm CMOS Regime

'The waiting game' : a study of the psychological impact associated with diagnosing breast disease

Role of rapid photothermal processing in process integration

A study of the effect of ultraviolet (UV) and vacuum ultraviolet (VUV) photons on the minority carrier lifetime of single crystal silicon processed by rapid thermal and rapid photothermal processing

Importance of rapid photothermal processing in defect reduction and process integration

Modeling early failure in integrated circuit interconnect

Global green energy conversion revolution in 21st century through solid state devices

Characterization of Al-1 wt% Y thin films for VLSI interconnects

Changing from rapid thermal processing to rapid photothermal processing: what does it buy for a particular technology?

Simulating IC reliability with emphasis on process-flaw related early failures

Early-life reliability prediction methodology for integrated circuits

New Tool and New Process for Ultra High Performance for Metal/High-K Gate Dielectric Stack for Sub-45 nm CMOS Manufacturing

RELIANT: a reliability analysis tool for VLSI interconnect

Semiconductor Manufacturing in the Nanotechnology World of the 21st Century

Critical technology challenges in low power electronics

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