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Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process

Journal of physics. Conference series, 2017-01, Vol.783 (1), p.12042

2017

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Virtual metrology based on relevant feature extraction and just-in-time learning approach

2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2016, p.407-412

2016

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Implementation of MIMO R2R control regulation on furnaces processes

2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2010, p.143-148

2010

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Plasma-Reactor Wall Interactions: Bromine-Fluorine Chemistry Duality in an Industrial Dry Etch Process

MRS proceedings, 2015, Vol.1803 (1), Article mrss15-2135936

2015

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The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization process

IFAC-PapersOnLine, 2017, Vol.50 (1), p.6154-6159

2017

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Embedded spectroscopic reflectometry metrology on FEOL silicon dioxide trench polishing equipment: ER: Equipement reliability and productivity enhancements

2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2017, p.387-392

2017

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Virtual metrology on Chemical Mechanical Planarization process based on Just-In-Time Learning

2016 5th International Conference on Systems and Control (ICSC), 2016, p.169-174

2016

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Efficient FDC based on hierarchical tool condition monitoring scheme

2012 SEMI Advanced Semiconductor Manufacturing Conference, 2012, p.359-364

2012

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Oxide HDP-CVD Modeling for Shallow Trench Isolation

IEEE transactions on semiconductor manufacturing, 2010-08, Vol.23 (3), p.400-410

2010

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A mathematical model for estimating defect inspection capacity with a dynamic control strategy

Proceedings of the 2012 Winter Simulation Conference (WSC), 2012, p.1-9

2012

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Impact of control plan design on tool risk management: A simulation study in semiconductor manufacturing

Proceedings of the 2011 Winter Simulation Conference (WSC), 2011, p.1913-1920

2011

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Wet etch step modelling to help shallow trench isolation module control

2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 2011, p.1-6

2011

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A Smart Sampling Scheduling and Skipping Simulator and its evaluation on real data sets

Proceedings of the 2011 Winter Simulation Conference (WSC), 2011, p.1903-1912

2011

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The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization processThis work is part of the European projects "INTEGRATE" and "MAGE", and carried by STMicroelectronics Fab of Rousset

IFAC-PapersOnLine, 2017-07, Vol.50 (1), p.6154-6159

2017

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The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization process This work is part of the European projects "INTEGRATE" and "MAGE", and carried by STMicroelectronics Fab of Rousset

IFAC-PapersOnLine, 2017-07, Vol.50 (1), p.6154-6159

2017

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Feed-forward run-to-run control for reduced parametric transistor variation in CMOS logic 0.13μm technology

2007 International Symposium on Semiconductor Manufacturing, 2007, p.1-5

2007

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Virtual metrology on semiconductor manufacturing based on Just-in-time learningThis work is a part of the European project ”INTEGRATE”, and carried by STMicroelectronics Fab

IFAC-PapersOnLine, 2016, Vol.49 (12), p.89-94

2016

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A Survey of Health Indicators and Data-Driven Prognosis in Semiconductor Manufacturing Process

IFAC Proceedings Volumes, 2012-01, Vol.45 (20), p.19-24

2012

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New methodology for modeling large scale manufacturing process: Using process mining methods and experts' knowledge

2011 9th IEEE/ACS International Conference on Computer Systems and Applications (AICCSA), 2011, p.84-89

2011

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A survey of semantic web standards to representing knowledge in problem solving situations

2012 International Conference on Information Retrieval & Knowledge Management, 2012, p.121-125

2012

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A Semantic Mapping Approach to Retrieve Manufacturing Information Resources: STMicroelectronics' case study

IFAC Proceedings Volumes, 2013, Vol.46 (9), p.2069-2074

2013

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Dispatching of lots to dynamically reduce the wafers at risk in semiconductor manufacturing

2012 IEEE International Conference on Automation Science and Engineering (CASE), 2012, p.920-923

2012

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Translation-Invariant Multiscale Energy-Based PCA for Monitoring Batch Processes in Semiconductor Manufacturing

IEEE transactions on automation science and engineering, 2017-04, Vol.14 (2), p.894-904

2017

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Reactive Sampling for efficient Defect Source Identification

IEEE transactions on semiconductor manufacturing, 2016-03, Vol.PP, Issue:99

2016

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Fault prognosis for batch production based on percentile measure andgamma process

Journal of process control, 2016-10, Vol.48, p.72-80

2016

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Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process

Virtual metrology based on relevant feature extraction and just-in-time learning approach

Implementation of MIMO R2R control regulation on furnaces processes

Plasma-Reactor Wall Interactions: Bromine-Fluorine Chemistry Duality in an Industrial Dry Etch Process

The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization process

Embedded spectroscopic reflectometry metrology on FEOL silicon dioxide trench polishing equipment: ER: Equipement reliability and productivity enhancements

Virtual metrology on Chemical Mechanical Planarization process based on Just-In-Time Learning

Efficient FDC based on hierarchical tool condition monitoring scheme

Oxide HDP-CVD Modeling for Shallow Trench Isolation

A mathematical model for estimating defect inspection capacity with a dynamic control strategy

Impact of control plan design on tool risk management: A simulation study in semiconductor manufacturing

Wet etch step modelling to help shallow trench isolation module control

A Smart Sampling Scheduling and Skipping Simulator and its evaluation on real data sets

The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization processThis work is part of the European projects "INTEGRATE" and "MAGE", and carried by STMicroelectronics Fab of Rousset

The Impact of the Virtual Metrology on a Run-to-Run control for a Chemical Mechanical Planarization process This work is part of the European projects "INTEGRATE" and "MAGE", and carried by STMicroelectronics Fab of Rousset

Feed-forward run-to-run control for reduced parametric transistor variation in CMOS logic 0.13μm technology

Virtual metrology on semiconductor manufacturing based on Just-in-time learningThis work is a part of the European project ”INTEGRATE”, and carried by STMicroelectronics Fab

A Survey of Health Indicators and Data-Driven Prognosis in Semiconductor Manufacturing Process

New methodology for modeling large scale manufacturing process: Using process mining methods and experts' knowledge

A survey of semantic web standards to representing knowledge in problem solving situations

A Semantic Mapping Approach to Retrieve Manufacturing Information Resources: STMicroelectronics' case study

Dispatching of lots to dynamically reduce the wafers at risk in semiconductor manufacturing

Translation-Invariant Multiscale Energy-Based PCA for Monitoring Batch Processes in Semiconductor Manufacturing

Reactive Sampling for efficient Defect Source Identification

Fault prognosis for batch production based on percentile measure andgamma process

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