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Fractals and device performance variability: The key role of roughness in micro and nanofabrication

Microelectronic engineering, 2012-02, Vol.90 (Feb), p.121-125

2012

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Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations

Microelectronic engineering, 2004-09, Vol.75 (3), p.297-308

2004

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Detailed resist film modeling in stochastic lithography simulation for line-edge roughness quantification

Microelectronic engineering, 2010-05, Vol.87 (5), p.989-992

2010

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Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-05, Vol.21 (3), p.1019-1026

2003

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Stochastic simulation of thin photoresist film dissolution: a dynamic and a quasi-static dissolution algorithm for the simulation of surface and line-edge roughness formation

Polymer (Guilford), 2005-03, Vol.46 (7), p.2404-2417

Patsis, G.P.

2005

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Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-07, Vol.22 (4), p.1974-1981

2004

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Modeling of line edge roughness transfer during plasma etching

Microelectronic engineering, 2009-04, Vol.86 (4), p.968-970

2009

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Performance simulation, realization and evaluation of capacitive sensor arrays for the real time detection of volatile organic compounds

Microelectronic engineering, 2011-08, Vol.88 (8), p.2359-2363

2011

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Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution

European polymer journal, 2010-10, Vol.46 (10), p.1988-1999

2010

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Modelling MOSFET gate length variability for future technology nodes

Physica status solidi. A, Applications and materials science, 2008-11, Vol.205 (11), p.2541-2543

Patsis, G. P.

2008

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Gas-mass-flow transfer-rate simulation and experimental evaluation in microchannels

Microsystem technologies : sensors, actuators, systems integration, 2013-12, Vol.19 (12), p.1919-1925

2013

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Stochastic simulation studies of molecular resists

Microelectronic engineering, 2007-05, Vol.84 (5), p.1062-1065

2007

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Simulation of shot noise effect on CD and LER of electron-beam lithography in 32 nm designs

Microelectronic engineering, 2010-05, Vol.87 (5), p.1575-1578

2010

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Advanced lithography models for strict process control in the 32 nm technology node

Microelectronic engineering, 2009-04, Vol.86 (4), p.513-516

2009

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Modelling and evaluation of a thermal microfluidic sensor fabricated on plastic substrate

Microsystem technologies : sensors, actuators, systems integration, 2012-03, Vol.18 (3), p.359-364

2012

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Stochastic simulation studies of molecular resists for the 32 nm technology node

Microelectronic engineering, 2008-05, Vol.85 (5-6), p.949-954

2008

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Determining the impact of statistical fluctuations on resist line edge roughness

Microelectronic engineering, 2005-03, Vol.78, p.2-10

2005

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Processing effects on the dissolution properties of thin chemically amplified photoresist films

Microelectronic engineering, 2008-05, Vol.85 (5-6), p.955-958

2008

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Effects of Photoresist Polymer Molecular Weight and Acid-Diffusion on Line-Edge Roughness

Japanese Journal of Applied Physics, 2005-08, Vol.44 (8R), p.6341

2005

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Simulation of surface and line-edge roughness formation in resists

Microelectronic engineering, 2001-09, Vol.57, p.563-569

2001

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Effects of model polymer chain architectures of photo-resists on line-edge-roughness: Monte Carlo simulations

Journal of physics. Conference series, 2005-01, Vol.10 (1), p.389-392

2005

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Electron-beam lithography simulation for EUV mask applications

Journal of physics. Conference series, 2005-01, Vol.10 (1), p.385-388

2005

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Monte Carlo study of surface and line-width roughness of resist film surfaces during dissolution

Mathematics and computers in simulation, 2005-04, Vol.68 (2), p.145-156

Patsis, G.P.

2005

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A Stochastic Photoresist-Polymer Dissolution Model Combining the Percolation and Critical Ionization Models

Japanese Journal of Applied Physics, 2005-10, Vol.44 (10R), p.7400

2005

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Chemocapacitor performance modeling by means of polymer swelling optical measurements

Sensors and actuators. B, Chemical, 2012-08, Vol.171-172, p.409-415

2012

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Fractals and device performance variability: The key role of roughness in micro and nanofabrication

Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations

Detailed resist film modeling in stochastic lithography simulation for line-edge roughness quantification

Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors

Stochastic simulation of thin photoresist film dissolution: a dynamic and a quasi-static dissolution algorithm for the simulation of surface and line-edge roughness formation

Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions

Modeling of line edge roughness transfer during plasma etching

Performance simulation, realization and evaluation of capacitive sensor arrays for the real time detection of volatile organic compounds

Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution

Modelling MOSFET gate length variability for future technology nodes

Gas-mass-flow transfer-rate simulation and experimental evaluation in microchannels

Stochastic simulation studies of molecular resists

Simulation of shot noise effect on CD and LER of electron-beam lithography in 32 nm designs

Advanced lithography models for strict process control in the 32 nm technology node

Modelling and evaluation of a thermal microfluidic sensor fabricated on plastic substrate

Stochastic simulation studies of molecular resists for the 32 nm technology node

Determining the impact of statistical fluctuations on resist line edge roughness

Processing effects on the dissolution properties of thin chemically amplified photoresist films

Effects of Photoresist Polymer Molecular Weight and Acid-Diffusion on Line-Edge Roughness

Simulation of surface and line-edge roughness formation in resists

Effects of model polymer chain architectures of photo-resists on line-edge-roughness: Monte Carlo simulations

Electron-beam lithography simulation for EUV mask applications

Monte Carlo study of surface and line-width roughness of resist film surfaces during dissolution

A Stochastic Photoresist-Polymer Dissolution Model Combining the Percolation and Critical Ionization Models

Chemocapacitor performance modeling by means of polymer swelling optical measurements

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